Compositions comprising tannic acid as corrosion inhibitor
Compositions for removing residue comprising tannic acid and/or salt thereof and methods using same are described herein.
1 . A composition for removing residue, the composition comprising:
an organic amine;
optionally an organic solvent; and
at least about 0.5% by weight of tannic acid or salt thereof or both.
2 . The composition of claim 1 wherein the composition comprises from about 0.5 to about 25% by weight of tannic acid or salt thereof or both.
3 . The composition of claim 1 wherein the composition comprises from about 0.5 to about 10% by weight of tannic acid or salt thereof or both.
4 . The composition of claim 1 wherein the the composition comprises from about 0.5 to about 5% by weight of tannic acid or salt thereof or both.
5 . The composition of claim 1 wherein the composition comprises an organic solvent.
6 . The composition of claim 1 wherein the organic amine comprises hydroxylamine.
7 . The composition of claim 1 wherein the organic amine comprise at least one amine represented by the formula: NR 1 R 2 R 3 wherein each of R 1 , R 2 and R 3 individually is selected from the group consisting of H, aliphatic group, ether group, amino group and aryl group, and an N heterocyclic group optionally containing at least one additional hetero atom selected from the group consisting of N, O and S in the ring; or at least one quaternary ammonium compound represented by the formula [NR 4 R 5 R 6 R 7 ]OH wherein each of R 4 , R 5 , R 6 and R 7 individually is an alkyl group.
8 . The composition of claim 7 which further comprises a hydroxylamine.
9 . The composition of claim 1 wherein the organic amine comprises an aminoalkylmorpholine.
10 . The composition of claim 9 wherein the organic amine comprises aminopropylmorpholine.
11 . The composition of claim 9 which further comprises a hydroxylamine.
12 . The composition of claim 5 wherein the organic solvent comprises propylene glycol.
13 . The composition of claim 5 wherein the organic solvent comprises an alkanolamine.
14 . The composition of claim 5 wherein the organic solvent comprises dimethyl sulfoxide.
15 . The composition of claim 1 which further comprises water.
16 . The composition of claim 1 which has a pH of at least 7.
17 . The composition of claim 1 which has a pH of at least about 9.
18 . The composition of claim 1 which has a pH of about 10 to about 12.
19 . A method for removing photoresist or etching residue or both from a substrate wherein comprises contacting said substrate with a composition comprising:
an organic amine;
optionally an organic solvent; and
at least about 0.5% by weight of tannic acid or salt thereof or both.
20 . A method for defining a pattern wherein comprises coating a photoresist onto a substrate,
lithographically defining a pattern on the photoresist;
transferring the pattern the substrate;
removing photoresist or etching residue or both from the substrate by contacting the substrate with a composition that comprises:
an organic amine;
optionally an organic solvent; and
at least about 0.5% by weight of tannic acid or salt thereof or both.