IP Library Granted Patent US 7,122,473
Granted Patent B2
US 7,122,473 · App. 10/920,028 · Granted Oct 17, 2006

Edge and bevel cleaning process and system

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Quick Facts
Patent No.
US 7,122,473
App. No.
10/920,028
Granted
Oct 17, 2006
Kind
B2
Abstract

The present invention provides at least one nozzle that sprays a rotating workpiece with an etchant at an edge thereof. The at least one nozzle is located in an upper chamber of a vertically configured processing subsystem that also includes mechanisms for plating, cleaning and drying in upper and lower chambers.

Claims (42)

1. A method of operating upon a surface of a workpiece, comprising:

holding the workpiece with a workpiece carrier to expose the surface;

forming a layer of conductive material on the surface while continuing to hold the workpiece with the workpiece carrier; and

using an etching solution to remove an edge portion of the layer while continuing to hold the workpiece with the workpiece carrier,

wherein using the etching solution includes:

rotating the workpiece;

directing a stream of the etching solution to a bevel edge and a front edge of the surface of the workpiece; and

removing the conductive material from the bevel edge and the front edge of the surface.

2. The method of claim 1 , further comprising rinsing and drying the layer after using the etching solution to remove the conductive material from the bevel edge and the front edge of the surface.

3. The method of claim 1 , wherein the conductive material is copper.

4. A method of operating upon a surface of a workpiece, comprising:

holding the workpiece with a workpiece carrier to expose the surface;

forming a layer of conductive material on the surface while continuing to hold the workpiece with the workpiece carrier;

using an etching solution to remove an edge portion of the layer while continuing to hold the workpiece with the workpiece carrier; and

spraying a cleaning solution onto the layer prior to using the etching solution.

5. The method of claim 4 , further including rotating the workpiece to dry the workpiece after spraying and prior to using the etching solution.

6. The method of claim 4 , wherein using the etching solution includes:

rotating the workpiece;

directing a stream of the etching solution to a bevel edge and a front edge of the surface of the workpiece; and

removing the conductive material from the bevel edge and the front edge of the surface.

7. The method of claim 6 , further comprising rinsing and drying the layer after using the etching solution to remove the conductive material from the bevel edge and the front edge of the surface.

8. The method of claim 4 , wherein the conductive material is copper.

9. A method for operating upon a surface of a workpiece, comprising:

holding the workpiece with a workpiece carrier to expose the surface;

forming a layer of conductive material on the surface using an electrochemical mechanical deposition (ECMD) process while continuing to hold the workpiece with the workpiece carrier; and

using an etching solution to remove an edge portion of the layer while continuing to hold the workpiece with the workpiece carrier.

10. The method of claim 9 , wherein forming includes using an electrochemical deposition process.

11. The method of claim 9 , wherein using the etching solution includes:

rotating the workpiece;

directing a stream of the etching solution to a bevel edge and a front edge of the surface of the workpiece; and

removing the conductive material from the bevel edge and the front edge of the surface.

12. The method of claim 11 , further comprising rinsing and drying the layer after using the etching solution to remove the conductive material from the bevel edge and the front edge of the surface.

13. The method of claim 9 , wherein the conductive material is copper.

14. A method of operating upon a surface of a workpiece, comprising:

holding the workpiece with a workpiece carrier to expose the surface;

forming a layer of conductive material on the surface while continuing to hold the workpiece with the workpiece carrier; and

removing an edge portion of the layer while continuing to hold the workpiece with the workpiece carrier,

wherein removing comprises:

rotating the workpiece;

heating a stream of etching solution and directing the stream to a bevel edge and a front edge of the surface of the workpiece; and

removing the conductive material from the bevel edge and the front edge of the surface.

15. The method of claim 14 , wherein the conductive material is copper.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 12, 2007
From: ASM NUTOOL, INC.
To: NOVELLUS SYSTEMS, INC.
Reel/Frame 019000/0080 →
CHANGE OF NAME Recorded Feb 23, 2005
From: NUTOOL, INC.
To: ASM NUTOOL INC.
Reel/Frame 015773/0701 →