High temperature atomic layer deposition of silicon oxide thin films
Atomic layer deposition (ALD) process formation of silicon oxide with temperature >500° C. is disclosed. Silicon precursors used have a formula of: R 1 R 2 m Si(NR 3 R 4 ) n X p I. wherein R 1 , R 2 , and R 3 are each independently selected from hydrogen, a linear or branched C 1 to C 10 alkyl group, and a C 6 to C 10 aryl group; R 4 is selected from, a linear or branched C 1 to C 10 alkyl group, and a C 6 to C 10 aryl group, a C 3 to C 10 alkylsilyl group; wherein R 3 and R 4 are linked to form a cyclic ring structure or R 3 and R 4 are not linked to form a cyclic ring structure; X is a halide selected from the group consisting of Cl, Br and I; m is 0 to 3; n is 0, 1 or 2; and p is 0, 1 or 2 and m+n+p=3; and R 1 R 2 m Si(OR 3 ) n (OR 4 ) q X p II. wherein R 1 and R 2 are each independently selected from hydrogen, a linear or branched C 1 to C 10 alkyl group, and a C 6 to C 10 aryl group; R 3 and R 4 are each independently selected from a linear or branched C 1 to C 10 alkyl group, and a C 6 to C 10 aryl group; wherein R 3 and R 4 are linked to form a cyclic ring structure or R 3 and R 4 are not linked to form a cyclic ring structure; X is a halide atom selected from the group consisting of Cl, Br and I; m is 0 to 3; n is 0 to 2; q is 0 to 2; p is 0 to 2; and m+n+q+p=3.
1. A process to deposit silicon oxide comprising the steps of:
a. providing a substrate in a reactor;
b. introducing into the reactor at least one silicon precursor;
c. purging reactor with purge gas;
d. introducing an oxygen source into the reactor; and
e. purging reactor with purge gas; and
wherein steps b through e are repeated until a desired thickness of silicon oxide is deposited;
wherein the process is conducted at one or more temperatures ranging from over 600 to 800° C. and one or more pressures ranging from 50 miliTorr (mT) to 760 Torr; and
wherein the at least one silicon precursor has a formula:
R 1 R 2 m Si(NR 3 R 4 ) n X p I.
wherein R 1 is methyl; R 2 is methyl; R 3 is selected from hydrogen, a linear or branched C 1 to C 10 alkyl group, and a C 6 to C 10 aryl group; and R 4 is selected from, a linear or branched C 1 to C 10 alkyl group, a C 6 to C 10 aryl group, and a C 3 to C 10 alkylsilyl group, wherein R 3 and R 4 are linked to form a cyclic ring structure or R 3 and R 4 are not linked to form a cyclic ring structure X is a halide selected from the group consisting of Cl, Br and I, m is 2, n is 0 or 1, p is 0 or 1, and m+n+p=3.
2. The process of claim 1 , wherein the at least one silicon precursor is selected from the group consisting of diethylaminotrimethylsilane, dimethylaminotrimethylsilane, ethylmethylaminotrimethylsilane, t-butylaminotrimethylsilane, iso-propylaminotrimethylsilane, di-isopropylaminotrimethylsilane, pyrrolidinotrimethylsilane, 2,6-dimethylpiperidinotrimethylsilane, and mixtures thereof.
3. The process of claim 1 , wherein the at least one silicon precursor is selected from the group consisting of iso-propylaminotrimethylsilane, tert-butylaminotrimethylsilane, iso-butylaminotrimethylsilane, Cyclohexaminotrimethylsilane, pyrrolidinotrimethylsilane, 2-methylpyrrolidinotrimethylsilane, 2,5-dimethylpyrrolidinotrimethylsilane, piperidinotrimethylsilane, 2,6-dimethylpiperidinotrimethylsilane, 1-methylpiperazinotrimethylsilane, pyrrolyltrimethylsilane, 2,5-dimethylpyrrolyltrimethylsilane, imidazolyltrimethylsilane, 1,1,1,3,3,3-hexamethyldisilazane, and chlorotrimethylsilane.
4. The process of claim 1 , wherein the pressure ranges from 50 miliTorr (mT) to 100 Torr.
5. The process of claim 1 , wherein the purge gas is selected from the group consisting of nitrogen, helium and argon.
6. The process of claim 1 , wherein the oxygen source is selected from the group consisting of oxygen, peroxide, oxygen plasma, water vapor, water vapor plasma, hydrogen peroxide, nitrous oxide and ozone source.
7. The process of claim 1 , further comprising, after step e, the steps of:
f. introducing water vapor or hydroxyl source into the reactor; and
g. purging reactor with purge gas;
wherein steps b through g are repeated until a desired thickness of silicon oxide is deposited.
8. The process of claim 2 , further comprising, after step e, the steps of:
f. introducing water vapor or hydroxyl source into the reactor; and
g. purging reactor with purge gas;
wherein steps b through g are repeated until a desired thickness of silicon oxide is deposited.