IP Library Granted Patent US 7,098,112
Granted Patent B2
US 7,098,112 · App. 10/865,578 · Granted Aug 29, 2006

Preparation of field emission array comprising nanostructures

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Quick Facts
Patent No.
US 7,098,112
App. No.
10/865,578
Granted
Aug 29, 2006
Kind
B2
Abstract

A field emission array which does not contain any organic material is manufactured by separately preparing nanostructures whose one ends were coated and then adhering the coated ends of the nanostructures to a metal electrode layer formed on a substrate.

Claims (11)

1. A method for preparing a field emission array which comprises the steps of:

(1) forming a metal catalyst layer on a first substrate and then growing a plurality of nanostructures on the catalyst layer;

(2) coating one end of each grown nanostructure with at least one material selected from the group consisting of a metal, an alloy, and an oxide, nitride, carbide, sulfide and chloride thereof;

(3) isolating the one end-coated nanostructures from the first substrate and placing them on a patterned metal electrode layer formed on a second substrate; and

(4) causing the coated ends of the nanostructures to adhere to the metal electrode layer formed on the second substrate.

2. The method of claim 1 , wherein the metal catalyst layer formed in step (1) comprises at least one material selected from the group consisting of a metal, an alloy, and an oxide, nitride, carbide, sulfide, chloride, nitrate and sulfonate thereof.

3. The method of claim 1 , wherein the nanostructures grown in step (1) are carbon nanofibers, carbon nanotubes, carbon nanohorns or nanowires.

4. The method of claim 1 , wherein the nanostructures obtained in step (1) are surface-treated prior to step (2).

5. The method of claim 4 , wherein the nanostructures are surface-treated with at least one material selected from the group consisting of ozone, nitrogen oxide(NO x ), ammonia, hydrogen cyanide(HCN), sulfoxide(SO x ), chlorine, carbon dioxide, hydrochloric acid, nitric acid, fluoric acid, phosphoric acid, sulfuric acid, hydrogen peroxide, potassium permanganate, chlorine dioxide, potassium iodide, pyridine and hydrogen sulfide.

6. The method of claim 1 , wherein the material used for the coating step (2) is the same as the constituent of the metal electrode layer.

7. The method of claim 1 , wherein the adhesion step (4) is conducted by heating at a temperature ranging from 100 to 1500° C.

Assignments (5)
CHANGE OF NAME Recorded Jan 16, 2015
From: SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
To: CORNING PRECISION MATERIALS CO., LTD.
Reel/Frame 034774/0676 →
CHANGE OF NAME Recorded Aug 6, 2010
From: SAMSUNG CORNING PRECISION GLASS CO., LTD.
To: SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
Reel/Frame 024804/0238 →
CORRECTIVE ASSIGNMENT TO CORRECT THE ASSIGNEE/ASSIGNOR PREVIOUSLY RECORDED ON REEL 020624 FRAME 0240. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER. Recorded May 16, 2008
From: SAMSUNG CORNING CO., LTD.
To: SAMSUNG CORNING PRECISION GLASS CO., LTD.
Reel/Frame 020956/0832 →
MERGER Recorded Mar 10, 2008
From: SAMSUNG CORNING PRECISION GLASS CO., LTD.
To: SAMSUNG CORNING CO., LTD.
Reel/Frame 020624/0240 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 9, 2004
From: JUNG, KYEONG-TAEK; KIM, MYUNG-SOO; JEON, KWAN-GOO; CHO, SEOG-HYUN
To: SAMSUNG CORNING CO., LTD.
Reel/Frame 015467/0601 →