IP Library Granted Patent US 7,504,051
Granted Patent B2
US 7,504,051 · App. 10/860,432 · Granted Mar 17, 2009

Applicator liquid for use in electronic manufacturing processes

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Quick Facts
Patent No.
US 7,504,051
App. No.
10/860,432
Granted
Mar 17, 2009
Kind
B2
Abstract

Certain spin-coatable liquids and application techniques are described, which can be used to form nanotube films or fabrics of controlled properties. A spin-coatable liquid containing nanotubes for use in an electronics fabrication process includes a solvent containing a plurality of nanotubes. The nanotubes are at a concentration of greater than 1 mg/L. The nanotubes are pretreated to reduce the level of metallic and particulate impurities to a preselected level, and the preselected metal and particulate impurities levels are selected to be compatible with an electronics manufacturing process. The solvent also is selected for compatibility with an electronics manufacturing process.

Claims (26)

1. An applicator liquid for use in an electronics manufacturing process, comprising:

an electronics-grade solvent and a plurality of nanotubes, wherein

the applicator liquid is free of polymers and is free of surfactant,

wherein the nanotubes are at a concentration of greater than or equal to 10 mg/L,

wherein the nanotubes are separated from one another and are distributed in the solvent without precipitation or flocculation and can remain separated for about at least one week;

wherein the nanotubes are pretreated to reduce a level of metal impurities to less than about 1×10 18 atoms/cm 3 , and

wherein said applicator liquid is free of particulates having a diameter greater than about 500 nm.

2. The applicator liquid of claim 1 , wherein the solvent is selected for compatibility with the electronics manufacturing process.

3. The applicator liquid of claim 1 , wherein the solvent is selected for compatibility with a semiconductor manufacturing process.

4. The applicator liquid of claim 1 , wherein the applicator liquid is compatible with a semiconductor manufacturing process.

5. The applicator liquid of claim 1 , wherein the nanotubes are at a concentration of greater than 100 mg/L.

6. The applicator liquid of claim 1 , wherein the nanotubes are at a concentration of greater than 1000 mg/L.

7. The applicator liquid of claim 1 , wherein the solvent is a non-halogen solvent.

8. The applicator liquid of claim 1 , wherein the solvent is a non-aqueous solvent.

9. The applicator liquid of claim 1 , wherein the solvent comprises ethyl lactate.

10. The applicator liquid of claim 1 , wherein the nanotubes are single-walled nanotubes.

11. The applicator liquid of claim 1 , wherein the applicator liquid is free of particulate impurities having a diameter greater than about 200 nm.

12. The applicator liquid of claim 1 , wherein the applicator liquid is free of particulate impurities having a diameter greater than about 100 nm.

13. The applicator liquid of claim 1 , wherein the applicator liquid is free of particulate impurities having a diameter greater than about 45 nm.

14. The applicator liquid of claim 1 , wherein the applicator liquid comprises less than about 1×10 18 atoms/cm 3 of transition metal impurities.

15. The applicator liquid of claim 1 , wherein the applicator liquid comprises less than about 1×10 18 atoms/cm 3 of heavy metal impurities.

16. The applicator liquid of claim 1 , wherein the applicator liquid comprises less than about 1×10 18 atoms/cm 3 of group I and group II metal impurities.

17. The applicator liquid of claim 1 , wherein the applicator liquid comprises less than about 15×10 10 atoms/cm 3 of metal impurities.

18. The applicator liquid of claim 1 , wherein the applicator liquid comprises less than about 15×10 10 atoms/cm 3 of transition metal impurities.

19. The applicator liquid of claim 1 , wherein the applicator liquid comprises less than about 15×10 10 atoms/cm 3 of heavy metal impurities.

20. The applicator liquid of claim 1 , wherein the applicator liquid comprises less than about 15×10 10 atoms/cm 3 of group I and group II metal impurities.

Assignments (5)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 8, 2021
From: NANTERO, INC.
To: ZEON CORPORATION
Reel/Frame 056789/0932 →
RELEASE OF SECURITY INTEREST IN PATENTS Recorded Jul 8, 2021
From: SILICON VALLEY BANK
To: NANTERO, INC.
Reel/Frame 056790/0001 →
CONFIRMATORY LICENSE Recorded Apr 23, 2021
From: NANTERO, INC.
To: ZEON CORPORATION
Reel/Frame 056032/0509 →
CONFIRMATORY LICENSE Recorded Apr 23, 2021
From: NANTERO, INC.
To: ZEON CORPORATION
Reel/Frame 056032/0549 →
INTELLECTUAL PROPERTY SECURITY AGREEMENT Recorded Nov 11, 2020
From: NANTERO, INC.
To: SILICON VALLEY BANK
Reel/Frame 054383/0632 →