Use of PMOD materials in layered (3D) manufacturing technology
The invention generally encompasses a method for producing a three-dimensional layered structure comprising at least one layer of a metal-containing material in order to provide functionality. The method comprises sequentially forming each of a plurality of layers, wherein each layer of the plurality of layers has predetermined dimensions, and wherein at least one of the layers comprises a metal-containing material. The plurality of layers is stacked to create an integral three-dimensional layered structure with predetermined dimensions.
1 . A method of layered manufacturing, comprising:
sequentially forming each of a plurality of layers, wherein each layer of the plurality of layers has predetermined dimensions, and wherein at least one of the layers comprises a metal-containing material; and
stacking each of the plurality of layers to create an integral three-dimensional layered structure with predetermined dimensions.
2 . The method of claim 1 , further comprising rinsing the three-dimensional layered structure to remove excess material comprising the metal-containing material.
3 . The method of claim 1 , further comprising post-exposing the three-dimensional layered structure.
4 . The method of claim 1 , 2 or 3 , further comprising finishing the three-dimensional layered structure.
5 . The method of claim 1 , wherein the at least one layer comprising a metal-containing material is formed by a process comprising:
applying a precursor comprising at least one metal on a substrate to form a precursor layer;
exposing a predetermined portion of the precursor layer; and
developing the precursor layer, thereby creating a pattern of metal-containing material comprising a remaining portion of the precursor.
6 . The method of claim 1 , wherein the at least one layer comprising a metal-containing material is formed by a process comprising:
dipping a platform into a vat of precursor material to a predetermined depth, thereby forming a precursor layer of a predetermined thickness, wherein the precursor layer of a predetermined thickness may optionally be formed on an underlying layer on the platform;
exposing a predetermined portion of the precursor layer, thereby creating a pattern of metal-containing material; and
rinsing unexposed precursor material from the pattern of metal-containing material.
7 . The method of claim 1 , wherein the at least one layer comprising a metal-containing material is formed by a process comprising
applying a precursor comprising at least one metal within a cavity of a three-dimensional layered structure, thereby forming a pattern of metal-containing material in the shape of the cavity; and
optionally exposing the pattern of metal-containing material.
8 . The method of claim 1 , wherein the at least one layer comprising a metal-containing material comprises a molecular metal-ligand complex.
9 . The method of claim 8 , wherein the metal-ligand complex comprises particles in contact with at least one ligand.
10 . The method of claim 9 , wherein the particles comprise sol particles.
11 . The method of claim 9 , wherein the particles comprise microparticles.
12 . The method of claim 9 , wherein the particles comprise nanoparticles.
13 . The method of claim 9 , wherein the particles comprise ceramics.
14 . The method of claim 9 , wherein the particles comprise alloys.
15 . The method of claim 10 , further comprising transforming the metal-ligand complex into a gel.
16 . The method of claim 5 or 6 , wherein said exposing comprises photochemically reacting, photothermally reacting and combinations thereof.
17 . The method of claim 16 , wherein said exposing comprises radiating the predetermined portion of the precursor layer with electromagnetic radiation.
18 . The method of claim 17 , wherein the electromagnetic radiation comprises ultraviolet radiation.
19 . The method of claim 5 , wherein said developing comprises contacting the predetermined portion with a polar solvent.
20 . The method of claim 5 , wherein said developing comprises contacting the predetermined portion with a protic solvent.
21 . The method of claim 5 , further comprising pre-exposing the precursor layer to energy before said exposing.
22 . The method of claim 21 , wherein said pre-exposing comprises photochemically reacting, photothermally reacting and combinations thereof.
23 . The method of claim 22 , wherein the pre-exposing comprises radiating the predetermined portion of the precursor layer with electromagnetic radiation.
24 . The method of claim 23 , wherein the electromagnetic radiation comprises ultraviolet radiation.
25 . The method of claim 21 , wherein the pre-exposing further comprises selecting a predetermined fraction of a minimum energy necessary for developing the predetermined portion of the precursor.
26 . The method of claim 21 , further comprising post-exposing the precursor to energy after said exposing.
27 . The method of claim 5 further comprising post-exposing the precursor to energy after said exposing.
28 . The method of claims 26 or 27 , wherein said post-exposing comprises photochemically reacting, photothermally reacting and combinations thereof.
29 . The method of claims 26 or 27 , wherein the post-exposing comprises radiating the predetermined portion of the precursor layer with electromagnetic radiation.
30 . The method of claim 26 or 27 , wherein the electromagnetic radiation comprises ultraviolet radiation.