Variably shaped beam EB writing system
View Patent ↗A variably shaped beam EB writing system which draws a pattern, comprises a recognition module, an adjustment module, and a drawing module. The recognition module recognizes at least one of a first length unit to specify a pattern length and a first position unit to specify a position described to a pattern data. The adjustment module adjusts at least one of a second length unit to specify a pattern length which is drawn by the variably shaped beam EB writing system and a second position unit to specify a position thereof to a value of which at least one of the first length unit and the first position unit are divided by a natural number. The drawing module draws a predetermined pattern based on at least one of the second length unit and the second position unit adjusted by the adjustment module.
1. A variably shaped beam EB writing system which irradiates an energy beam and draws a pattern based on pattern data that includes predetermined pattern information, comprising:
a recognition unit configured to recognize at least one of a first length unit defining a pattern length and a first position unit defining a pattern position, both the first length unit and the first position unit being included in the pattern data;
a change unit configured to change at least one of a second length unit and a second position unit of the variably shaped beam EB writing system to a value of which at least one of the first length unit and the first position unit is divided by a first number, wherein the first number is a natural number; and
a drawing unit configured to draw the pattern based on at least one of the changed second length unit and the changed second position unit.
2. The variably shaped beam EB writing system according to claim 1 , further comprising:
a memory unit configured to store a deflection amount of the energy beam or a position correction equation corresponding to the at least one of the first length unit and the first position unit, wherein
the change unit is configured to change the at least one of the second length unit and the second position unit based on the memorized position correction equation or the memorized deflection amount.
3. The variably shaped beam EB writing system according to claim 1 , wherein the first number further comprises said natural number multiplied by a fraction.