Ion implantation ion source, system and method

1. A multi mode ion source comprising:

an ion source incorporating an ionization chamber for ionizing gas species and configured to have at least two discrete modes of operation; namely, an arc-discharge mode and a non-arc discharge mode of operation.

2. The ion source as recited in claim 1 , further including a cooling mechanism, wherein said ionization chamber is actively cooled by said cooling mechanism.

3. The ion source as recited in claim 2 , further including a second member, wherein said cooling mechanism comprises said ionization chamber being disposed in conductive heat transfer relationship with a second member, the temperature of said second member being actively controlled defining a temperature controlled body.

4. The ion source as recited in claim 3 , further including a gas interface, wherein said conductive heat transfer relationship includes a gas interface between one or more walls of said ionization chamber and said temperature controlled body.

5. The ion source as recited in claim 3 , wherein said temperature controlled body is water-cooled.

6. The ion source as recited in claim 4 , wherein said temperature controlled body is water cooled.

7. The ion source as recited in claim 3 , wherein said temperature controlled body is heated by a heater element.

8. The ion source as recited in claim 3 , wherein the temperature control is accomplished by a control system.

9. The ion source as recited in claim 1 , wherein said non-arc discharge mode is defined by electron impact ionization resulting in a low plasma density within said ionization chamber of said ion source.

10. The ion source as recited in claim 1 , wherein said arc discharge mode is defined by the formation of a plasma by said arc discharge within said ionization chamber of said ion source, the plasma density thus formed being substantially higher than that obtained in said non-arc discharge mode.

11. The ion source as recited in claim 9 , wherein said ion source includes a system for injection of a directed beam of electrons defining an electron beam into said ionization chamber of said ion source resulting in electron impact ionization in said non arc discharge mode.

12. The ion source as recited in claim 10 , wherein said ion source includes an electron source in direct contact with said plasma within said ionization chamber such that said plasma is sustained by said electron source in said arc discharge mode.

13. The ion source as recited in claim 11 , wherein said system includes an electron source for generating said electron beam.

14. The ion source as recited in claim 13 , wherein said electron source is a thermionic emitter of electrons.

15. The ion source as recited in claim 14 , wherein said thermionic emitter is a hot filament.

16. The ion source as recited in claim 14 , wherein said thermionic emitter is an indirectly heated cathode.

17. The ion source as recited in claim 12 , wherein said electron source includes a thermionic emitter of electrons.

18. The ion source as recited in claim 16 , wherein said electron source is external to the ionization chamber of said ion source.

19. The ion source as recited in claim 17 , wherein said electron source is external to the ionization chamber of said ion source.

20. The ion source as recited in claim 18 further including a cooled support structure and, wherein said electron source is mounted to a cooled support structure.

21. The ion source as recited in claim 19 , further including a cooled support structure and wherein said electron source is mounted to said cooled support structure.

22. The ion source as recited in claim 20 , wherein said cooled support structure is configured to be cooled by deionized water.

23. The ion source as recited in claim 21 , wherein said cooled support structure is cooled by deionized water.

24. The ion source as recited in claim 20 , wherein said cooled support structure is configured to be cooled through a gas interface between said support structure and an adjacent temperature-controlled body.

25. The ion source as recited in claim 21 , wherein said cooled support structure is cooled through a gas interface between said support structure and an adjacent temperature-controlled body.

26. The ion source as recited in claim 1 , further including an electrode, the polarity of the said electrode being positive with respect to said ionization chamber during operation in non-arc discharge mode, and negative with respect to said ionization chamber in arc discharge mode.

27. The ion source as recited in claim 26 , wherein in said arc discharge mode, said electrode functions as an electron repeller.

28. The ion source as recited in claim 1 , wherein the ionization chamber of said ion source contains an axial magnetic field.

29. The ion source as recited in claim 28 , wherein said axial field provides confinement of the electron beam in non-arc discharge mode, and enables operation in a reflex geometry in arc discharge mode.

30. The ion source as recited in claim 17 , wherein said thermionic emitter is a hot filament.

31. The ion source as recited in claim 17 , wherein said thermionic emitter is an indirectly heated cathode.