Salicide process
View Patent ↗A salicide process is provided. A metal layer selected from a group consisting of titanium, cobalt, platinum, palladium and an alloy thereof is formed over a silicon layer. A first thermal process is performed. Next, a second thermal process is performed, wherein the second thermal process includes a first step performed at 600˜700 degrees centigrade for 10˜60 seconds and a second step performed at 750˜850 degrees centigrade for 10˜60 seconds. If the metal layer is selected from a group consisting of nickel and an alloy thereof is formed on a silicon layer, the first step of the second thermal process is performed at 300˜400 degrees centigrade for 10˜60 seconds and the second step of the second thermal process is performed at 450˜550 degrees centigrade for 10˜60 seconds.
1. A salicide process, comprising:
forming a metal layer over a silicon layer, wherein the metal layer is selected from a group consisting of titanium, cobalt, platinum, palladium and an alloy thereof;
performing thermal process for the metal layer to react with the silicon layer to form a metal silicide;
performing a selective etching to remove the nonreactive metal layer;
performing a nucleation thermal process at 600˜700 degrees centigrade for 10˜60 seconds; and
performing a grain growing thermal process at 750˜850 degrees centigrade for 10˜60 seconds.
2. The salicide process according to claim 1 , wherein the nucleation thermal process is performed at 630˜670 degrees centigrade for 20˜40 seconds.
3. The salicide process according to claim 1 , wherein the grain growing thermal process is performed at 780˜820 degrees centigrade for 20˜40 seconds.
4. The salicide process according to claim 1 , wherein the thermal process is a one-step thermal process.
5. The salicide process according to claim 4 , wherein the one-step thermal process performed at 450˜550 degrees centigrade for 10˜60 seconds.
6. The salicide process according to claim 1 , wherein the nucleation thermal process and the grain growing thermal process is a rapid thermal annealing process, respectiverly.
7. The salicide process according to claim 1 , wherein the thermal process is a rapid thermal annealing process.