Patent Assignment
Reel/Frame 050647/0001
Release of Security Interest
Recorded: 2019-10-07
Pages: 40
Assignor
CITIBANK, N.A., AS AGENT
Executed: 2019-10-07
Assignee
VERSUM MATERIALS US, LLC
8555 RIVER PARKWAY, TEMPE, ARIZONA, 85284
Covered Properties
(379)
Solvent Free Aqueous Polyurethane Dispersions and Methods of Making and Using the Same
Vessel with Filter
Volatile Dihydropyrazinly and Dihydropyrazine Metal Complexes
Method of Making a Multicomponent Film
Ultrasonic Liquid Level Sensing Systems
Diptube Design for a Host Ampoule
Ultrasonic Liquid Level Sensing Systems
Vessel and Method for Delivery of Precursor Materials
High Purity Tungsten Hexachloride and Method for Making Same
Container for Chemical Precursors in a Deposition Process
Methods For Depositing Group 13 Metal or Metalloid Nitride Films
Delivery Container with Flow Distributor
Application:
62/335,396 →
Precursors for CVD Silicon Carbo-Nitride Films
Method for Removal of Carbon from an Organosilicate Material
Application:
13/936,557 →
Publication:
US US20130295334A1
Methods to Prepare Silicon-Containing Films
Compositions and Processes for Depositing Carbon-Doped Silicon-Containing Films
Compositions and Processes for Depositing Carbon-Doped Silicon-Containing Films
High Temperature Atomic Layer Deposition of Silicon Oxide Thin Films
Catalyst and Formulations Comprising Same for Alkoxysilanes Hydrolysis Reaction in Semiconductor Process
Alkoxyaminosilane Compounds and Applications Thereof
Compositions and Methods for Making Silicon Containing Films
Barrier Materials for Display Devices
Organoaminodisilane Precursors and Methods for Depositing Films Comprising Same
Organoaminodisilane Precursors and Methods for Depositing Films Comprising Same
Methods for Depositing Films with Organoaminodisilane Precursors
Alkoxysilylamine Compounds and Applications Thereof
Compositions and Methods Using Same for Flowable Oxide Deposition
Process for Making Trisilylamine
Aza-Polysilane Precursors and Methods for Depositing Films Comprising Same
Organoaminosilane Precursors and Methods for Depositing Films Comprising Same
Methods for Depositing Silicon Nitride Films
Organoaminosilanes and Methods for Making Same
Method and Composition for Providing Pore Sealing Layer on Porous Low Dielectric Constant Films
Application:
14/820,982 →
Publication:
US US20160049293A1
Compositions and Methods for the Deposition of Silicon Oxide Films
Application:
14/661,652 →
Publication:
US US20150275355A1
Alkyl-Alkoxysilacyclic Compounds
Silicon-Based Films and Methods of Forming the Same
Bisaminoalkoxysilane Compounds and Methods for Using Same to Deposit Silicon-Containing Films
Method and Precursors for Manufacturing 3D Devices
Boron-Containing Compounds, Compositions, and Methods for the Deposition of a Boron Containing Films
Methods for Depositing a Conformal Metal or Metalloid Silicon Nitride Film
Application:
62/237,899 →
Compositions and Methods Using Same for Deposition of Silicon-Containing Film
Application:
62/270,259 →
High Temperature Atomic Layer Deposition of Silicon-Containing Films
Application:
62/280,886 →
Compositions and Methods Using Same for Deposition of Silicon-Containing Film
Application:
62/300,312 →
High Purity Ethylenediamine for Semiconductor Applications
Application:
62/364,959 →
Precursors And Flowable CVD Methods For Making Low-K Films To Fill Surface Features
Application:
62/381,222 →
Compositions and Methods Using Same for Carbon Doped Silicon Containing Films
Application:
62/367,260 →
Composition and Method Used for Chemical Mechanical Planarization of Metals
Composition and method used for chemical mechanical planarization of metals
Application:
12/213,141 →
Publication:
US US20080254629A1
Chemical Mechanical Planarization for Tungsten-Containing Substrates
Application:
14/142,087 →
Publication:
US US20140273458A1
Chemical Mechanical Polishing (Cmp) Composition for Shallow Trench Isolation (Sti) Applications and Methods of Making Thereof
Metal Compound Coated Colloidal Particles Process for Making and Use Therefor
Application:
