IP Library › Granted Patent US 7,064,227
Granted Patent B1
US 7,064,227 · App. 11/008,069 · Granted Jun 20, 2006

Precursors for silica or metal silicate films

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Quick Facts
Patent No.
US 7,064,227
App. No.
11/008,069
Granted
Jun 20, 2006
Kind
B1
Abstract

A composition selected from the group consisting of bis(tert-butoxy)(isopropoxy)silanol, bis(isopropoxy)(tert-butoxy)silanol, bis(tert-pentoxy)(isopropoxy)silanol, bis(isopropoxy)(tert-pentoxy)silanol, bis(tert-pentoxy)(tert-butoxy)silanol, bis(tert-butoxy)(tert-pentoxy)silanol and mixtures thereof; its use to form a metal or metalloid silicate layer on a substrate and the synthesis of the mixed alkoxysilanols.

Claims (14)

1. A composition selected from the group consisting of bis(tert-butoxy)(iso-propoxy)silanol, bis(iso-propoxy)(tert-butoxy)silanol, bis(tert-pentoxy)(iso-propoxy)silanol, bis(iso-propoxy)(tert-pentoxy)silanol, bis(tert-pentoxy)(tert-butoxy)silanol, bis(tert-butoxy)(tert-pentoxy)silanol and mixtures thereof.

2. The invention of claim 1 wherein the composition is bis(iso-propoxy)(tert-butoxy)silanol.

3. The invention of claim 1 wherein the composition is bis(tert-pentoxy)(iso-propoxy)silanol.

4. The invention of claim 1 wherein the composition is bis(iso-propoxy)(tert-pentoxy)silanol.

5. The invention of claim 1 wherein the composition is bis(tert-pentoxy)(tert-butoxy)silanol.

6. The invention of claim 1 wherein the composition is bis(tert-butoxy)(tert-pentoxy)silanol.

7. Bis(tert-butoxy)(iso-propoxy)silanol.

8. A method for forming a metal or metalloid silicate on a substrate, comprising contacting a metal or metalloid containing compound with a mixed alkoxysilanol selected from the group consisting of bis(tert-butoxy)(iso-propoxy)silanol, bis(iso-propoxy)(tert-butoxy)silanol, bis(tert-pentoxy)(iso-propoxy)silanol, bis(iso-propoxy)(tert-pentoxy)silanol, bis(tert-pentoxy)(tert-butoxy)silanol, bis(tert-butoxy)(tert-pentoxy)silanol and mixtures thereof and reacting the metal or metalloid containing compound with the mixed alkoxysilanol to form the metal or metalloid silicate on the substrate.

9. The method of claim 8 wherein the metal or metalloid containing compound is in the vapor state during reaction.

10. The method of claim 8 wherein the mixed alkoxysilanol is in the vapor state during reaction.

11. The method of claim 8 wherein the mixed alkoxysilanol is bis(tert-butoxy)(iso-propoxy)silanol.

12. The method of claim 8 wherein the metal or metalloid is selected from the group consisting of titanium, hafnium, zirconium, yttrium, lanthanum, scandium magnesium, boron, aluminum and mixtures thereof.

13. The method of claim 12 wherein the metal or metalloid containing compound is selected from metal amides, metal alkoxides, metal hydrides, metal alkyls and mixtures thereof.

14. A method for forming a metal or metalloid silicate on a substrate, comprising contacting a metal or metalloid containing compound with bis(tert-butoxy)(iso-propoxy)silanol and reacting the metal or metalloid containing compound with the bis(tert-butoxy)(iso-propoxy)silanol to form the metal or metalloid silicate on the substrate.

Assignments (4)
RELEASE OF SECURITY INTEREST Recorded Oct 7, 2019
From: CITIBANK, N.A., AS AGENT
To: VERSUM MATERIALS US, LLC
Reel/Frame 050647/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 20, 2017
From: AIR PRODUCTS AND CHEMICALS, INC.
To: VERSUM MATERIALS US, LLC
Reel/Frame 041772/0733 →
PATENT SECURITY AGREEMENT Recorded Oct 27, 2016
From: VERSUM MATERIALS US, LLC
To: CITIBANK, N.A., AS COLLATERAL AGENT
Reel/Frame 040503/0442 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 22, 2005
From: LEI, XINJIAN; RULKENS, RON
To: AIR PRODUCTS AND CHEMICALS, INC.
Reel/Frame 016299/0704 →