IP Library Granted Patent US 7,326,952
Granted Patent B2
US 7,326,952 · App. 10/839,311 · Granted Feb 5, 2008

Elevated pore phase-change memory

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 7,326,952
App. No.
10/839,311
Granted
Feb 5, 2008
Kind
B2
Abstract

An elevated phase-change memory cell facilitates manufacture of phase-change memories by physically separating the fabrication of the phase-change memory components from the rest of the semiconductor substrate. In one embodiment, a contact in the substrate may be electrically coupled to a cup-shaped conductor filled with an insulator. The conductor couples current up to the elevated pore while the insulator thermally and electrically isolates the pore.

Claims (25)

1. A memory comprising:

a semiconductor structure;

a base contact formed on said semiconductor structure;

an insulating layer over said semiconductor structure;

a passage formed through said insulating layer, said passage including a tubular electrical connection to said base contact;

an insulator within said connection;

a cup-shaped heater electrically coupled to said connection; and

a phase-change material electrically coupled to said contact through said electrical connection and said heater.

2. The memory of claim 1 wherein said electrical connection is cup-shaped.

3. The memory of claim 1 including a sidewall spacer on said cup-shaped heater.

4. The memory of claim 3 wherein the phase-change material is formed over said sidewall spacer and in contact with said heater.

5. The memory of claim 1 wherein said heater is recessed below the upper surface of said insulating layer.

6. The memory of claim 5 including an upper electrode over said phase-change material.

7. A memory comprising:

a semiconductor structure;

a phase-change material spaced above said semiconductor structure;

a pair of stacked cup-shaped connectors electrically coupling said phase-change material to said semiconductor structure; and

an insulator between said cup-shaped connectors.

8. The memory of claim 7 including an insulating layer over said semiconductor structure.

9. The memory of claim 8 including a passage formed through said insulating layer.

10. The memory of claim 9 wherein said passage is lined with said stacked cup-shaped connectors.

11. The memory of claim 7 including a base electrode electrically coupled to said phase-change material and said connectors.

12. The memory of claim 7 including a sidewall spacer over one of said connectors and under said phase-change material.

13. The memory of claim 12 wherein said sidewall spacer is positioned within said passage and wherein said sidewall spacer is cylindrical.

14. The memory of claim 13 including an upper electrode over said phase-change material.

Assignments (2)
CHANGE OF NAME Recorded Jul 18, 2016
From: CARLOW INNOVATIONS, LLC
To: OVONYX MEMORY TECHNOLOGY, LLC
Reel/Frame 039379/0077 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 8, 2015
From: OVONYX, INC.
To: CARLOW INNOVATIONS LLC
Reel/Frame 037244/0954 →