Organoaminosilanes and methods for making same
View Patent ↗Organoaminosilanes, such as without limitation di-iso-propylaminosilane (DIPAS), are precursors for the deposition of silicon containing films such as silicon-oxide and silicon-nitride films. Described herein are methods to make organoaminosilane compounds, or other compounds such as organoaminodisilanes and organoaminocarbosilanes, via the catalytic hydrosilylation of an imine by a silicon source comprising a hydridosilane.
1. An organoaminocarbosilane compound represented by the following structures:
wherein R, R′ and R″ are each independently selected from hydrogen, a C 1-10 linear alkyl group, a C 3-10 branched alkyl group, a C 3-10 cyclic alkyl group, a C 2-10 alkenyl group, a C 4-10 aromatic group, a C 4-10 heterocyclic group, a C 1-10 linear organoamino group, a C 2-10 branched organoamino group, a silyl group, a C 1-10 linear carbosilyl group, and a C 2-10 branched carbosilyl group and wherein at least one of R′ and R″ or R and R′ or none of R′ and R″ or R and R′ are linked to form substituted or unsubstituted cyclic ring.