14/224,839 →
Publication:
US US20140315386A1
Barrier Chemical Mechanical Planarization Composition and Method Thereof
Metal Compound Chemically Anchored Colloidal Particles and Methods of Production and Use Thereof
Chemical Mechanical Polishing (CMP) of Colbalt-Containing Substrate
Chemical Mechanical Polishing Slurry for Reducing Corrosion and Method of Use Therefor
Application:
14/884,104 →
Publication:
US US20160122590A1
Dishing Reducing in Tungsten Chemical Mechanical Polishing
Composite Abrasive Particles for Chemical Mechanical Planarization Composition and Method of Use Thereof
Application:
62/221,379 →
Composite Abrasive Particles For Chemical Mechanical Planarization Composition and Method of Use Thereof
Composite Abrasive Particles for Chemical Mechanical Planarization Composition and Method of Use Thereof
Low Dishing Copper Chemical Mechanical Planarization
Barrier Chemical Mechanical Planarization Slurries Using Ceria-Coated Silica Abrasives
Stop-On Silicon Containing Layer Additive
Chemical Mechanical Planarization of Silicon Containing Materials
Application:
62/286,606 →
Chemical Mechanical Polishing (CMP) of Cobalt-Containing Substrate
Application:
62/350,844 →
Composite Particles, Method of Refining and Use Thereof
Application:
62/316,089 →
Additives for Barrier Chemical Mechanical Planarization
Application:
62/357,571 →
Fixture Drying Apparatus and Method
Slurry Supply and/or Chemical Blend Supply Apparatuses, Processes, Methods of Use and Methods of Manufacture
Divided Electrochemical Cell and Low Cost High Purity Hydride Gas Production Process
Vessels with Personnel Access Provisions
Onsite Ultra High Purity Chemicals or Gas Purification
Process for Recovery and Purification of Nitrous Oxide
System and Method for Xenon Recovery
Electrolytic Apparatus, System and Method for the Efficient Production of Nitrogen Trifluoride
System and Method for Gas Recovery and Reuse
Cleaning Formulations
Stripping and Cleaning Compositions for Removal of Thick Film Resist
Application:
15/018,564 →
Publication:
US US20160152930A1
Composition for Titanium Nitride Hard Mask and Etch Residue Removal
Copper Corrosion Inhibition System
Stripping Compositions Having High WN/W Etching Selectivity
Semi-Aqueous Photoresist or Semiconductor Manufacturing Residue Stripping and Cleaning Composition with Improved Silicon Passivation
Etchant Solutions and Method of Use Thereof
Composition for Treating Surface of Substrate, Method and Device
Tin Hard Mask and Etch Residual Removal
Selectively Removing Titanium Nitride Hard Mask and Etch Residue Removal
Cleaning Formulations
Photoresist Cleaning Composition Used in Photolithography and a Method for Treating Substrate Therewith
Etching Compositions and Methods for Using Same
Application:
62/259,870 →
Etching Compositions and Methods for Using Same
Application:
62/300,382 →
Stripping and Cleaning Composition
Patent:
5,698,503 →
Application:
08/745,754 →
Basic Stripping and Cleaning Composition
Patent:
5,709,756 →
Application:
08/744,013 →
Silicon Nitride from Bis(Tertiarybutylamino)Silane
Patent:
5,874,368 →
Application:
08/942,996 →
Polish Process and Slurry for Planarization
Patent:
5,876,490 →
Application:
08/789,229 →
Chemical Mechanical Polishing Composition
Patent:
5,891,205 →
Application:
08/911,076 →
Method and Apparatus for Making Ultra-Pure Hydrogen
Patent:
5,955,044 →
Application:
08/941,530 →
Method for Removal of Moisture from Gaseous Hcl
Patent:
5,958,356 →
Application:
08/964,783 →
Solvent Purge Mechanism
Patent:
5,964,230 →
Application:
08/944,907 →
Deposition of Silicon Dioxide and Silicone Oxynitride Using Bis (Tertiarybutylamino) Silane
Patent:
5,976,991 →
Application:
09/095,818 →
Aqueous Stripping and Cleaning Compositions
Patent:
5,997,658 →
Application:
09/004,937 →
Fluorination with Aminosulfur Trifluorides
Patent:
6,080,886 →
Application:
08/939,940 →
Process for the Synthesis of Dialkyl, Diaryl, and Arylalkyl Aminosulfur Trifluorides
Patent:
6,096,922 →
Application:
09/432,724 →
Chemical Mechanical Polishing Composition and Process
