IP Library Granted Patent US 7,038,286
Granted Patent B2
US 7,038,286 · App. 10/920,740 · Granted May 2, 2006

Magnetoresistive memory device assemblies

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Quick Facts
Patent No.
US 7,038,286
App. No.
10/920,740
Granted
May 2, 2006
Kind
B2
Abstract

The invention includes a construction comprising an MRAM device between a pair of conductive lines. Each of the conductive lines can generate a magnetic field encompassing at least a portion of the MRAM device. Each of the conductive lines is surrounded on three sides by magnetic material to concentrate the magnetic fields generated by the conductive lines at the MRAM device. The invention also includes a method of forming an assembly containing MRAM devices. A plurality of MRAM devices are formed over a substrate. An electrically conductive material is formed over the MRAM devices, and patterned into a plurality of lines. The lines are in a one-to-one correspondence with the MRAM devices and are spaced from one another. After the conductive material is patterned into lines, a magnetic material is formed to extend over the lines and within spaces between the lines.

Claims (15)

1. A magnetoresistive memory structure, comprising:

a memory cell supported by a substrate, the memory cell including a non-magnetic composition between a pair of magnetic compositions;

a first electrically conductive contact on a first side of the memory cell; the first electrically conductive contact configured to generate a first magnetic field overlapping at least a portion of the memory cell when current is passed therethrough;

a first magnetic material located outwardly of the first electrically conductive contact and configured to concentrate the first magnetic field;

a second electrically conductive contact located on an opposite side of the memory cell to said first side; the second electrically conductive contact configured to generate a second magnetic field overlapping at least a portion of the memory cell when current is passed therethrough; and

a second magnetic material outwardly of the second electrically conductive contact and configured to concentrate the second magnetic field.

2. The structure of claim 1 wherein the first electrically conductive contact is a line comprising a rectangular cross-sectional shape; wherein an outer periphery of the line extends along four sides of the rectangular cross-sectional shape; and wherein the first magnetic material extends entirely along three of the four sides.

3. The structure of claim 1 wherein the first electrically conductive contact is a line comprising a rectangular cross-sectional shape; wherein an outer periphery of the line extends along four sides of the rectangular cross-sectional shape; and wherein the first magnetic material extends entirely along one of the four sides, and extends only partially along two other of the four sides.

4. The structure of claim 1 wherein the second electrically conductive contact is a line comprising a rectangular cross-sectional shape; wherein an outer periphery of the line extends along four sides of the rectangular cross-sectional shape; and wherein the second magnetic material extends entirely along three of the four sides.

5. The structure of claim 1 wherein:

the first electrically conductive contact is a first line comprising a rectangular cross-sectional shape, an outer periphery of the first line extends along four sides of the rectangular cross-sectional shape of the first line; the first magnetic material extends entirely along three of the four sides of the rectangular cross-sectional shape of the first line; and

the second electrically conductive contact is a second line comprising a rectangular cross-sectional shape, an outer periphery of the second line extends along four sides of the rectangular cross-sectional shape of the second line; the second magnetic material extends entirely along three of the four sides of the rectangular cross-sectional shape of the second line.

6. The structure of claim 1 wherein the first and second magneto materials both comprise one or more of Fe, Ni and Co.

7. The structure of claim 1 wherein the first and second magneto materials identical in composition relative to one another.

8. The structure of claim 1 wherein the first and second magnetic materials are different in composition relative to one another.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 1, 2016
From: MICRON TECHNOLOGY, INC
To: OVONYX MEMORY TECHNOLOGY, LLC
Reel/Frame 039974/0496 →