Method for coating substrates
View Patent ↗A method for depositing a coating layer on at least a part of a surface of a substrate is described. The method includes supplying a coating substance to at least part of a surface of a substrate. The substrate is subjected to a relative movement with respect to a source of the coating substance. The surface tension of the coating substance is modified, at least locally, at least part of the time while the at least part of the substrate is subjected to the movement. A thickness of the coating layer is influenced by modifying the surface tension of the coating substance.
1. A method for depositing a coating layer on at least part of a surface of a substrate comprising the steps of:
applying a coating substance to the at least part of the surface of the substrate to form a deposited coating layer, such that the deposited coating layer, the coating substance, and a gas phase intersect at a three-phase region;
subjecting the substrate to a relative movement with respect to a source of the coating substance, and
at least part of the time while subjecting the substrate to the movement, controlling the thickness of the deposited coating layer by generating a surface tension gradient between (i) a first point of the coating substance at the three-phase region and (ii) a second point of the coating substance by delivering isopropyl alcohol to the coating substance at the three-phase region.
2. The method of claim 1 , wherein the step for generating a surface tension gradient in the coating substance is performed by an external device.
3. The method of claim 1 , wherein the isopropyl alcohol is in the form of a liquid, a solid, a vapor, a mist, or a gas.
4. The method of claim 1 , wherein the isopropyl alcohol creates a local lowering of the surface tension and decreases the thickness of the coating layer.
5. The method of claim 1 , wherein the isopropyl alcohol creates a local raising of the surface tension and increases the thickness of the coating layer.
6. The method of claim 1 , wherein the coating layer is a continuous layer.
7. The method of claim 1 , wherein the coating layer is a non-continuous layer.
8. The method of claim 1 , wherein the coating substance is selected from the group consisting of a molten material, a sol gel solution, and a film precursor brought into a liquid state.
9. The method of claim 1 , wherein the movement is selected from the group consisting of rotational, linear, and a combination of both rotational and linear.
10. The method of claim 1 , wherein the surface of the substrate has a position selected from the group consisting of horizontal, vertical, and oblique.
11. The method of claim 1 , wherein the method for depositing a coating layer is used in integrated circuit fabrication.
12. A method comprising:
applying a coating substance from a source to a substrate in contact with a gas phase to form a deposited coating layer, such that the deposited coating layer, the coating substance, and the gas phase intersect at a three-phase region;
while applying the coating substance, subjecting the substrate and the source to relative movement; and
while applying the coating substance and subjecting the substrate and the source to relative movement, controlling the thickness of the deposited coating layer by generating a surface tension gradient in the coating substance by delivering isopropyl alcohol to the coating substance at the three-phase region.
13. The method of claim 12 , wherein the isopropyl alcohol is in the form of a liquid, a solid, a vapor, a mist, or a gas.