Method of dry etching semiconductor substrate to reduce crystal defects in a trench
View Patent ↗A silicon oxide film ( 12 ) and a silicon nitride film ( 13 ) are sequentially formed over a silicon substrate ( 11 ) having a plane orientation (100). A trench ( 14 ) is formed with the patterned silicon nitride ( 13 ) as a mask. Argon is ion-implanted from the direction normal to a plane orientation (111) of the interior of the trench ( 14 ), followed by formation of an oxide film.
1. A method of manufacturing a semiconductor device, comprising the steps of sequentially:
forming a trench in a silicon substrate by a dry etching method;
implanting an ion species into a bottom portion of the trench;
forming a sacrificial silicon oxide film inside the trench by execution of oxidation processing;
removing the sacrificial silicon oxide film; and
forming a silicon oxide trench-liner film;
wherein the silicon substrate has a plane orientation (100); and
wherein the implantation of the ion species is carried out from the direction normal to a plane orientation (111).
2. The method according to claim 1 , wherein the ion species is inactive electrically to silicon.
3. The method according to claim 2 , wherein the ion species is an ion species selected from He, Ar, Kr, Xe and Rn.
4. The method according to claim 2 , wherein the ion-implanted element is an ion species that accelerates oxidation.
5. The method according to claim 4 , wherein the ion species is an ion species selected from O, F and C.
6. A method of manufacturing a semiconductor device, comprising the steps of sequentially:
forming a trench in a silicon substrate by a dry etching method;
implanting an ion species into a bottom portion of the trench;
forming a sacrificial silicon oxide film inside the trench by execution of oxidation processing; and
wherein the silicon substrate has a plane orientation (100); and wherein the implantation of the ion species is carried out from the direction normal to a plane orientation (111).
7. The method according to claim 6 , wherein the ion species is inactive electrically to silicon.
8. The method according to claim 7 , wherein the ion species is an ion species selected from He, Ar, Kr, Xe and Rn.
9. The method according to claim 7 , wherein the ion-implanted element is an ion species that accelerates oxidation.
10. The method according to claim 9 , wherein the ion species is an ion species selected from O, F and C.
11. A method of manufacturing a semiconductor device, comprising the steps of sequentially:
covering a surface of a silicon substrate with a silicon nitride film;
forming a trench in the silicon substrate by a dry etching method;
implanting an ion species into a bottom portion of the trench;
forming a sacrificial silicon oxide film inside the trench by oxidation processing, using the silicon nitride film as a mask;
removing the sacrificial silicon oxide film;
forming a silicon oxide trench-liner film, using the silicon nitride film as a mask;
embedding a silicon oxide material into the trench; and
removing the silicon nitride film.
12. The method according to claim 11 , comprising a step of covering the surface of the silicon substrate with a silicon oxide layer before the step of covering the surface with the silicon nitride film, wherein the silicon nitride film is formed on the silicon oxide layer.
13. The method according to claim 12 , wherein the silicon oxide layer is formed by thermal treatment.