Compositions suitable for removing photoresist, photoresist byproducts and etching residue, and use thereof
View Patent ↗Compositions containing certain amines and/or quaternary ammonium compounds, hydroxylamine, corrosion inhibitor, organic diluent and optionally water are capable of removing photoresist, photoresist byproducts and residue and etching residues from a substrate.
1. A composition being free from an alkanol amine wherein the composition comprises
a) about 25-75% by weight of at least one amine represented by the formula:
NR 1 R 2 R 3 wherein each of R 1 , R 2 and R 3 individually is selected from the group consisting of H, aliphatic group, ether group, amino group and aryl group, and an N heterocyclic group optionally containing at least one additional hetero atom selected from the group consisting of N, O and S in the ring; or at least one quaternary ammonium compound represented by the formula
[NR 4 R 5 R 6 R 7 ] − OH wherein each of R 4 , R 5 , R 6 and R 7 individually is an alkyl group;
b) about 10 to about 25% by weight of hydroxylamine;
c) about 0 to about 32% by weight of an organic diluent;
d) about 10 to about 30% by weight of water;
e) about 1 to about 25% by weight of a corrosion inhibitor; and
having a pH of greater than 7.
2. The composition of claim 1 wherein a) comprises an aminoalkylmorpholine.
3. The composition of claim 1 wherein a) comprises aminopropylmorpholine.
4. The composition of claim 1 wherein the organic diluent comprises a water miscible alcohol.
5. The composition of claim 4 wherein the alcohol is represented by at least one of the following:
R 11 —(CHOH) n —R 12 ;
R 11 —(CHOH) n —R 12 —(CHOH) m —R 13 ;
R 11 —(CHOH) n (CR 12 OH) mR13
wherein
n is an integer from 1 to 20
m is an integer from 1 to 20,
and each R 11 , R 12 and R 13 individually is H, alkyl, aryl, or alkoxy.
6. The composition of claim 4 wherein the alcohol comprises at least one member selected from the group consisting of propylene glycol, tripropylene glycol methylether; 1,4-butanediol, propylene glycol propyl ether, diethylene gycol n-butyl ether, hexyloxypropylamine, poly(oxyethylene)diamine and tetrahydrofurfuryl alcohol.
7. The composition of claim 1 wherein the inhibitor comprises at least one member selected from the group consisting of catechol, 4-methylcatechol, fumaric acid, gallic acid and pyrogallol.
8. The composition of claim 1 have a pH of about 7.5 to about 13.
9. A method of removing post etching residue, residual photoresist and/or photoresist byproducts from a substrate which comprises contacting a substrate having thereon at least one member selected from the group consisting of etching residue, residual photoresist and photoresist byproducts with a composition being free from an alkanol amine wherein the composition comprises
a) about 25-75% by weight of at least one amine represented by the formula:
NR 1 R 2 R 3 , wherein each of R 1 , R 2 and R 3 individually is selected from the group consisting of H, aliphatic group, ether group, amino group and aryl group, and an N heterocyclic group optionally containing at least one additional hetero atom selected from the group consisting of N, O and S in the ring; or at least one quaternary ammonium compound represented by the formula
[NR 4 R 5 R 6 R 7 ] − OH wherein each of R 4 , R 5 , R 6 and R 7 individually is an alkyl group;
b) about 10 to about 25% by weight of hydroxylamine;
c) about 0 to about 32% by weight of an organic diluent;
d) about 10 to about 30% by weight of water;
e) about 1 to about 25% by weight of a corrosion inhibitor; and having a pH of greater than 7.
10. A method of removing photoresist from a substrate which comprises contacting a substrate having photoresist thereon with a composition being free from an alkanol amine wherein the composition comprises
a) about 25-75% by weight of at least one amine represented by the formula:
NR 1 R 2 R 3 , wherein each of R 1 , R 2 and R 3 individually is selected from the group consisting of H, aliphatic group, ether group, amino group and aryl group, and an N heterocyclic group optionally containing at least one additional hetero atom selected from the group consisting of N, O and S in the ring; or at least one quaternary ammonium compound represented by the formula
[NR 4 R 5 R 6 R 7 ] − OH wherein each of R 4 , R 5 , R 6 and R 7 individually is an alkyl group;
b) about 10 to about 25% by weight of hydroxylamine;
c) about 0 to about 32% by weight of an organic diluent;
d) about 10 to about 30% by weight of water;
e) about 1 to about 25% by weight of a corrosion inhibitor; and having a pH of greater than 7.