Patent Assignment
Reel/Frame 021380/0018
Release of Security Interest
Recorded: 2008-08-13
Pages: 6
Assignor
TUNA INVESTMENTS, LLC, AS COLLATERAL AGENT
Executed: 2008-08-07
Assignee
SEMEQUIP, INC.
34 SULLIVAN ROAD, NORTH BILLERICA, MASSACHUSETTS, 01862
Covered Properties
(54)
Electron Beam Ion Source with Integral Low-Temperature Vaporizer
Ion Implantation Ion Source, System and Method
Electron Impact Ion Source
Electron Beam Ion Source with Integral Low-Temperature Vaporizer
Method of manufacturing CMOS devices by the implantation of N- and P-type cluster ions
Application:
10/251,491 →
Publication:
US 2004/0002202
Ion Implantation System and Control Method
Ion Implantation Device and a Method of Semiconductor Manufacturing by the Implantation of Boron Hydride Cluster Ions
Semiconductor Device and Method of Fabricating a Semiconductor Device
Method and Apparatus for Extending Equipment Uptime in Ion Implantation
Controlling the Flow of Vapors Sublimated from Solids
Electron Impact Ion Source
Ion Implantation Ion Source, System and Method
Ion Implantation Ion Source, System and Method
Ion Implantation Ion Source, System and Method
Isotopically-Enriched Boranes and Methods of Preparing Them
Methods of Synthesis of Isotopically Enriched Borohydride and Methods of Synthesis of Isotopically Enriched Boranes
Method of Production of B10H102-Ammonium Salts and Methods of Production of B18H22
Ion Implantation Ion Source, System and Method
Dual Mode Ion Source for Ion Implantation
Ion Implantation System and Control Method
Method and Apparatus for Extracting Ions from an Ion Source for Use in Ion Implantation
Method and apparatus for extracting ions from an ion source for use in ion implantation
Application:
11/502,695 →
Publication:
US 2006/0272776
Dual Mode Ion Source for Ion Implantation
System and Method for the Manufacture of Semiconductor Devices by the Implantation of Carbon Clusters
Method and Apparatus for Extending Equipment Uptime in Ion Implantation
Method and apparatus for extracting ions from an ion source for use in ion implantation
Application:
11/647,719 →
Publication:
US 2007/0108395
Ion Implantation System and Control Method
Ion Implantation Device and a Method of Semiconductor Manufacturing by the Implantation of Boron Hydride Cluster Ions
Method and apparatus for extending equipment uptime in ion implantation
Application:
11/647,898 →
Publication:
US 2007/0241689
Method of Manufacturing Cmos Devices by the Implantation of N- and P-Type Cluster Ions
Ion Implantation Ion Source, System and Method
Semiconductor device and method of fabricating a semiconductor device
Application:
11/647,928 →
Publication:
US 2008/0200020
Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions
Application:
11/648,091 →
Publication:
US 2007/0181830
Method and Apparatus for Extracting Ions from an Ion Source for Use in Ion Implantation
Ion Implantation System and Control Method
Controlling the flow of vapors sublimated from solids
Application:
11/648,365 →
Publication:
US 2008/0073559
Dual mode ion source for ion implantation
Application:
11/648,366 →
Publication:
US 2008/0042580
Dual mode ion source for ion implantation
Application:
11/648,378 →
Publication:
US 2007/0170372
Ion implantation ion source, system and method
Application:
11/648,506 →
Publication:
US 2007/0107841
Ion Implantation Device and a Method of Semiconductor Manufacturing by the Implantation of Ions Derived from Carborane Molecular Species
Application:
11/759,768 →
Publication:
US 2008/0305598
Ion Implantation Ion Source, System and Method
Application:
11/778,272 →
Publication:
US 2007/0278417
Ion Implantation with Molecular Ions Containing Phosphorus and Arsenic
Dual Mode Ion Source for Ion Implantation
External Cathode Ion Source
Cluster Ion Implantation for Defect Engineering
Method and Apparatus for Extending Equipment Uptime in Ion Implantation
Application:
12/105,702 →
Publication:
US 2008/0223409
Method and System for Extracting Ion Beams Composed of Molecular Ions (Cluster Ion Beam Extraction System)
Ion implantation device and a method of semiconductor manufacturing by the implantation of molecular ions containing phosphorus and arsenic
Application:
60/856,994 →
Vapor delivery system useful with ion sources and vaporizer for use in such system
Application:
60/860,631 →
Cluster ion implantation for defect engineering
Application:
60/922,826 →
Method and System for Extracting Ion Beams Composed of Molecular Ions (Cluster Ion Beam Extraction System)
Application:
60/939,505 →
Method for Extending Equipment Uptime in Ion Implantation
Application:
60/974,176 →
Ion Source Gas Reactor
Application:
61/022,562 →
Dual chamber
Application:
61/053,934 →
Related Assignments
(14)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Jan 8, 2004
From: HORSKY, THOMAS N.; COHEN, BRIAN C.; KRULL, WADE A.; SACCO, GEORGE P., JR.
