IP Library Patent Application 10920541
Patent Application Utility
App. No. 10/920,541 · Confirmation No. 7687

Passivating ALD reactor chamber internal surfaces to prevent residue buildup

Abandoned -- Failure to Respond to an Office Action View Publication ↗
⬇ PDF
Code Description Pages PDF
2007-09-04 ABN Abandonment 2 View
2006-12-12 CTNF Non-Final Rejection 11 View
2006-12-12 892 List of references cited by examiner 1 View
2006-12-12 1449 List of References cited by applicant and considered by examiner 2 View
2006-12-12 SRFW Search information including classification, databases and other search related notes 1 View
2006-12-12 FWCLM Index of Claims 1 View
2006-12-12 BIB Bibliographic Data Sheet 1 View
2006-12-04 SRNT Examiner's search strategy and results 2 View
2004-08-18 TRNA Transmittal of New Application 2 View
2004-08-18 SPEC Specification 9 View
2004-08-18 CLM Claims 4 View
2004-08-18 ABST Abstract 1 View
2004-08-18 DRW Drawings-only black and white line drawings 2 View
2004-08-18 OATH Oath or Declaration filed 5 View
2004-08-18 WFEE Fee Worksheet (SB06) 1 View
2004-08-18 WFEE Fee Worksheet (SB06) 1 View
2004-08-18 IDS Information Disclosure Statement (IDS) Form (SB08) 2 View
2004-08-18 136A Authorization for Extension of Time all replies 2 View
2004-08-18 FOR Foreign Reference 10 View
2004-08-18 FOR Foreign Reference 12 View
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this application's details
Quick Facts
App. No.
10/920,541
Filed
2004-08-18
Pub. No.
US20060040054A1
Art Unit
1762