Nitride semiconductor light emitting device and method of manufacturing the same
View Patent ↗Disclosed herein is a nitride semiconductor light emitting device. The nitride semiconductor light emitting device comprises an n-type nitride semiconductor layer on a substrate, an active layer formed on the n-type nitride semiconductor layer so that a portion of the n-type nitride semiconductor layer is exposed, a p-type nitride semiconductor layer formed on the active layer, a high-concentration dopant area on the p-type nitride semiconductor layer, a counter doping area on the high-concentration dopant areas, an n-side electrode formed on an exposed portion of the n-type nitride semiconductor layer, and a p-side electrode formed on the counter doping area. A satisfactory ohmic contact for the p-side electrode is provided by an ion implantation process and heat treatment.
1. A nitride semiconductor light emitting device, comprising:
an n-type nitride semiconductor layer formed on a substrate;
an active layer formed on the n-type nitride semiconductor layer so that a portion of the n-type nitride semiconductor layer is exposed;
a p-type nitride semiconductor layer formed on the active layer;
a high-concentration dopant area formed by doping p-type dopant in a high concentration on the p-type nitride semiconductor layer;
a counter doping area formed by doping n-type dopant in a high concentration on the high-concentration dopant area;
an n-side electrode formed on an exposed portion of the n-type nitride semiconductor layer; and
a p-side electrode formed on the counter doping area.
2. The device as set forth in claim 1 , wherein the p-type dopant in the high-concentration dopant area comprises at least one selected from the group of Zn, Be, Mg and Cd.
3. The device as set forth in claim 1 , wherein the n-type dopant in the counter doping area comprises Si.
4. The device as set forth in claim 1 , wherein the p-side electrode comprises Al and Ti.
5. The device as set forth in claim 1 , wherein the p-type dopant in the high-concentration dopant area has a concentration of 1×10 18 ˜1×10 19 /cm 3 .
6. The device as set forth in claim 5 , wherein the n-type dopant in the counter doping area has a concentration of 1×10 18 ˜1×10 20 /cm 3 .
7. The device as set forth in claim 1 , wherein the p-type nitride semiconductor layer has a thickness of 0.2˜0.5 μm.
8. The device as set forth in claim 7 , wherein the high-concentration dopant area has a thickness of 0.01˜0.1 μm.
9. The device as set forth in claim 8 , wherein the counter doping area has a thickness of 0.01˜0.1 μm.
10. The device as set forth in claim 1 , wherein the high-concentration dopant area and the counter doping area are formed using an ion implantation process on the p-type clad layer and a heat treatment process.
11. A method of manufacturing the nitride semiconductor light emitting device, comprising the steps of:
a) forming an n-type nitride semiconductor layer on a substrate;
b) forming an active layer on the n-type nitride semiconductor layer so that a portion of the n-type nitride semiconductor layer is exposed;
c) forming a p-type nitride semiconductor layer on the active layer;
d) forming a high-concentration dopant area by doping p-type dopant in a high concentration on the p-type nitride semiconductor layer, and a counter doping area by doping n-type dopant in a high concentration on the high-concentration dopant area; and
e) forming an n-side electrode and a p-side electrode on an exposed portion of the n-type nitride semiconductor layer and on the counter doping area, respectively.
12. The method as set forth in claim 11 , wherein the p-type type dopant in the high-concentration dopant area comprises at least one selected from the group of Zn, Be, Mg and Cd.
13. The method as set forth in claim 11 , wherein the n-type dopant in the counter doping area comprises Si.
14. The method as set forth in claim 11 , wherein the p-side electrode comprises Al and Ti.
15. The method as set forth in claim 11 , wherein the p-type dopant in the high-concentration dopant area has a concentration of 1×10 18 ˜1×10 19 /cm 3 .
16. The method as set forth in claim 15 , wherein the n-type dopant in the counter doping area has a concentration of 1×10 18 ˜1×10 20 /cm 3 .
17. The method as set forth in claim 11 , wherein the p-type nitride semiconductor layer has a thickness of 0.2˜0.5 μm.
18. The method as set forth in claim 17 , wherein the high-concentration dopant area has a thickness of 0.01˜0.1 μm.
19. The method as set forth in claim 18 , wherein the counter doping area has a thickness of 0.01˜0.1 μm.
20. The method as set forth in claim 11 , wherein the step d) comprises the steps of:
d-1) implanting p-type dopant ions in a high concentration on the p-type nitride semiconductor layer;
d-2) implanting n-type dopant ions in a high concentration on the p-type dopant area; and
d-3) rapid thermal annealing the n-type dopant area and the p-type dopant area, which are doped in a high concentration.
21. The method as set forth in claim 20 , wherein the step d-1) and the step d-2) comprise the step of implanting the respective dopant ions with an energy of about 100˜200 KeV, respectively.
22. The method as set forth in claim 20 , wherein the step d-3) comprises the step of rapid thermal annealing at a temperature of about 600˜1,200° C.