Stacked 1T-nMTJ MRAM structure
View Patent ↗This invention relates to MRAM technology and new variations on MRAM array architecture to incorporate certain advantages from both cross-point and 1T-1MTJ architectures. The fast read-time and higher signal-to-noise ratio of the 1T-1MTJ architecture and the higher packing density of the cross-point architecture are both exploited by combining certain characteristics of these layouts. A single access transistor 16 is used to read multiple MRAM cells, which can be stacked vertically above one another in a plurality of MRAM array layers arranged in a “Z” axis direction.
1. A method of fabricating a memory device, comprising:
providing a substrate;
forming an access transistor on said substrate, said access transistor having a first and a second active area;
providing a bit line in electrical contact with said access transistor at said first active area;
providing an interconnect in electrical contact with said access transistor at said second active area;
forming a first magnetic bit over said access transistor;
forming a first sense line associated with said first magnetic bit, which is in electrical contact with said interconnect;
forming a second magnetic bit over said first magnetic bit; and
forming a second sense line associated with said second magnetic bit, which is in electrical contact with said interconnect.
2. The method of claim 1 , where each respective act of forming said first and second magnetic bits comprises:
forming a write-only line;
forming a pinned ferromagnetic layer over said sense line;
forming a tunnel barrier over said pinned layer;
forming a free ferromagnetic layer over said tunnel barrier; and
providing a common line over said free ferromagnetic layer.
3. The method of claim 2 , where said common line is formed orthogonal to said sense line.
4. The method of claim 2 , where said common line is formed orthogonal to said write-only line.
5. The method of claim 2 , further comprising providing a sense amplifier in electrical contact with said bit line.
6. The method of claim 1 , where said forming said access transistor comprises:
forming source and drain regions and a gate structure between said source and drain regions; and
providing conductive plugs to said source and drain regions, said bit line being in electrical contact with one of said conductive plugs and said interconnect being in electrical contact with the other of said conductive plugs.
7. The method of claim 6 , further comprising:
providing a plurality of third magnetic bits, each over said first and second magnetic bits; and
providing a plurality of third sense lines, each associated with one respective said third magnetic bit and being in electrical contact with said interconnect.