Patent:
6,117,783 →
Application:
09/043,505 →
Solvent Purge Mechanism
Patent:
6,138,691 →
Application:
09/318,003 →
Thermally Stable Aminosulfur Trifluorides
Patent:
6,207,860 →
Application:
08/939,635 →
Dynamic Blending Gas Delivery System and Method
Patent:
6,217,659 →
Application:
09/174,196 →
Vacuum Preparation of Hydrogen Halidle Drier
Patent:
6,221,132 →
Application:
09/417,668 →
Fluorination with Aminosulfur Trifluorides
Patent:
6,222,064 →
Application:
09/483,751 →
Thermally stable aminosulfur trifluorides
Patent:
6,242,645 →
Application:
09/535,682 →
Method of Clean a Wafer Carrier
Patent:
6,248,177 →
Application:
09/227,702 →
Slurry Composition and Method of Chemical Mechanical Polishing Using Same
Patent:
6,251,150 →
Application:
09/321,036 →
Chemical Delivery System with Ultrasonic Fluid Sensors
Patent:
6,264,064 →
Application:
09/418,084 →
Process for generating useful electrophiles from common anions and their application in electrophilic rections with organic substrates
Patent:
6,270,843 →
Application:
09/535,756 →
Purification of nitrogen trifluoride by continuous cryogenic distillation
Patent:
6,276,168 →
Application:
09/566,075 →
Chemical delivery system with spill containment door
Patent:
6,276,404 →
Application:
09/661,750 →
Chemical Mechanical Polishing Composition and Process
Patent:
6,313,039 →
Application:
09/481,050 →
Solventless Purgeable Diaphragm Valved Manifold for Low Vapor Pressure Chemicals
Patent:
6,431,229 →
Application:
09/938,883 →
Processes for Improved Surface Properties Incorporating Compressive Heating of Reactive Gases
Patent:
6,462,142 →
Application:
09/432,980 →
Dynamic Blending Gas Delivery System and Method
Active Fluoride Catalysts for Fluorination Reactions
High Purity Chemical Container with External Level Sensor and Liquid Sump
Purification of Hexafluoro-1,3-Butadiene
Patent:
6,544,319 →
Application:
10/050,352 →
Preparation of Metal Imino/Amino Complexes for Metal Oxide and Metal Nitride Thin Films
Patent:
6,552,209 →
Application:
10/179,818 →
Organosilicon Precursors for Interlayer Dielectric Films with Low Dielectric Constants
High Flow Rate Transportable Uhp Gas Supply System
Systems and Methods for Conditioning Ultra High Purity Gas Bulk Containers
Process for Removing Contaminant from a Surface and Composition Useful Therefor
Chemical Mechanical Polishing Composition and Process
Patent:
6,635,186 →
Application:
09/226,996 →
Product Delivery System for Stationary or Portable Bulk Containers
Purgeable Manifold for Low Vapor Pressure Chemicals Containers
Patent:
6,648,034 →
Application:
10/155,726 →
Transportation and Storage of Ultra-High Purity Products
Compositons for Removing Etching Residue and Use Thereof
Patent:
6,677,286 →
Application:
10/191,060 →
Adsorbent for Moisture Removal from Fluorine-Containing Fluids
Patent:
6,709,487 →
Application:
10/278,131 →
Purification of Group Ivb Metal Halides
Systems and Methods for Conditioning Ultra High Purity Gas Bulk Containers
Compositions for Removing Etching Residue and Use Thereof
Selective Polishing with Slurries Containing Polyelectrolytes
Cerium Oxide Slurry, and Method of Manufacturing Substrate
Low Surface Tension, Low Viscosity, Aqueous, Acidic Compositions Containing Fluoride and Organic, Polar Solvents for Removal of Photoresist and Organic and Inorganic Etch Residues at Room Temperature
Multiple Contents Container Assembly for Ultrapure Solvent Purging
Patent:
6,837,251 →
Application:
09/675,376 →
Multiple Contents Container Assembly for Ultrapure Solvent Purging
Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants
Stabilizers to Inhibit the Polymerization of Substituted Cyclotetrasiloxane
Process for Removing Water from Ammonia
Synthesis of Vicinal Difluoro Aromatics and Intermediates Thereof
Ionic Additives for Extreme Low Dielectric Constant Chemical Formulations
Multiple Contents Container Assembly for Ultrapure Solvent Purging
Wafer Container Washing Apparatus
Monitoring of Ultra-High Purity Product Storage Tanks During Transportation
