Patent Assignment
Reel/Frame 045433/0337
Assignment of Assignor's Interest
Recorded: 2018-04-04
Pages: 5
Assignor
KABUSHIKI KAISHA TOSHIBA
Executed: 2018-03-30
Assignee
TOSHIBA MEMORY CORPORATION
1-1, SHIBAURA 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Properties
(26)
Mask Pattern Preparing Method and Photomask
Patent:
6,180,293 →
Application:
09/340,148 →
Charged Beam Lithography System
Patent:
6,313,476 →
Application:
09/459,648 →
Pattern writing method
Patent:
6,346,354 →
Application:
09/533,265 →
Charged Particle Beam System and Chamber of Charged Particle Beam System
Size Checking Method and Apparatus
Pattern Writing and Forming Method
Charged Particle Beam Lithography System, Lithography Method Using Charged Particle Beam, Method of Controlling Charged Particle Beam, and Method of Manufacturing Semiconductor Device
Alignment Apparatus for Substrates
Method for Correcting a Proximity Effect, an Exposure Method, a Manufacturing Method of a Semiconductor Device and a Proximity Correction Module
Pattern Inspection Apparatus
Optical System Adjusting Method for Energy Beam Apparatus
Variably Shaped Beam Eb Writing System
Alignment Method
Charged Particle Beam Apparatus, Charged Particle Beam Control Method, Substrate Inspection Method and Method of Manufacturing Semiconductor Device
Exposure Mask Manufacturing Method, Drawing Apparatus, Semiconductor Device Manufacturing Method, and Mask Blanks Product
Size Checking Method and Apparatus
Charged Particle Beam Processing Apparatus
System, Method and a Program for Correcting Conditions for Controlling a Charged Particle Beam for Lithography and Observation, and a Program and Method for Manufacturing a Semiconductor Device
Electron Beam Drawing Apparatus, Deflection Amplifier, Deflection Control Device, Electron Beam Drawing Method, Method of Manufacturing Semiconductor Device, and Electron Beam Drawing Program
Semiconductor Mask Inspection Using Die-to-Die and Die-to-Database Comparisons
Demagnification Measurement Method for Charged Particle Beam Exposure Apparatus, Stage Phase Measurement Method for Charged Particle Beam Exposure Apparatus, Control Method for Charged Particle Beam Exposure Apparatus, and Charged Particle Beam Exposure Apparatus
Charged Beam Drawing Apparatus
Pattern Writing and Forming Apparatus
Exposure Mask Manufacturing Method, Drawing Apparatus, Semiconductor Device Manufacturing Method, and Mask Blanks Product
Exposure Mask Manufacturing Method, Drawing Apparatus, Semiconductor Device Manufacturing Method, and Mask Blanks Product
Pattern Inspection Apparatus
Related Assignments
(3)
Other recorded transfers of the patents in this record — the chain of ownership.
Merger
Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: K.K. PANGEA
Reel/Frame 055659/0471 →
Change of Name and Address
Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 055669/0001 →
Change of Name and Address
Jan 22, 2021
From: K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 055669/0401 →