IP Library › Granted Patent US 7,061,166
Granted Patent B2
US 7,061,166 · App. 10/846,588 · Granted Jun 13, 2006

Laminated structure and method of manufacturing the same

Assignee: Fuji Photo Film Co., Ltd.
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Quick Facts
Patent No.
US 7,061,166
App. No.
10/846,588
Granted
Jun 13, 2006
Kind
B2
Abstract

A laminated structure in which interconnections can be easily formed for electrodes and in which the damage of an insulating layer attributed to stress is relieved. The laminated structure includes a laminated piece having a first electrode layer provided with a first insulating region, a piezoelectric material layer, and a second electrode layer provided with a second insulating region at a position different from that of the first insulating region, a first interconnection line electrically connected to the first electrode layer while passing through the second insulating region provided in the second electrode layer, and a second interconnection line electrically connected to the second electrode layer while passing through the first insulating region provided in the first electrode layer.

Claims (45)

1. A laminated structure comprising:

a laminated piece having a plurality of piezoelectric material layers and a plurality of electrode layers stacked in a predetermined sequence, said plurality of electrode layers including a first electrode layer provided with a first insulating region and a second electrode layer provided with a second insulating region at a position different from that of the first insulating region;

a first interconnection line electrically connected to the first electrode layer while passing through the second insulating region provided in the second electrode layer; and

a second interconnection line electrically connected to the second electrode layer while passing through the first insulating region provided in the first electrode layer,

wherein said laminated piece further has at least one of a piezoelectric material layer provided as a lowermost layer and a piezoelectric material layer provided as an uppermost layer, and

wherein at least one of the first and second interconnection lines extends to an intermediate part of either one of the piezoelectric material layer disposed as the lowermost layer and the piezoelectric material layer disposed as the uppermost layer.

2. A laminated structure according to claim 1 , wherein said at least one of the piezoelectric material layer disposed as the lowermost layer and the piezoelectric material layer disposed as the uppermost layer is thicker than each of said plurality of piezoelectric material layers.

3. A laminated structure according to claim 1 , wherein each of said first and second interconnection lines has a diameter of not larger than 30 μm.

4. A laminated structure comprising:

a laminated piece having a plurality of piezoelectric material layers and a plurality of electrode layers stacked in a predetermined sequence, said plurality of electrode layers including a first electrode layer provided with a first insulating region and a second electrode layer provided with a second insulating region at a position different from that of the first insulating region;

a first interconnection line electrically connected to the first electrode layer while passing through the second insulating region provided in the second electrode layer; and

a second interconnection line electrically connected to the second electrode layer while passing through the first insulating region provided in the first electrode layer,

wherein at least one of the first and second interconnection lines is formed to extend along an edge of said laminated piece.

5. A laminated structure according to claim 4 , wherein the first and second interconnection lines are formed of a metal material with which through-holes formed in said laminated piece are filled up.

6. A laminated structure according to claim 4 , wherein each of said first and second interconnection lines has a diameter of not larger than 30 μm.

7. A laminated structure according to claim 4 , wherein said laminated piece further has at least one of a piezoelectric material layer provided as a lowermost layer and a piezoelectric material layer provided as an uppermost layer.

8. A laminated structure comprising:

a plurality of laminated pieces arrayed in two dimensions, each of said plurality of laminated pieces having a plurality of piezoelectric material layers and a plurality of electrode layers stacked in a predetermined sequence, said plurality of electrode layers including a first electrode layer provided with a first insulating region and a second electrode layer provided with a second insulating region at a position different from that of the first insulating region;

a first plurality of interconnection lines each electrically connected to the first electrode layer while passing through the second insulating region provided in the second electrode layer; and

a second plurality of interconnection lines each electrically connected to the second electrode layer while passing through the first insulating region provided in the first electrode layer, and

an insulating material packed among said plurality of laminated pieces,

wherein at least ones of said first plurality of interconnection lines and said second plurality of interconnection lines are disposed to pass through boundaries between said insulating material and said plurality of laminated pieces.

