Integrated fuse with regions of different doping within the fuse neck
View Patent ↗An integrated fuse has regions of different doping located within a fuse neck. The integrated fuse includes a polysilicon layer and a silicide layer. The polysilicon layer includes first and second regions having different types of dopants. In one example, the first region has an N-type dopant and the second region has a P-type dopant. The polysilicon layer can also include a third region in between the first and second regions, which also has a different dopant. During a fusing event, a distribution of temperature peaks around the regions of different dopants. By locating regions of different dopants within the fuse neck, agglomeration of the silicide layer starts reliably within the fuse neck (for example, at or near the center of the fuse neck) and proceeds toward the contact regions. An improved post fuse resistance distribution and an increased minimum resistance value in the post fuse resistance distribution is realized compared to conventional polysilicon fuses.
1. An apparatus, comprising:
at least one polysilicon layer including (i) first and second regions along a longitudinal axis thereof and (ii) a third region positioned between the first and second regions, of the first and second regions abutting respective sides of the third region;
wherein one of the first and second regions includes a first type dopant and the other includes a second type dopant; and
wherein the third region is one of (i) an undoped region, (ii) a region having a doping range substantially equal to the first and second regions, and (iii) a region heavily doped with N-type and P-type dopants.
2. The apparatus of claim 1 , wherein the apparatus is programmable.
3. The apparatus of claim 1 , wherein a distal end of each of the first and second regions defines respective first and second contact portions.
4. The apparatus of claim 3 , wherein the third region is a neck; and
wherein the neck is substantially centered along the longitudinal axis.
5. The apparatus of claim 1 , wherein the first type dopant includes polysilicon having P-type dopants; and
wherein the second type dopant includes polysilicon having N-type dopants.
6. The apparatus of claim 5 , wherein the N-type and P-type dopants are within a range of 1×10 15 to 5×10 16 ions/cm 2 .
7. The apparatus of claim 6 , wherein the third region comprises the undoped region; and
wherein the third region includes undoped polysilicon.
8. The apparatus of claim 6 , wherein the third region comprises the region having a doping range substantially equal to the first and second regions; and
wherein the third region includes polysilicon having a region of P-type and N-type dopants within a range of 1×10 15 to 5×10 16 ions/cm 2 .
9. The apparatus of claim 5 , wherein the N-type and P-type dopants are within a range of 1×10 13 to 5×10 14 ions/cm 2 .
10. The apparatus of claim 9 , wherein the third region comprises the undoped region; and
wherein the third region includes undoped polysilicon.
11. The apparatus of claim 9 , wherein the third region comprises the region having a doping range substantially equal to the first and second regions; and
wherein the third region includes polysilicon having a region of P-type and N-type dopants within a range of 1×10 13 to 5×10 14 ions/cm 2 .