Removal of trace arsenic impurities from triethylphosphate (TEPO)
View Patent ↗A method of removing trace levels of arsenic-containing impurities from raw triethylphosphate (TEPO) is disclosed. The method uses adsorption, or adsorption followed by a flash distillation. The method comprises contacting raw triethylphosphate (TEPO) with an adsorbent which selectively adsorbs the arsenic-containing impurities in the raw triethylphosphate (TEPO). The adsorbent is a base promoted alumina containing adsorbent represented by a formula: Z x W y; where x is the weight percentage of Z in the adsorbent ranging from 30% to 99.999%; y is the weight percentage of W in the adsorbent, and x+y=100%; Z is selected from the group consisting of alumina (Al 2 O 3 ), magnesium-alumina based layered double hydroxide (MgO—Al 2 O 3 ), alumina-zeolite, and mixtures thereof; and W is selected from the group consisting of at least one basic metal oxide, at least one basic metal carbonate, and mixtures thereof. The method will result in a final triethylphosphate (TEPO) with a few ppb to less than 1 ppb arsenic containing impurities.
1. A method of removing arsenic-containing impurities from raw triethylphosphate having the arsenic-containing impurities, comprising:
providing an adsorbent selective to adsorb the arsenic-containing impurities with triethylphosphate;
contacting the raw triethylphosphate having the arsenic-containing impurities with the adsorbent; and
adsorbing the arsenic-containing impurities from the raw triethylphosphate having the arsenic-containing impurities to produce a product triethylphosphate having reduced arsenic-containing impurities.
2. The method of claim 1 , wherein the adsorbent is an alumina containing adsorbent.
3. The method of claim 2 , wherein the alumina containing adsorbent is a base promoted alumina containing adsorbent.
4. The method of claim 3 , wherein the base promoted alumina containing adsorbent is represented by a formula: Z x W y; wherein
x is weight percentage of Z in the adsorbent ranging from 30% to 99.999%;
y is weight percentage of W in the adsorbent, and x+y=100%;
Z is selected from the group consisting of alumina (Al 2 O 3 ), magnesium-alumina based layered double hydroxide (MgO—Al 2 O 3 ), alumina-zeolite, and mixtures thereof; and
W is selected from the group consisting of at least one basic metal oxide, at least one basic metal carbonate, and mixtures thereof.
5. The method of claim 4 , wherein the at least one basic metal oxide is at least one basic alkali metal, and the at least one basic metal carbonate is at lease one basic alkali metal carbonate.
6. The method of claim 4 , wherein W is selected from the group consisting of MgO, CaO, Na 2 O, K 2 O, K 2 CO 3 , Na 2 CO 3 , and mixtures thereof.
7. The method of claim 1 , wherein the adsorbent comprises ion exchange resin or activated carbon.
8. The method of claim 1 , wherein the contacting is performed at a temperature ranging from 0° C. to 140° C.
9. The method of claim 1 , wherein the contacting is a static contacting.
10. The method of claim 1 , wherein the contacting is a dynamic contacting, comprising passing the raw triethylphosphate through a column packed with the adsorbent.
11. The method of claim 1 , wherein the adsorbent is activated through heating under vacuum or under a dry inert gas atmosphere before the contacting.
12. The method of claim 1 , wherein the arsenic-containing impurities from the raw triethylphosphate having the arsenic-containing impurities is in the range of 50 ppb to 10,000 ppb, and the reduced arsenic-containing impurities in the product triethylphosphate having the reduced arsenic-containing impurities is less than 10 ppb.
13. A method of removing arsenic-containing impurities from raw triethylphosphate having the arsenic-containing impurities, comprising:
providing an adsorbent selective to adsorb the arsenic-containing impurities with triethylphosphate;
contacting the raw triethylphosphate having the arsenic-containing impurities with the adsorbent; and
adsorbing the arsenic-containing impurities from the raw triethylphosphate having the arsenic-containing impurities to produce a product triethylphosphate having reduced arsenic-containing impurities; and
distilling the product triethylphosphate having reduced arsenic-containing impurities to further remove the arsenic-containing impurities from the product triethylphosphate having reduced arsenic-containing impurities.
14. The method of claim 13 , wherein the adsorbent is an alumina containing adsorbent.
15. The method of claim 14 , wherein the alumina containing adsorbent is a base promoted alumina containing adsorbent.
16. The method of claim 15 , wherein the base promoted alumina containing adsorbent is represented by a formula: Z x W y; wherein
x is weight percentage of Z in the adsorbent ranging from 30% to 99.999%;
y is weight percentage of W in the adsorbent, and x+y=100%;
Z is selected from the group consisting of alumina (Al 2 O 3 ), magnesium-alumina based layered double hydroxide (MgO—Al 2 O 3 ), alumina-zeolite, and mixtures thereof; and
W is selected from the group consisting of at least one basic metal oxide, at least one basic metal carbonate, and mixtures thereof.
17. The method of claim 16 , wherein the at least one basic metal oxide is at least one basic alkali metal, and the at least one basic metal carbonate is at lease one basic alkali metal carbonate.
18. The method of claim 16 , wherein W is selected from the group consisting of CaO, MgO, Na 2 O, K 2 O, K 2 CO 3 , Na 2 CO 3 , and mixtures thereof.
19. The method of claim 13 , wherein the adsorbent comprises ion exchange resin or activated carbon.
20. The method of claim 13 , wherein the contacting is performed at a temperature ranging from 0° C. to 140° C.
21. The method of claim 13 , wherein the contacting is a static contacting.
22. The method of claim 13 , wherein the contacting is a dynamic contacting, comprising passing the raw triethylphosphate through a column packed with the adsorbent.
23. The method of claim 13 , wherein the adsorbent is activated through heating under vacuum or under a dry inert gas atmosphere before the contacting.
24. The method of claim 13 , wherein the arsenic-containing impurities from raw triethylphosphate is in the range of 50 ppb to 10,000 ppb, and the arsenic-containing impurities in the product triethylphosphate after the distilling step is less than 10 ppb.
25. A method of removing arsenic-containing impurities from raw triethylphosphate have the arsenic-containing impurities comprising:
providing an adsorbent selective to adsorb the arsenic-containing impurities with triethylphosphate;
contacting the raw triethylphosphate having the arsenic-containing impurities with the adsorbent; and
adsorbing the arsenic-containing impurities from the raw triethylphosphate having the arsenic-containing impurities to produce a product triethylphosphate having reduced arsenic-containing impurities; and
distilling the product triethylphosphate having reduced arsenic-containing impurities to further remove the arsenic-containing impurities, and remove volatile organic byproducts and non-volatile residual metallic impurities from the product triethylphosphate having reduced arsenic-containing impurities.