Aqueous Stripping and Cleaning Composition
Compositions Suitable for Removing Photoresist, Photoresist Byproducts and Etching Residue, and Use Thereof
Cabinet for Chemical Delivery with Solvent Purging
Process for the Production and Purification of Bis(Tertiary-Butylamino)Silane
Selective Polishing with Slurries Containing Polyelectrolytes
Patent:
6,964,923 →
Application:
09/577,347 →
Purgeable Container for Low Vapor Pressure Chemicals
Low Defectivity Product Slurry for Cmp and Associated Production Method
Patent:
6,979,252 →
Application:
11/030,503 →
Process for Purifying Fluoroxy Compounds
Catalytic Composition for Chemical-Mechanical Polishing, Method of Using Same, and Substrate Treated with Same
Chemical-Mechanical Planarization Composition with Nitrogen Containing Polymer and Method for Use
Catalyst Attached to Solid and Used to Promote Free Radical Formation in Cmp Formulations
Process for Producing 1,1-Difluorovinyl Cycloaliphatic Compounds
Volatile Metal Beta-Ketoiminate Complexes
Patent:
7,034,169 →
Application:
11/111,455 →
Composition for Chemical-Mechanical Polishing and Method of Using Same
Organometallic Complexes and Their Use as Precursors to Deposit Metal Films
Patent:
7,064,224 →
Application:
11/051,140 →
Precursors for Silica or Metal Silicate Films
Burner and Process for Combustion of a Gas Capable of Reacting to Form Solid Products
Process for the Purification of NF3
Process for Purification of Germane
Mechanical Enhancement of Dense and Porous Organosilicate Materials by Uv Exposure
Stabilizers to Inhibit the Polymerization of Substituted Cyclotetrasiloxane
High Purity Chemical Container with Diptube and Level Sensor Terminating in Lowest Most Point of Concave Floor
Compositions Substrate for Removing Etching Residue and Use Thereof
Additives to Prevent Degradation of Alkyl-Hydrogen Siloxanes
Tunable Composition and Method for Chemical-Mechanical Planarization with Aspartic Acid/Tolyltriazole
Low Dielectric Materials and Methods for Making Same
Volatile Metal Beta-Ketoiminate and Metal Beta-Diiminate Complexes
Wafer Container Washing Apparatus
Composition and Associated Methods for Chemical Mechanical Planarization Having High Selectivity for Metal Removal
Method and Vessel for the Delivery of Precursor Materials
Enhanced Purge Effect in Gas Conduit
Chemical Mechanical Polishing Composition and Process
Liquid Media Containing Lewis Basic Reactive Compounds for Storage and Delivery of Lewis Acidic Gases
Xenon Recovery System
Precursors for Depositing Silicon Containing Films
Stabilizers to Inhibit the Polymerization of Substituted Cyclotetrasiloxane
Low Dielectric Materials and Methods for Making Same
Chemical Mechanical Polishing Composition and Process
Polishing Method to Reduce Dishing of Tungsten on a Dielectric
Porous Low Dielectric Constant Compositions and Methods for Making and Using Same
Cabinet for Chemical Delivery with Solvent Purging and Removal
Aqueous Polyurethane Dispersion and Method for Making and Using Same
Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants
Ionic Liquid Based Mixtures for Gas Storage and Delivery
Non-Thermal Process for Forming Porous Low Dielectric Constant Films
Stabilization of Nitrogen-Containing and Oxygen-Containing Organosilanes Using Weakly Basic Ion-Exchange Resins
Adsorbent for Water Removal from Ammonia
Leak Containment Apparatus for Reactive Gases
Component Heater
Mechanical Enhancement of Dense and Porous Organosilicate Materials by Uv Exposure
Non-Thermal Process for Forming Porous Low Dielectric Constant Films
Dihydroxy Enol Compounds Used in Chemical Mechanical Polishing Compositions Having Metal Ion Oxidizers
Electro-Optic Display and Materials for Use Therein
Self-Contained Distillation Purifier/Superheater for Liquid-Fill Product Container and Delivery Systems
Activated Chemical Process for Enhancing Material Properties of Dielectric Films
Free Radical-Forming Activator Attached to Solid and Used to Enhance Cmp Formulations
Chemical-Mechanical Planarization Composition Having Benzenesulfonic Acid and Per-Compound Oxidizing Agents, and Associated Method for Use
