IP Library Granted Patent US 8,952,188
Granted Patent B2
US 8,952,188 · App. 12/904,421 · Granted Feb 10, 2015

Group 4 metal precursors for metal-containing films

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Quick Facts
Patent No.
US 8,952,188
App. No.
12/904,421
Granted
Feb 10, 2015
Kind
B2
Abstract

The present invention is related to a family of Group 4 metal precursors represented by the formula: M(OR 1 ) 2 (R 2 C(O)C(R 3 )C(O)OR 1 ) 2 wherein M is a Group 4 metals of Ti, Zr, or Hf; wherein R 1 is selected from the group consisting of a linear or branched C 1-10 alkyl and a C 6-12 aryl, preferably methyl, ethyl or n-propyl; R 2 is selected from the group consisting of branched C 3-10 alkyls, preferably iso-propyl, tert-butyl, sec-butyl, iso-butyl, or tert-amyl and a C 6-12 aryl; R 3 is selected from the group consisting of hydrogen, C 1-10 alkyls, and a C 6-12 aryl, preferably hydrogen. In a preferred embodiment of this invention, the precursor is a liquid or a solid with a melting point below 60° C.

Claims (15)

1. A Group 4 metal precursor represented by the formula:

wherein M is a Group 4 metal selected from the group consisting of Ti, Zr, and Hf; wherein R 1 is selected from the group consisting of a linear or branched C 1-10 alkyl group and a C 6-12 aryl group; R 2 is selected from the group consisting of branched C 3-10 alkyl group and a C 6-12 aryl group; and R 3 is selected from the group consisting of hydrogen, a C 1-10 alkyl group, and a C 6-12 aryl group wherein R 1 in the formula is the same substituent.

2. The precursor of claim 1 wherein R 1 is selected from the group consisting of methyl, ethyl, and n-propyl.

3. The precursor of claim 1 wherein R 2 is tert-butyl.

4. The precursor of claim 3 wherein R 3 is hydrogen.

5. The precursor of claim 1 wherein M is zirconium and R 1 is selected from the group consisting of a branched C 3-10 alkyl group.

6. The precursor of claim 1 , wherein M is titanium.

7. The precursor of claim 6 wherein R 1 is selected from the group consisting of a linear C 1-10 alkyl.

8. A titanium precursor represented by the formula:

wherein R 1 is selected from the group consisting of methyl, ethyl, and n-propyl wherein R 1 in the formula is the same substituent.

9. The precursor of claim 8 where R 1 is methyl.

10. The precursor of claim 8 where R 1 is ethyl.

11. The precursor of claim 8 where R 1 is n-propyl.

12. A solution of the precursor of claim 1 and a solvent.

13. The solution of claim 12 wherein the solvent is selected from the group consisting of octane, ethylcyclohexane, dodecane, toluene, xylene, mesitylene, diethylbezene, and mixture thereof.

Assignments (4)
RELEASE OF SECURITY INTEREST Recorded Oct 7, 2019
From: CITIBANK, N.A., AS AGENT
To: VERSUM MATERIALS US, LLC
Reel/Frame 050647/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 20, 2017
From: AIR PRODUCTS AND CHEMICALS, INC.
To: VERSUM MATERIALS US, LLC
Reel/Frame 041772/0733 →
PATENT SECURITY AGREEMENT Recorded Oct 27, 2016
From: VERSUM MATERIALS US, LLC
To: CITIBANK, N.A., AS COLLATERAL AGENT
Reel/Frame 040503/0442 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 22, 2010
From: IVANOV, SERGEI VLADIMIROVICH; LEI, XINJIAN; CHENG, HANSONG; SPENCE, DANIEL P.; KIM, MOO-SUNG
To: AIR PRODUCTS AND CHEMICALS, INC.
Reel/Frame 025535/0197 →