Pigment grade corrosion inhibitor host-guest compositions and procedure
A pigment grade corrosion inhibitor and a method of applying the inhibitor is disclosed. The inhibitor is comprised of a host species comprised of an inorganic compound having a layered structure and a guest species comprised an anionic species of a weak acid. The host species is preferably a double hydroxide having a structure of: [M(II) 1−x M(III) x (OH − ) 2 ][A n− x/n .yH 2 O], where M(II) is a divalent metal cationic species, M(III) is a trivalent metal cationic species, and A n− is an anionic species, preferably with the species present in a range of: 0.2≦M(III)/(M(II)+M(III))≦0.4. The guest species include: various phosphoric acids and derivatives thereof; various molybdic acids and derivatives; boric acid; cyanamidic acid; nitrous acid; derivatives of thio- and dithiocarbonic acid; thio-organic compounds functionalized with at least one —SH group of acidic character, including: 2,5-dimercapto-1,3,4-thiadiazole (DMTD), 2,4-dimercapto-s-triazolo-[4,3-b]-1,3-4 thiadiazole, trithiocyanuric acid (TMT), and dithiocyanuric acid, and various derivatives thereof.
1. A process for protecting a metal substrate against atmospheric corrosion comprising the steps of:
providing a metal surface to be protected; and
applying a pigment grade coating to said surface, said coating comprising a protective material selected from a host-guest compound, said host compound comprising a hydrotalcite compound, said guest compound is selected from DMTD and derivatives of DMTD.
2. The process according to claim 1 , wherein said host compound has a structure of:
[M(II) 1−x M(III) x (OH − ) 2 ][A n− x/n .yH 2 O],
wherein M(II) is a monovalent or divalent metal cationic species, M(III) is a trivalent metal cationic species, and A n− is an anionic species.
3. The process according to claim 1 , wherein said DMTD and DMTD derivative is selected from the group consisting of:
2,5-dimercapto-1,3,4-thiadiazole (DMTD), 2,4-dimercapto-s-triazolo-[4,3-b]-1,3-4 thiadiazole, trithiocyanuric acid (TMT), and dithiocyanuric acid, various N-,S- and N,N-, S,S- and N,S-substituted derivatives of the above DMTD and TMT compounds; various S-substituted derivatives of trithiocyanuric acid; dimer and polymer derivatives of the above DMTD and TMT compounds, including 5,5′ dithio-bis(1,3,4 thiadiazole-2(3H)-thione or (DMTD) 2 , and (DMTD) n , polymers of DMTD and (TMT) 2 , dimers and polymers of TMT; various combinations of all the above;
soluble salts of DMTD and TMT;
poly-ammonium salt of DMTD or (DMTD) n and TMT formed with polyamines;
mercapto-benzothiazole, mercapto-benzoxazole, mercapto-benzimidazole, and combinations, thereof;
di- and poly-mercapto compounds, including:
di-mercapto derivatives of thiophene, pyrrole, furane, diazoles, and thiadiazoles; di- and tri-mercapto derivatives of pyridine, diazines, triazines, benzimidazole, and benzothiazole, including dimercaptopyridine, 2,4-dithiohydantoine, and 2,4,-dimercapto-6-amino-5-triazine.
4. The process according to claim 2 , wherein M(II) is selected from the group consisting of: Mg(II), Zn(II), Fe(II), Mn(II), Cu(II), Ca(II), Sr(II) and Li(I), and M(III) is selected from the group consisting of Al(III), Ga(III), Fe(III), Mn(III), Cr(III), Ce(III), La(III) and Ni(III).
5. A process for protecting an aluminum substrate against atmospheric corrosion comprising the steps of:
providing an aluminum surface to be protected; and
applying a pigment grade coating to said surface, said coating comprising a protective material selected from a host-guest compound, said host compound comprising a hydrotalcite compound, said guest compound is selected from DMTD and derivatives of DMTD.
6. The process according to claim 5 , wherein said host compound has a structure of:
[M(II) 1−x M(III) x (OH − ) 2 ][A n− x/n .yH 2 O],
wherein M(II) is a monovalent or divalent metal cationic species, M(III) is a trivalent metal cationic species, and A n− is an anionic species.
7. The process according to claim 5 , wherein said DMTD and DMTD derivative is selected from the group consisting of: 2,5-dimercapto-1,3,4-thiadiazole (DMTD), 2,4-dimercapto-s-triazolo-[4,3-b]-1,3-4 thiadiazole, trithiocyanuric acid (TMT), and dithiocyanuric acid, various N-,S- and N,N-, S,S- and N,S-substituted derivatives of the above DMTD and TMT compounds; various S-substituted derivatives of trithiocyanuric acid; dimer and polymer derivatives of the above DMTD and TMT compounds, including 5,5′ dithio-bis(1,3,4 thiadiazole-2(3H)-thione or (DMTD) 2 , and (DMTD) n , polymers of DMTD and (TMT) 2 , dimers and polymers of TMT; various combinations of all the above;
soluble salts of DMTD and TMT;
poly-ammonium salt of DMTD or (DMTD) n and TMT formed with polyamines;
mercapto-benzothiazole, mercapto-benzoxazole, mercapto-benzimidazole, and combinations, thereof;
di- and poly-mercapto compounds, including:
di-mercapto derivatives of thiophene, pyrrole, furane, diazoles, and thiadiazoles; di- and tri-mercapto derivatives of pyridine, diazines, triazines, benzimidazole, and benzothiazole, including dimercapropyridine, 2,4-dithiohydantoine, and 2,4,-dimercapto-6-amino-5-triazine.
8. The process according to claim 6 , wherein M(II) is selected from the group consisting of: Mg(II), Zn(II), Fe(II), Mn(II), Cu(II), Ca(II), Sr(II) and Li(I), and M(III) is selected from the group consisting of Al(III), Ga(III), Fe(III), Mn(III), Cr(III), Ce(III), La(III) and Ni(III).