Compositions of chemical mechanical planarization slurries contacting noble-metal-featured substrates
Process for Removing Contaminant from a Surface and Composition Useful Therefor
Additives to Prevent Degradation of Alkyl-Hydrogen Siloxanes
Ph Buffered Aqueous Cleaning Composition and Method for Removing Photoresist Residue
Electro-Optic Displays, and Materials for Use Therein
Ionic Liquid Based Mixtures for Gas Storage and Delivery
Quaternary Trifluoromethylcyclohexane Derivatives for Liquid Crystals
Formulation for Removal of Photoresist, Etch Residue and Barc
Cyclic Chemical Vapor Deposition of Metal-Silicon Containing Films
Aqueous Based Residue Removers Comprising Fluoride
Soft Insert Gasket
Semi-Aqueous Stripping and Cleaning Composition Containing Aminobenzenesulfonic Acid
Method for Immobilizing Ligands and Organometallic Compounds on Silica Surface, and Their Application in Chemical Mechanical Planarization
Metal Complexes of Tridentate Beta-Ketoiminates
Composition for Removal of Residue Comprising Cationic Salts and Methods Using Same
Process for Removing Contaminant from a Surface and Composition Useful Therefor Description
Metal Complexes of Tridentate Beta-Ketoiminates
Selective Purification of Mono-Terpenes for Removal of Oxygen Containing Species
Ti, Ta, Hf, Zr and Related Metal Silicon Amides for Ald/Cvd of Metal-Silicon Nitrides, Oxides or Oxynitrides
Aqueous Buffered Fluoride-Containing Etch Residue Removers and Cleaners
Dual-Flow Valve and Internal Processing Vessel Isolation System
Process for Separating Components of a Multi-Component Feed Stream
System and Method Comprising Same for Measurement and/or Analysis of Particles in Gas Stream
Process for Producing Silicon Oxide Films from Organoaminosilane Precursors
Precursors for Cvd Silicon Carbo-Nitride and Silicon Nitride Films
Aqueous Cleaning Composition and Method for Using Same
Cleaning Composition for Semiconductor Substrates
Aqueous Based Residue Removers Comprising Fluoride
Mechanical Enhancement of Dense and Porous Organosilicate Materials by Uv Exposure
Precursors for Cvd Silicon Carbo-Nitride Films
Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants
Metal Complexes of Polydentate Beta-Ketoiminates
Tellurium Precursors for Gst Films in an Ald or Cvd Process
Stabilizers for the Stabilization of Unsaturated Hydrocarbon-Based Precursor
Periodic Acid Compositions for Polishing Ruthenium/Low K Substrates
Devices and Methods for Performing Inspections, Repairs, and/or Other Operations Within Vessels
Electro-Optic Display and Materials for Use Therein
Cross Purge Valve and Container Assembly
Method and Apparatus for Achieving Maximum Yield in the Electrolytic Preparation of Group Iv and V Hydrides
Composition for Stripping and Cleaning and Use Thereof
Adhesion to Copper and Copper Electromigration Resistance
Stabilizers for the Stabilization of Unsaturated Hydrocarbon-Based Precursor
Preparation of Metal Oxide Thin Film via Cyclic Cvd or Ald
Semi-Aqueous Stripping and Cleaning Formulation for Metal Substrate and Methods for Using Same
Dihydroxy Enol Compounds Used in Chemical Mechanical Polishing Compositions Having Metal Ion Oxidizers
Precursors for Depositing Silicon-Containing Films and Methods for Making and Using Same
Process and System for Providing Acetylene
Compositions for Chemical-Mechanical Planarization of Noble-Metal-Featured Substrates, Associated Methods, and Substrates Produced by Such Methods
Low Temperature Thermal Conductive Inks
Splashguard for High Flow Vacuum Bubbler Vessel
Process Stability of Nbde Using Substituted Phenol Stabilizers
Method of Making a Multicomponent Film
Ionic Liquid Based Mixtures for Gas Storage and Delivery
Method for Making a Chlorosilane
Method and Composition for Chemical Mechanical Planarization of a Metal-Containing Substrate
Process Solutions Containing Surfactants
Aqueous Stripping and Cleaning Composition
Group 2 Metal Precursors for Depositing Multi-Component Metal Oxide Films
