IP Library Granted Patent US 7,928,406
Granted Patent B2
US 7,928,406 · App. 12/125,176 · Granted Apr 19, 2011

Method and system for extracting ion beams composed of molecular ions (cluster ion beam extraction system)

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Quick Facts
Patent No.
US 7,928,406
App. No.
12/125,176
Granted
Apr 19, 2011
Kind
B2
Abstract

A new type of triode extraction system, a Cluster Ion Beam Extraction System, is disclosed for broad energy range cluster ion beam extraction applications while still being applicable to atomic and molecular ion species as well. The extraction aperture plate contours are set to minimize the beam cross over and at the same time shield the source from excess extraction electric fields thus allowing smaller values of the extraction gap. In addition, a novel focusing feature is integrated into these new optics which allows the beam to be either focused or de-focused in the non-dispersive plane by using a bipolar bias voltage of only a few kV over a broad range of beam energy. This is a superior solution to a stand-alone electrostatic lens solution, for example an einzel lens, which would require tens of kV of bias voltage in order to be able to focus an energetic beam.

Claims (15)

1. An ion extraction system for extracting ions from an ion source, the ion extraction system comprising:

an extraction aperture plate electrode forming one wall of an ionization chamber of an ion source, said extraction aperture plate formed with an aperture through which ions are transported;

a suppression electrode disposed adjacent said extraction aperture plate, said suppression electrode formed with an aperture through which ions are transported, said aperture in said suppression electrode configured to be generally aligned with said aperture in said extraction aperture plate; and

a ground electrode disposed adjacent said extraction electrode, said ground electrode formed with an aperture, said aperture in said ground electrode generally aligned with said apertures in said suppression electrode and said extraction aperture plate electrode, wherein said aperture in said extraction aperture plate electrode is configured to minimize over-focus of a cluster ion current.

2. The ion extraction system as recited in claim 1 , wherein said aperture in said extraction aperture plate electrode is formed with a flat portion from the upstream edge of the aperture.

3. The ion extraction system as recited in claim 2 , wherein said aperture in said extraction aperture plate electrode is formed with a trench portion adjacent the flat portion.

4. The ion extraction system as recited in claim 3 , wherein said trench portion is formed with a uniform angle throughout the thickness of the extraction aperture plate.

5. The ion extraction system as recited in claim 3 , wherein said trench portion is formed with a non-uniform angle throughout the thickness of the extraction aperture plate.

6. An ion extraction system for extracting ions from an ion source, the ion extraction system comprising:

an extraction aperture plate electrode forming one wall of an ionization chamber of an ion source, said extraction aperture plate formed with an aperture through which ions are transported;

a suppression electrode disposed adjacent said extraction aperture plate, said suppression electrode formed with an aperture through which ions are transported, said aperture in said suppression electrode generally aligned with said aperture in said extraction aperture plate electrode; and

a ground electrode disposed adjacent said suppression electrode, said ground electrode formed with an aperture, said aperture in said ground electrode generally aligned with said apertures in said suppression electrode and said extraction aperture plate electrode, wherein said extraction aperture plate electrode formed with an upper portion, a lower portion and a main plate which includes an extraction aperture, said upper portion, said lower portion and said main plate electrically insulated from one another, said upper and lower portions adapted to receive electrical bias voltages for focusing said ion beam.

7. The ion extraction system as recited in claim 6 , wherein said bias voltages have the same polarity.

8. The ion extraction system as recited in claim 7 , wherein said bias voltages have a positive polarity.

9. The ion extraction system as recited in claim 7 , wherein said bias voltages have a negative polarity.

Assignments (3)
RELEASE OF SECURITY INTEREST Recorded Aug 13, 2008
From: TUNA INVESTMENTS, LLC, AS COLLATERAL AGENT
To: SEMEQUIP, INC.
Reel/Frame 021380/0018 →
SECURITY AGREEMENT Recorded Jul 28, 2008
From: SEMEQUIP, INC.
To: TUNA INVESTMENTS, LLC, AS COLLATERAL AGENT
Reel/Frame 021301/0023 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 3, 2008
From: HORSKY, THOMAS N.; HAHTO, SAMI K.
To: SEMEQUIP, INC.
Reel/Frame 021195/0661 →