Granted Patent
Utility
US 4,992,306 · App. 07/473,503
Deposition of silicon dioxide and silicon oxynitride films using azidosilane sources
Inventors:
Arthur Kenneth Hochberg, David L. O'Meara, David A. Roberts
Patented Case
View Patent ↗
Granted: Feb 12, 1991
Filed: Feb 1, 1990
Inventors
Arthur Kenneth Hochberg
David L. O'Meara
David A. Roberts
Assignee (at issue)
Air Products and Chemicals, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.