Charged particle beam processing apparatus
View Patent ↗A charged particle beam processing apparatus includes a sample chamber to process a substrate including side faces by a charged particle beam, a movable stage in the sample chamber, the stage including a place on which the substrate is to be mounted, a height and position acquiring unit to acquire a height of the substrate on the stage by irradiating a laser beam onto the substrate on the stage and using the laser beam reflected from the substrate and to acquire positions of at least two adjacent side faces among the side faces based on the acquired height, and a calculating unit to calculate a position of center of gravity of the substrate on the stage and a rotation angle as to a rotary axis vertical to the place on which the substrate is to be mounted based on the positions of the at least two adjacent side faces.
1. A charged particle beam processing apparatus comprising:
a sample chamber configured to process a substrate including a plurality of side faces by a charged particle beam;
a movable stage provided in the sample chamber, the movable stage including a place on which the substrate is to be mounted;
a height and position acquiring unit configured to acquire a height of the substrate on the movable stage by irradiating a laser beam onto the substrate mounted on the movable stage while moving the movable stage on which the substrate is mounted and using the laser beam reflected from the substrate and configured to acquire positions of at least two adjacent side faces among the plurality of side faces of the substrate mounted on the movable stage based on the acquired height of the substrate;
a calculating unit configured to calculate a position of center of gravity of the substrate mounted on the movable stage and a rotation angle as to a rotary axis vertical to the place on which the substrate is to be mounted based on the positions of the at least two adjacent side faces; and
a correcting unit configured to correct the position of center of gravity of the substrate on the movable stage and the rotation angle based on the position of center of gravity and the rotation angle calculated by the calculating unit,
wherein the correcting unit corrects the position of center of gravity and the rotation angle on the substrate outside the sample chamber.
2. The charged particle beam processing apparatus according to claim 1 , further comprising: a preparatory chamber to temporarily contain the substrate, and wherein the correcting unit corrects the position of center of gravity of the substrate and the rotation angle inside the sample chamber.
3. The charged particle beam processing apparatus according to claim 2 , further comprising: a transport chamber to transport the substrate, and wherein the preparatory chamber is connected to the sample chamber via the transport chamber.
4. The charged particle beam processing apparatus according to claim 3 , wherein the correcting unit comprises a transport robot configured to correct the position of center of gravity of the substrate inside the preparatory chamber and perform transportation of the substrate between the sample chamber and the transport chamber and transportation of the substrate between the transport chamber and the preparatory chamber; and a rotating mechanism provided in the preparatory chamber and configured to correct the rotation angle of the substrate.
5. The charged particle beam processing apparatus according to claim 2 ,wherein the correcting unit comprises a transport robot configured to correct the position of center of gravity of the substrate inside the preparatory chamber; and a rotating mechanism provided in the preparatory chamber configured to correct the rotation angle of the substrate.
6. The charged particle beam processing apparatus according to claim 1 , wherein the correcting unit comprises a transport robot configured to correct the position of center of gravity of the substrate and a rotating mechanism configured to correct the rotation angle of the substrate.
7. The charged particle beam processing apparatus according to claim 1 , wherein the changed particle beam is an electron beam.
8. The charged particle beam processing apparatus according to claim 1 , wherein the charged particle beam is a convergent ion beam.