IP Library Granted Patent US 7,307,338
Granted Patent B1
US 7,307,338 · App. 10/899,344 · Granted Dec 11, 2007

Three dimensional polymer memory cell systems

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 7,307,338
App. No.
10/899,344
Granted
Dec 11, 2007
Kind
B1
Abstract

Systems and methodologies are provided for forming three dimensional memory structures that are fabricated from blocks of individual polymer memory cells stacked on top of each other. Such a polymer memory structure can be formed on top of control component circuitries employed for programming a plurality of memory cells that form the stacked three dimensional structure. Such an arrangement provides for an efficient placement of polymer memory cell on a wafer surface, and increases amount of die space available for circuit design.

Claims (22)

1. A polymer memory system comprising:

a plurality of polymer memory cells stacked in a non-horizontal orientation on top of each other over a wafer surface, the stack of memory cells formed at an intersection of a first electrode and an adjacent second electrode, the electrodes oriented substantially perpendicular to each other; and

a control component formed on the wafer surface, the control component programs a polymer memory cell of the plurality of polymer memory cells to a desired state, based on a change of impedance associated with the polymer memory cell.

2. The polymer memory system of claim 1 , the non-horizontal orientation is vertical.

3. The polymer memory system of claim 1 , the polymer memory cell comprises an active layer and a passive layer that are sandwiched between electrode layers.

4. The polymer memory system of claim 3 , at least one of the electrode layers comprise of a material selected from the group of tungsten, silver, copper, titanium, chromium, germanium, gold, aluminum, magnesium, manganese, indium, iron, cobalt, tantalum, nickel, palladium, platinum, zinc, alloys thereof, polysilicon, doped amorphous silicon, and copper composition alloys.

5. The polymer memory system of claim 3 , at least one of the electrode layers comprise of a material selected from the group of conducting polymers, semi-conducting polymers, PEDOT/PSS, polyaniline, polythiothene, polypyrolle, doped conducting organic polymers, doped semiconducting organic polymers, undoped conducting organic polymers, undoped semiconducting organic polymers, oligomers, and monomers.

6. The polymer memory system of claim 3 , at least one of the electrode layers comprise of a material selected from the group of indium-tin oxide, conducting metal oxides, conducting metal nitrides, conducting metal silicides, semiconducting metal oxides, semiconducting metal nitrides, and semiconducting metal silicides.

7. The polymer memory system of claim 3 , at least one of the electrode layers comprise of amorphous carbon.

8. The polymer memory system of claim 3 , the passive layer exchanges charged particles with the active layer.

9. The polymer memory system of claim 8 , the passive layers comprise of a material selected from the group of tungsten oxide (WO3), molybdenum oxide (MoO3), titanium dioxide (TiO2), copper sulfide (CuxS), and silver sulfide (Ag2S).

10. The polymer memory system of claim 3 , the active layer comprises at least one selected from the group of polydiphenylacetylene, poly(t-butyl)diphenylacetylene, poly(trifluoromethyl)diphenylacetylene, polybis-trifluoromethyl)acetylene, polybis(t-butyldiphenyl)acetylene, poly(trimethylsilyl)diphenylacetylene, poly(carbazole)diphenylacetylene, polydiacetylene, polyphenylacetylene, polypyridineacetylene, polymethoxyphenylacetylene, polymethylphenylacetylene, poly(t-butyl)phenylacetylene, polynitro-phenylacetylene, poly(trifluoromethyl)phenylacetylene, poly(trimethylsilyl)pheylacetylene, polydipyrrylmethane, polyindoqiunone, polydihydroxyindole, polytrihydroxyindole, furane-polydihydroxyindole, polyindoqiunone-2-carboxyl, polyindoqiunone monohydrate, polybenzobisthiazole, and poly(p-phenylene sulfide).

11. The polymer memory system of claim 3 , the active layer comprises at least one of: materials of a nitro group, materials of an amino group, cyclopentadienyl, dithiolane, methylcyclopentadienyl, fulvalenediyl, indenyl, fluorenyl, cyclobis(paraquart-p-phenylene), bipyridyl, bithienyl, thienyl, pyridyl, phenantryl, dialkylbenzyl, phenothiazine, diazapyrenium, benzonitrile, benzonate, benzamide, carbazole, dibenzothiophene, nitrobenzene, aminobenzenesulfonate, aminobenzoate, and co-polymers of thereof, molecular units with redox-active metals; metallocenes complex, and polypyridine metal complex.

12. The polymer memory system of claim 1 further comprising a diode.

13. The polymer memory system of claim 1 the control component comprises an artificial intelligence unit.

14. A polymer memory system comprising:

a plurality of polymer memory cells placed on top of each other to form a stacked pillar, the stacked pillar extending between a first electrode and an adjacent second electrode, the first and second electrodes are oriented substantially perpendicular to each other; and

a control component that forms a base for the stacked pillar, the control component programs a polymer memory cell of the plurality of polymer memory cells via an external stimulus applied to the polymer memory cell.

15. The polymer memory system of claim 14 , the stimulus is a voltage applied to the memory cell.

16. The polymer memory system of claim 14 , the stimulus is an electric current that flows through the memory cell.

17. The polymer memory system of claim 14 , the polymer memory cell comprises an active layer with redox-active metals.

18. The polymer memory system of claim 14 , the control component comprises a comparator that compares a current flowing through the polymer memory cell with a reference value.

Assignments (8)
RELEASE OF SECURITY INTEREST Recorded Mar 16, 2022
From: MUFG UNION BANK, N.A.
To: CYPRESS SEMICONDUCTOR CORPORATION; SPANSION LLC
Reel/Frame 059410/0438 →
CORRECTIVE ASSIGNMENT TO CORRECT THE 8647899 PREVIOUSLY RECORDED ON REEL 035240 FRAME 0429. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY INTERST. Recorded Nov 3, 2020
From: CYPRESS SEMICONDUCTOR CORPORATION; SPANSION LLC
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 058002/0470 →
ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN INTELLECTUAL PROPERTY Recorded Oct 28, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: MUFG UNION BANK, N.A.
Reel/Frame 050896/0366 →
SECURITY INTEREST Recorded Mar 21, 2015
From: CYPRESS SEMICONDUCTOR CORPORATION; SPANSION LLC
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 035240/0429 →
RELEASE OF SECURITY INTEREST Recorded Mar 13, 2015
From: BARCLAYS BANK PLC
To: SPANSION LLC; SPANSION INC.; SPANSION TECHNOLOGY LLC
Reel/Frame 035201/0159 →
CHANGE OF NAME Recorded Aug 1, 2014
From: FASL LLC
To: SPANSION LLC
Reel/Frame 033446/0664 →
SECURITY AGREEMENT Recorded Jun 4, 2010
From: SPANSION LLC; SPANSION INC.; SPANSION TECHNOLOGY INC.; SPANSION TECHNOLOGY LLC
To: BARCLAYS BANK PLC
Reel/Frame 024522/0338 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 26, 2004
From: MANDELL, AARON; KRIEGER, JURI H.; SOKOLIK, IGOR; KINGSBOROUGH, RICHARD P.; SPITZER, STUART
To: FASL, LLC
Reel/Frame 015614/0038 →