9. A method of manufacturing a laminated structure, said method comprising the steps of:

(a) forming a laminated piece by stacking a plurality of piezoelectric material layers and a plurality of electrode layers in a predetermined sequence, said plurality of electrode layers including a first electrode layer provided with a first insulating region and a second electrode layer provided with a second insulating region at a position different from that of the first insulating region;

(b) forming, after step (a), at least one through-hole to penetrate the first electrode layer while passing through the second insulating region provided in the second electrode layer;

(c) forming, after step (a), at least one through-hole to penetrate the second electrode layer while passing through the first insulating region provided in the first electrode layer; and

(d) filling up the through-holes formed at steps (b) and (c) with a metal material to form at least one interconnection line electrically connected to the first electrode layer and at least one interconnection line electrically connected to the second electrode layer.

10. A method of manufacturing a laminated structure, said method comprising the steps of:

(a) forming a laminated piece by stacking a plurality of piezoelectric material layers and a plurality of electrode layers in a predetermined sequence, said plurality of electrode layers including a first electrode layer provided with a first group of insulating regions and a second electrode layer provided with a second group of insulating regions at positions different from those of the first group of insulating regions;

(b) forming a plurality of through-holes to penetrate the first electrode layer while respectively passing through the second group of insulating regions provided in the second electrode layer;

(c) forming a plurality of through-holes to penetrate the second electrode layer while respectively passing through the first group of insulating regions provided in the first electrode layer;

(d) filling up the pluralities of through-holes formed at steps (b) and (c) with a metal material to form a plurality of interconnection lines electrically connected to the first electrode layer and form a plurality of interconnection lines electrically connected to the second electrode layer;

(e) forming at least one trench in said laminated piece to partially divide said laminated piece; and

(f) packing an insulating material into said at least one trench formed at step (e).

11. A method of manufacturing a laminated structure according to claim 10 , further comprising the step of:

cutting said laminated piece to separate said laminated piece into a plurality of parts to be held by the insulating material.

12. A method of manufacturing a laminated structure, said method comprising the steps of:

(a) forming a laminated piece by stacking a plurality of piezoelectric material layers and a plurality of electrode layers in a predetermined sequence, said plurality of electrode layers including a first electrode layer provided with a first group of insulating regions and a second electrode layer provided with a second group of insulating regions at positions different from those of the first group of insulating regions;

(b) forming at least one trench in said laminated piece to partially divide said laminated piece;

(c) packing an insulating material into said at least one trench formed at step (b);

(d) forming a plurality of through-holes to respectively pass through boundaries between the insulating material and the divided first electrode layers and boundaries between the insulating material and the second group of insulating regions provided in the divided second electrode layers;

(e) forming a plurality of through-holes to respectively pass through boundaries between the insulating material and the divided second electrode layers and boundaries between the insulating material and the first group of insulating regions provided in the divided first electrode layers; and

(f) filling up the pluralities of through-holes formed at steps (d) and (e) with a metal material to form a plurality of interconnection lines electrically connected to the divided first electrode layers respectively and form a plurality of interconnection lines electrically connected to the divided second electrode layers respectively.

13. A method of manufacturing a laminated structure according to claim 12 , further comprising the step of:

cutting said laminated piece to separate said laminated piece into a plurality of parts to be held by the insulating material.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 15, 2007
From: FUJIFILM HOLDINGS CORPORATION (FORMERLY FUJI PHOTO FILM CO., LTD.)
To: FUJIFILM CORPORATION
Reel/Frame 018904/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 17, 2004
From: KUNIYASU, TOSHIAKI
To: FUJI PHOTO FILM CO., LTD.
Reel/Frame 015346/0075 →
Priority Claims (1)
JP 2003-149377 · May 27, 2003 · national
Continuity (1)
Related Publication 20040251784A1 · Dec 16, 2004