Composition and associated method for catalyzing removal rates of dielectric films during chemical mechanical planarization
View Patent ↗A low solids-content slurry for polishing (e.g., chemical mechanical planarization) of substrates comprising a dielectric and an associated method using the slurry are described. The slurry and associated method afford high removal rates of dielectric during polishing even though the slurry has low solids-content. The slurry comprises a bicarbonate salt, which acts as a catalyst for increasing removal rates of dielectric films during polishing of these substrates.
1. A composition for dielectric polishing consisting essentially of:
a) an abrasive, wherein the abrasive is colloidal silica and the colloidal silica comprises a hydroxide base and has a pH of at least 9.6;
b) at least 0.2% by weight of a bicarbonate salt;
c) a viscosity modifier which is a gum; and
d) water, wherein the composition provides a silicon oxide removal rate of between 3200 Å/min to 4200 Å/min, and wherein the composition exhibits a higher dielectric removal rate than a second composition, said second composition being identical to the composition except that the bicarbonate salt is absent.
2. The composition of claim 1 wherein the bicarbonate salt is present at a level of at least 0.3 weight percent.
3. The composition of claim 1 wherein the hydroxide base is selected from the group consisting of potassium hydroxide and ammonium hydroxide.
4. The composition of claim 1 wherein the gum is xanthan gum.
5. The composition of claim 1 wherein the abrasive is present at a level of less than or equal to 20 weight percent.
6. The composition of claim 1 wherein the viscosity modifier is present at a level between 0.1 and 3 weight percent.
7. The composition of claim 1 wherein the bicarbonate salt is present at a level of at least 0.5 weight percent.
8. The composition of claim 1 wherein the bicarbonate salt is present at a level of at least 0.6 weight percent.
9. The composition of claim 1 wherein the bicarbonate salt is present at a level between 0.6 and 2 weight percent.
10. The composition of claim 1 wherein the colloidal silica is present at a level between 15 and 30 weight percent.
11. The composition of claim 1 wherein the bicarbonate salt is present at a level of at least 0.4% weight percent.
12. The composition of claim 1 wherein the bicarbonate salt is selected from the group consisting of potassium bicarbonate and ammonium bicarbonate.
13. The composition of claim 12 wherein the bicarbonate salt is potassium bicarbonate.
14. A method of polishing a substrate comprising a dielectric with high removal rate of the dielectric, said method comprising the steps of:
A) placing the substrate comprising the dielectric in contact with a polishing pad;
B) delivering a low solids-content composition consisting essentially of:
a) an abrasive, wherein the abrasive is colloidal silica and the colloidal silica comprises a hydroxide base and has a pH of at least 9.6;
b) at least 0.2% by weight of a bicarbonate salt;
c) a viscosity modifier which is a gum; and
d) water, wherein the composition exhibits a higher removal rate than a second composition, said second composition being identical to the low solids-content composition except that the bicarbonate salt is absent; and
C) polishing the substrate with the composition.
15. The method of claim 14 wherein the hydroxide base is selected from the group consisting of potassium hydroxide and ammonium hydroxide.
16. The method of claim 14 wherein the gum is xanthan gum.
17. The method of claim 14 wherein the abrasive is present in the composition at a level of less than or equal to 20 weight percent.
18. The method of claim 14 wherein the dielectric is an oxide.
19. The method of claim 14 wherein the dielectric is a low-k material.
20. The method of claim 19 wherein the low-k material is selected from the group consisting of organic polymers, carbon-doped oxides, fluorinated silicon glass, inorganic porous oxide-like materials, and hybrid organic-inorganic materials.
21. The method of claim 14 wherein the bicarbonate salt in the composition is present at a level of at least 0.3 weight percent.
22. The method of claim 21 wherein the bicarbonate salt is selected from the group consisting of potassium bicarbonate and ammonium bicarbonate.
23. The method of claim 22 wherein the bicarbonate salt is potassium bicarbonate.