IP Library Granted Patent US 7,193,189
Granted Patent B2
US 7,193,189 · App. 10/858,274 · Granted Mar 20, 2007

Systems and methods for monitoring or controlling the ratio of hydrogen to water vapor in heat metal treating atmospheres

Assignee: Furnace Control Corp.
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Quick Facts
Patent No.
US 7,193,189
App. No.
10/858,274
Granted
Mar 20, 2007
Kind
B2
Abstract

Systems and methods for monitoring a heat treating atmosphere derive from at least one sensor placed in situ in the atmosphere a process variable, which is indicative of the ratio of gaseous hydrogen H 2 (g) to water vapor H 2 O (g) in the atmosphere. The systems and methods use the process variable, e.g., to control the atmosphere, or to record or display the process variable.

Claims (26)

1. A heat treating system comprising

a heat treating furnace,

an atmosphere source for supplying a preselected gas atmosphere to the furnace,

a heat source to maintain the preselected gas atmosphere inside the furnace at a preselected temperature not greater than a temperature at which wustite (FeO) forms,

an oxygen sensor located in situ in the furnace in contact with the preselected gas atmosphere, the oxygen sensor providing a first electrical input that varies according to oxygen content of the preselected atmosphere,

a temperature sensor located in situ in the furnace in contact with the preselected gas atmosphere, the temperature sensor providing a second electrical input that varies according to temperature of the preselected atmosphere, and

a processor to generate a computed ratio of gaseous hydrogen H 2 (g) to water vapor H 2 O (g) for the preselected atmosphere as a function of the first and second electrical inputs.

2. A system according to claim 1

and further including an output for the computed ratio.

3. A system according to claim 2

wherein the output is coupled to a device for displaying the computed ratio.

4. A system according to claim 2

wherein the output is coupled to a device for recording the computed ratio.

5. A system according to claim 2

wherein the output is coupled to a controller for the atmosphere source.

6. A system according to claim 1

wherein the processor includes an atmosphere control function comprising a comparator to compare the computed ratio to a selected set point and generate a deviation, and

further including an output for the deviation.

7. A system according to claim 6

wherein the output is coupled to a controller for the atmosphere source.

8. A system according to claim 1

wherein the heat treating atmosphere comprises an H 2 /N 2 atmosphere.

9. A system according to claim 1

wherein the heat treating atmosphere contains CO, CO 2 , H 2 , and H 2 O.

10. A system according to claim 1

wherein the heat treating atmosphere comprises a steam atmosphere.

Assignments (2)
SECURITY INTEREST Recorded Sep 2, 2015
From: UNITED PROCESS CONTROLS INC.
To: BANK OF MONTREAL
Reel/Frame 036478/0351 →
MERGER Recorded Dec 21, 2011
From: MARATHON MONITORS INC.; FURNACE CONTROL CORPORATION
To: UNITED PROCESS CONTROL INC.
Reel/Frame 027513/0038 →
Continuity (3)
Division 0996810900 · Oct 1, 2001
Division 0921839000 · Dec 22, 1998
Related Publication 20040256774A1 · Dec 23, 2004