Method and Composition for Chemical Mechanical Planarization of a Metal or a Metal Alloy
Copper Precursors for Thin Film Deposition
Selective Etching and Formation of Xenon Difluoride
Process for Restoring Dielectric Properties
Process for Selectively Depositing Copper Thin Films on Substrates with Copper and Ruthenium Areas via Vapor Deposition
Composition and Method for Photoresist Removal
Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants
Low Temperature Deposition of Silicon-Containing Films
High Coordination Sphere Group 2 Metal B-Diketiminate Precursors
Antimony Precursors for Gst Films in Ald/Cvd Processes
Low-Impurity Organosilicon Product as Precursor for Cvd
Stripper for Dry Film Removal
Wet Clean Compositions for Cowp and Porous Dielectrics
Electrodes for Electrolytic Germane Process
Selective Etching of Silicon Dioxide Compositions
Precursors for Cvd Silicon Carbo-Nitride Films
Materials and Methods of Forming Controlled Void
Recovery of NF3 from Adsorption Operation
Method and Composition for Chemical Mechanical Planarization of a Metal
Stabilizers for the Stabilization of Unsaturated Hydrocarbon-based Precursor
Composition for Stripping and Cleaning and Use Thereof
Methods for Depositing Silicon Dioxide or Silicon Oxide Films Using Aminovinylsilanes
Precursors for Depositing Group 4 Metal-Containing Films
Polishing Slurry for Copper Films
Combination, Method, and Composition for Chemical Mechanical Planarization of A Tungsten-Containing Substrate
Binary and Ternary Metal Chalcogenide Materials and Method of Making and Using Same
Liquid Composition Containing Aminoether for Deposition of Metal-Containing Films
Water-Rich Stripping and Cleaning Formulation and Method for Using Same
Solenoid Bypass for Continuous Operation of Pneumatic Valve
Process for Producing Silicon and Oxide Films from Organoaminosilane Precursors
Recovering of Xenon by Adsorption Process
Additives to Silane for Thin Film Silicon Photovoltaic Devices
Method for Chemical Mechanical Planarization of a Copper-Containing Substrate
Method of Making a Multicomponent Film
Process for Inhibiting Corrosion and Removing Contaminant from a Surface During Wafer Dicing and Composition Useful Therefor
Amino Vinylsilane Precursors for Stressed SiN Films
Cylinder Surface Treated Container For Monochlorosilane
Method and Equipment for Selectively Collecting Process Effluent
Method and Apparatus for Achieving Maximum Yield in the Electrolytic Preparation of Group IV and V Hydrides
Liquid Precursor for Depositing Group 4 Metal Containing Films
System for Performing Inspections, Repairs, and/or Other Operations Within Vessels
Novel Metal Complexes for Metal-Containing Film Deposition
Dielectric Barrier Deposition Using Oxygen Containing Precursor
Amidate Precursors For Depositing Metal Containing Films
Complexes Of Imidazole Ligands
Group IV Metal Complexes For Metal-Containing Film Deposition
Method and Composition for Chemical Mechanical Planarization of a Metal or a Metal Alloy
Volatile Imidazoles and Group 2 Imidazole Based Metal Precursors
Dielectric Films Comprising Silicon and Methods for Making Same
Methods to Prepare Silicon-Containing Films
Splashguard and Inlet Diffuser for High Vacuum, High Flow Bubbler Vessel
Method for Preparing Metal Complexes of Polydentate Beta-Ketoiminates
Solenoid Bypass System for Continuous Operation of Pneumatic Valve
Low K Precursors Providing Superior Integration Attributes
Low-Impurity Organosilicon Product as Precursor for Cvd
Binary and Ternary Metal Chalcogenide Materials and Method of Making and Using Same
Formulations and Method for Post-Cmp Cleaning
Organoaminosilane Precursors and Methods for Making and Using Same
Aqueous cleaning composition for removing residues and method using same
Combination, Method, and Composition for Chemical Mechanical Planarization of a Tungsten-Containing Substrate
Chemical Mechanical Planarization Composition And Method With Low Corrosiveness
Plasma Enhanced Cyclic Chemical Vapor Deposition of Silicon- Containing Films
Method and Composition for Chemical Mechanical Planarization of a Metal
