Optical element, optical drop module, optical add-drop module, and tunable light source
An optical element has a structure in that a first mirror stack layer is formed on a substrate. A first transparent conductive film, a conductive buffer layer, a spacer layer having a primary or secondary electrooptic effect, a conductive buffer layer and a second transparent conductive film are stacked thereon in succession; and a second mirror stack layer is further formed thereon. A voltage is applied between the first and second transparent conductive films. The applied voltage change the refractive index of the spacer, changes a wavelength to be transmitted through or reflected from the layer.
1. An optical element comprising at least one cavity which includes:
a first composite stack layer having a first mirror stack layer formed by alternately stacking a plurality of first and second dielectric thin films having respectively different refractive indexes and a first conductive film formed on the first mirror stack layer;
a second composite stack layer having a second mirror stack layer formed by alternately stacking a plurality of first and second dielectric thin films having respectively different refractive indexes and a second conductive film formed on the second mirror stack layer;
a spacer layer placed between said first and second composite stack layers and made of a plane dielectric member having at least either primary or secondary electrooptic effect; and
a conductive buffer layer formed between at least one of said first composite stack layer and said second composite stack layer and said spacer layer;
wherein said first mirror stack layer is formed by stacking a first dielectric thin film which is made of a high refractive index material and has a physical film thickness of a ¼-wavelength of a design wavelength and a second dielectric thin film which is made of a low refractive index material having a refractive index lower than the high refractive index material and has a physical film thickness of the ¼-wavelength, alternately at least one time,
said second mirror stack layer is formed by stacking a first dielectric thin film which is made of the high refractive index material and has the physical film thickness of the ¼-wavelength and a second dielectric thin film which is made of the low refractive index material having the refractive index lower than the high refractive index material and has the physical film thickness of the ¼-wavelength, alternately at least one time,
said spacer layer is placed between said first and second mirror stack layers and is made of a dielectric thin film having a film thickness of positive even-number times the physical film thickness of the ¼-wavelength and having a primary or secondary electrooptic effect,
said first conductive film is made of a conductive thin film which has a film thickness of positive odd-number times the physical film thickness of the ¼-wavelength, and
said second conductive film is made of a transparent conductive thin film which has a film thickness of positive odd-number times the physical film thickness of the ¼-wavelength.
2. An optical element according to claim 1 , wherein
a plurality of said cavities are stacked in a form of a layer.
3. An optical element according to claim 1 , wherein
each of said cavities includes a characteristic controlling unit which controls spectrum characteristics of light rays made incident on said first and second composite stack layers and transmitted through or reflected from the layer, in response to a voltage applied between said first and second conductive films.
4. An optical element according to claim 1 , wherein
said conductive buffer layer is made of at least one material selected from a metal material, an oxide material, a nitride material and an alloy material, and has resistivity of at most 10 −2 Ωcm, with a thickness set in a range from 0.1 nm to 10 nm.
5. An optical element according to claim 1 , wherein
said spacer layer is a thin film formed through vapor deposition and made of an oxide dielectric material that exhibits at least one of primary and secondary electrooptic effects, and has at least one film structure selected from a polycrystal film, an oriented film and an epitaxial film, with a thickness in a range from 10 nm to 50 μm.
6. An optical element according to claim 5 , wherein
said oxide dielectric material is Pb 1-x La x (Zr 1-y Ti y ) 1-x/4 O 3 , (0≦X<1.0, 0≦Y≦1.0).
7. An optical element according to claim 5 , wherein
said oxide dielectric material is Sr x Ba 1-x TiO 3 , (0≦X≦1.0).
8. An optical element according to claim 5 , wherein
said oxide dielectric material is KTa x Nb 1-x O 3 , (0≦X≦1.0).
9. An optical element according to claim 1 , wherein
said optical element is a tunable optical filter.