Method for manufacturing sidewall contacts for a chalcogenide memory device
View Patent ↗A method for manufacturing sidewall contacts for a chalcogenide memory device is disclosed. A first conductive layer is initially deposited on top of a first oxide layer. The first conductive layer is then patterned and etched using well-known processes. Next, a second oxide layer is deposited on top of the first conductive layer and the first oxide layer. An opening is then etched into at least the first oxide layer such that a portion of the first conductive layer is exposed within the opening. The exposed portion of the first conductive layer is then removed from the opening such that the first conductive layer is flush with an inner surface or sidewall of the opening. After depositing a chalcogenide layer on top of the second oxide layer, filling the opening with chalcogenide, a second conductive layer is deposited on top of the chalcogenide layer.
1. A chalcogenide memory device comprising:
a substrate;
a first conductive layer in contact with a diffusion within said substrate via a first contact;
a chalcogenide layer in contact with said first conductive layer via a sidewall of a second contact; and
a second conductive layer in contact with said chalcogenide layer.
2. The chalcogenide memory device of claim 1 , wherein said conductive layer is a metal layer.
3. The chalcogenide memory device of claim 1 , wherein said conductive layer is a polysilicon layer.
4. The chalcogenide memory device of claim 1 , wherein said first conductive layer is approximately 300 Å thick.
5. The chalcogenide memory device of claim 1 , wherein said second conductive layer is a metal layer.
6. The chalcogenide memory device of claim 1 , wherein said second conductive layer is a polysilicon layer.
7. The chalcogenide memory device of claim 1 , wherein said second conductive layer is approximately 300 Å thick.
8. The chalcogenide memory device of claim 1 , wherein said chalcogenide layer is approximately 500 Å thick.