Materials and Methods of Forming Controlled Void
Method for Chemical Mechanical Planarization of a Tungsten-Containing Substrate
Chemical Mechanical Polishing (Cmp) Composition for Shallow Trench Isolation (Sti) Applications and Methods of Making Thereof
Volatile Group 2 Metal Precursors
Method for Wafer Dicing and Composition Useful Thereof
Dielectric Barrier Deposition Using Nitrogen Containing Precursor
Cleaning Formulations and Method of Using the Cleaning Formulations
Cmp Slurry/Method for Polishing Ruthenium and Other Films
Low Temperature Deposition of Silicon-Containing Films
Organoaminosilane Precursors and Methods for Depositing Films Comprising Same
Process and System for Providing Acetylene
Method for Forming Through-Base Wafer Vias for Fabrication of Stacked Devices
Methods for Depositing Silicon Carbo-Nitride Film
Process for Producing Silicon and Oxide Films from Organoaminosilane Precursors
Splashguard For High Flow Vacuum Bubbler Vessel
Electrolytic Apparatus, System and Method for the Safe Production of Nitrogen Trifluoride
Methods For Using Porogens For Low K Porous Organosilica Glass Films
Group 4 Metal Precursors for Metal-Containing Films
Ultrasonic Liquid Level Sensing Systems
Metal-Enolate Precursors For Depositing Metal-Containing Films
Chemical Mechanical Polishing Slurry Compositions and Method Using the Same for Copper and Through-Silicon Via Applications
Halogenated Organoaminosilane Precursors and Methods for Depositing Films Comprising Same
Chemical Mechanical Polishing Composition Having Chemical Additives and Methods for Using Same
Organoaminosilane Precursors and Methods for Making and Using Same
Low K Precursors Providing Superior Integration Attributes
Complexes Of Imidazole Ligands
Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants
Chemical Mechanical Polishing (CMP) Composition for Shallow Trench Isolation (STI) Applications and Methods of Making Thereof
Multidentate Ketoimine Ligands for Metal Complexes
Solid Source Container With Inlet Plenum
Alkoxyaminosilane Compounds and Applications Thereof
Chemical-Mechanical Planarization Composition Having Benzenesulfonic Acid and Per-Compound Oxidizing Agents, and Associated Method for Use
Water-Rich Stripping and Cleaning Formulation and Method for Using Same
Method of Making a Multicomponent Film
Onsite Ultra High Purity Chemicals or Gas Purification
Composition for removing photoresist and/or etching residue from a substrate and use thereof
Titanium Nitride Hard Mask and Etch Residue Removal
Patent:
9,222,018 →
Application:
14/642,831 →
Vessels With Personnel Access Provisions
CMP Slurry/Method for Polishing Ruthenium and Other Films
Organoaminosilanes and Methods for Making Same
Methods of Forming Non-Oxygen Containing Silicon-Based Films
Process for Making Trisilylamine
Materials and Methods of Forming Controlled Void
Purification of Nitrogen Trifluoride By Pressure Swing Adsorption
Chemical Mechanical Polishing (Cmp) Composition for Shallow Trench Isolation (Sti) Applications and Methods of Making Thereof
Chemical Mechanical Polishing Slurry Compositions and Method Using the Same for Copper and Through-Silicon Via Applications
Ultrasonic Liquid Level Sensing Systems
Method for Wafer Dicing and Composition Useful Thereof
Methods for Depositing Films with Organoaminodisilane Precursors
Splashguard and Inlet Diffuser for High Vacuum, High Flow Bubbler Vessel
Compositions for Removing Residue from a Substrate and Use Thereof
Patent:
42,128 →
Application:
12/321,730 →
Chemical vapor deposition method
Methods for Depositing a Conformal Metal or Metalloid Silicon Nitride Film and Resultant Films
PCT:
PCT/US2016/050874 ↗
Related Assignments
(18)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Jan 10, 2011
From: CAMPBELL, KEITH DOUGLAS; ZHENG, SHIYING; FAZEL, SHAFIQ NISARALI
To: AIR PRODUCTS AND CHEMICALS, INC.
Reel/Frame 025610/0725 →
Assignment of Assignor's Interest
Jun 28, 2013
From: CHANDRA, HARIPIN; WANG, MEILIANG; XIAO, MANCHAO; LEI, XINJIAN
To: AIR PRODUCTS AND CHEMICALS, INC.
