Bond pad structure for copper metallization having increased reliability and method for fabricating same
View Patent ↗According to one exemplary embodiment, a structure in a semiconductor die comprises a metal pad situated in an interconnect metal layer, where the metal pad comprises copper. The structure further comprises an interlayer dielectric layer situated over the metal pad. The structure further comprises a terminal via defined in the interlayer dielectric layer, where the terminal via is situated on the metal pad. The terminal via extends along only one side of the metal pad. The structure further comprises a terminal metal layer situated on the interlayer dielectric layer and in the terminal via. The structure further comprises a dielectric liner situated on the terminal metal layer, where a bond pad opening is defined in the dielectric liner, and where the bond pad opening exposes a portion of the terminal metal layer. The interlayer dielectric layer is situated between the exposed portion of the terminal metal layer and metal pad.
1. A structure in a semiconductor die, said structure comprising:
a metal pad situated in an interconnect metal layer, said metal pad comprising copper;
an interlayer dielectric layer situated over said metal pad;
a terminal via defined in said interlayer dielectric layer, said terminal via being situated on said metal pad;
a terminal metal layer situated on said interlayer dielectric layer and in said terminal via, said terminal via forming a via ring around said metal pad, said terminal metal layer filling in said via ring, and said via ring and said terminal metal layer making contact with said metal pad;
a dielectric liner situated on said terminal metal layer, wherein said terminal metal layer comprises a contact metal layer and a barrier layer, said barrier layer being situated on said interlayer dielectric layer;
a bond pad opening defined in said dielectric liner, said bond pad opening exposing a portion of said terminal metal layer;
wherein said interlayer dielectric layer is situated between said portion of said terminal metal layer and said metal pad, said interlayer dielectric layer being enclosed by said via ring, whereby said interlayer dielectric layer blocks and prevents diffusion of copper from said metal pad into said terminal metal layer.
2. The structure of claim 1 further comprising an intermediate dielectric layer situated between said interlayer dielectric layer and said metal pad.
3. The structure of claim 1 wherein said contact metal layer comprises aluminum.
4. The structure of claim 1 wherein said interlayer dielectric layer comprises TEOS oxide.
5. The structure of claim 1 wherein said barrier layer comprises tantalum.
6. A structure situated in a semiconductor die, said structure comprising:
a metal pad situated in an interconnect metal layer, said metal pad comprising copper;
an interlayer dielectric layer situated over said metal pad;
an intermediate dielectric layer situated over said interlayer dielectric layer;
a terminal via defined in said interlayer dielectric layer and said intermediate dielectric layer, said terminal via being situated on said metal pad;
a terminal metal layer situated on said interlayer dielectric layer and in said terminal via, said terminal via forming a via ring around said metal pad, said terminal metal layer filling in said via ring, and said via ring and said terminal metal layer making contact with said metal pad, wherein said terminal metal layer comprises a contact metal layer situated on a barrier layer;
a dielectric liner situated on said terminal metal layer;
a bond pad opening defined in said dielectric liner, said bond pad opening exposing a portion of said terminal metal layer;
wherein said interlayer dielectric layer and said intermediate dielectric layer are situated between said portion of said terminal metal layer and said metal pad, said interlayer dielectric layer being enclosed by said via ring, whereby said interlayer dielectric layer blocks and prevents diffusion of copper from said metal pad into said terminal metal layer.
7. The structure of claim 6 wherein said intermediate dielectric layer comprises silicon nitride.