To: SEMEQUIP, INC
Reel/Frame 014985/0854 →
Assignment of Assignor's Interest
Jan 21, 2005
From: SPIELVOGEL, BERNARD; COOK, KEVIN
To: SEMEQUIP INC.
Reel/Frame 016220/0789 →
Assignment of Assignor's Interest
Jan 31, 2005
From: SPIELVOGEL, BERNARD; COOK, KEVIN
To: SEMEQUIP INC.
Reel/Frame 016246/0154 →
Assignment of Assignor's Interest
Mar 23, 2005
From: SPIELVOGEL, BERNARD; COOK, KEVIN
To: SEMEQUIP INC.
Reel/Frame 016396/0331 →
Assignment of Assignor's Interest
Dec 28, 2006
From: KRULL, WADE A.; JACOBSON, DALE C.
To: SEMEQUIP INC.
Reel/Frame 018685/0949 →
Assignment of Assignor's Interest
Dec 28, 2006
From: HORSKY, THOMAS N.
To: SEMEQUIP INC.
Reel/Frame 018686/0091 →
Assignment of Assignor's Interest
Dec 28, 2006
From: HORSKY, THOMAS N.; WILLIAMS, JOHN NOEL
To: SEMEQUIP INC.
Reel/Frame 018686/0104 →
Assignment of Assignor's Interest
Mar 14, 2007
From: HORSKY, THOMAS N.; SACCO, JR., GEORGE P.; MILGATE, ROBERT W.; JACOBSON, DALE C.
To: SEMEQUIP, INC.
Reel/Frame 019010/0336 →
Assignment of Assignor's Interest
Apr 5, 2007
From: HORSKY, THOMAS N.; MILGATE, ROBERT W., III
To: SEMEQUIP
Reel/Frame 019123/0299 →
Corrective Assignment to Correct the Corrective Assignment. Inventor "Wade a. Krull" Nneds to Be Added. Previously Recorded on Reel 019010/Frame 0336. Previously Recorded on Reel 019010 Frame 0336. Assignor(S) Hereby Confirms the to Add "Wade a. Krull" as an Inventor..
Jun 29, 2007
From: HORSKY, THOMAS N.; MILGATE, ROBERT W.; SACCO, GEORGE P.; JACOBSON, DALE C.
To: SEMEQUIP, INC.
Reel/Frame 019497/0075 →
Assignment of Assignor's Interest
Sep 21, 2007
From: YU, PETER
To: AMERICAN PROMOTIONAL EVENTS, INC.
Reel/Frame 019890/0165 →
Security Agreement
Jul 28, 2008
From: SEMEQUIP, INC.
To: TUNA INVESTMENTS, LLC, AS COLLATERAL AGENT
Reel/Frame 021301/0023 →
Nunc Pro Tunc Assignment
Nov 25, 2008
From: JACOBSON, DALE C.
To: SEMEQUIP, INC.
Reel/Frame 021890/0053 →
Assignment of Assignor's Interest
Dec 19, 2008
From: HORSKY, THOMAS N.; JACOBSON, DALE C.
To: SEMEQUIP, INC.
Reel/Frame 022007/0656 →