Reel/Frame 030706/0705 →
Assignment of Assignor's Interest
Aug 15, 2013
From: BIRTCHER, CHARLES MICHAEL; STEIDL, THOMAS ANDREW; LEI, XINJIAN; IVANOV, SERGEI VLADIMIROVICH
To: AIR PRODUCTS AND CHEMICALS, INC.
Reel/Frame 031018/0932 →
Assignment of Assignor's Interest
Jan 9, 2014
From: XIAO, MANCHAO; LEI, XINJIAN; PEARLSTEIN, RONALD MARTIN; CHANDRA, HARIPIN
To: AIR PRODUCTS AND CHEMICALS, INC.
Reel/Frame 031930/0199 →
Assignment of Assignor's Interest
Sep 24, 2014
From: XIAO, MANCHAO; LEI, XINJIAN; HAN, BING; O'NEILL, MARK LEONARD
To: AIR PRODUCTS AND CHEMICALS, INC.
Reel/Frame 033808/0164 →
Assignment of Assignor's Interest
Oct 22, 2014
From: NORMAN, JOHN ANTHONY THOMAS; IVANOV, SERGEI VLADIMIROVICH; LEI, XINJIAN
To: AIR PRODUCTS AND CHEMICALS, INC.
Reel/Frame 034007/0805 →
Assignment of Assignor's Interest
Apr 8, 2015
From: XIAO, MANCHAO; HOCHBERG, ARTHUR KENNETH
To: AIR PRODUCTS AND CHEMICALS, INC.
Reel/Frame 035360/0468 →
Assignment of Assignor's Interest
Oct 26, 2015
From: BIRTCHER, CHARLES MICHAEL; VIVANCO, GILDARDO; SHEEHY, WILLIAM JON
To: AIR PRODUCTS AND CHEMICALS, INC.
Reel/Frame 036877/0624 →
Assignment of Assignor's Interest
Nov 17, 2015
From: BIRTCHER, CHARLES MICHAEL; STEIDL, THOMAS ANDREW
To: AIR PRODUCTS AND CHEMICALS, INC.
Reel/Frame 037061/0535 →
Assignment of Assignor's Interest
Feb 29, 2016
From: LEI, XINJIAN; KIM, MOO-SUNG
To: AIR PRODUCTS AND CHEMICALS, INC.
Reel/Frame 037852/0165 →
Assignment of Assignor's Interest
Jul 12, 2016
From: WU, XIAOXI; IVANOV, SERGEI VLADIMIROVICH
To: AIR PRODUCTS AND CHEMICALS, INC.
Reel/Frame 039132/0235 →
Assignment of Assignor's Interest
Jul 12, 2016
From: BIRTCHER, CHARLES MICHAEL; STEIDL, THOMAS ANDREW; IVANOV, SERGEI VLADIMIROVICH
To: AIR PRODUCTS AND CHEMICALS, INC.
Reel/Frame 039132/0596 →
Assignment of Assignor's Interest
Jul 27, 2016
From: NEHLSEN, JAMES PATRICK; BIRTCHER, CHARLES MICHAEL
To: AIR PRODUCTS AND CHEMICALS, INC.
Reel/Frame 039271/0236 →
Assignment of Assignor's Interest
Sep 14, 2016
From: LEI, XINJIAN; KIM, MOO-SUNG; IVANOV, SERGEI VLADIMIROVICH
To: AIR PRODUCTS AND CHEMICALS, INC.
Reel/Frame 039738/0580 →
Assignment of Assignor's Interest
Sep 20, 2016
From: BIRTCHER, CHARLES MICHAEL; NEHLSEN, JAMES PATRICK; IVANOV, SERGEI VLADIMIROVICH; STEIDL, THOMAS ANDREW
To: AIR PRODUCTS AND CHEMICALS, INC.
Reel/Frame 039798/0034 →
Patent Security Agreement
Oct 27, 2016
From: VERSUM MATERIALS US, LLC
To: CITIBANK, N.A., AS COLLATERAL AGENT
Reel/Frame 040503/0442 →
Assignment of Assignor's Interest
Jan 9, 2017
From: XIAO, MANCHAO; LEI, XINJIAN; PEARLSTEIN, RONALD MARTIN; CHANDRA, HARIPIN
To: AIR PRODUCTS AND CHEMICALS, INC.
Reel/Frame 040903/0846 →
Assignment of Assignor's Interest
Feb 20, 2017
From: AIR PRODUCTS AND CHEMICALS, INC.
To: VERSUM MATERIALS US, LLC
Reel/Frame 041772/0733 →