IP Library Granted Patent US 7,157,212
Granted Patent B2
US 7,157,212 · App. 10/939,526 · Granted Jan 2, 2007

Optical component formation method

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Quick Facts
Patent No.
US 7,157,212
App. No.
10/939,526
Granted
Jan 2, 2007
Kind
B2
Abstract

Provided are methods of forming optical components. The methods involves (a) forming over a substrate a layer of a photoimageable composition that includes a hybrid organic-inorganic polymer and a photoactive component, wherein the layer has a first index of refraction and a first dissolution rate; and (b) exposing by multi-photon absorption using actinic radiation a predefined volume of the layer. The volume is caused to have: (i) a second index of refraction which is different than the first index of refraction and/or (ii) a second dissolution rate which is different than the first dissolution rate. The methods have particular applicability in the formation of optical waveguides and other optical components.

Claims (21)

1. A method of forming an optical component, comprising;

(a) forming over a substrate a layer of a photoimageable composition comprising a hybrid organic-inorganic polymer comprising polymerized units of the formula (RSiO 1.5 ), wherein R is a substituted or unsubstituted organic side chain group, and a photoactive component, wherein the layer has a first index of refraction and a first dissolution rate; and

(b) exposing by multi-photon absorption using actinic radiation a predefined volume of the layer, thereby causing the volume to have: (i) a second index of refraction which is different than the first index of refraction and/or (ii) a second dissolution rate which is different than the first dissolution rate.

2. The method of claim 1 , wherein the hybrid organic-inorganic polymer comprises polymerized units of the formula (R 1 SiO 1.5 ) and (R 2 SiO 1.5 ), wherein R 1 and R 2 are different and are substituted or unsubstituted organic side chain groups.

3. The method of claim 2 , wherein one of R 1 and R 2 is a substituted or unsubstituted aromatic group and the other of R 1 and R 2 is a substituted or unsubstituted aliphatic group.

4. The method of claim 3 , wherein one of R 1 and R 2 is a phenyl group and the other of R 1 and R 2 is a methyl group.

5. The method of claim 3 , wherein the hybrid organic-inorganic polymer further comprises a polymerized unit of the formula ((R 3 ) 2 SiO), wherein the R 3 groups are the same or different and are substituted or unsubstituted organic groups.

6. The method of claim 1 , wherein the hybrid organic-inorganic polymer further comprises a polymerized unit of the formula ((R 3 ) 2 SiO), wherein the R 3 groups are the same or different and are substituted or unsubstituted organic groups.

7. The method of claim 1 , wherein the photoactive component comprises a photoacid or a photobase generator.

8. The method of claim 1 , wherein the multi-photon absorption comprises two-photon absorption.

9. The method of claim 1 , wherein the actinic radiation is one or more selected from visible and near infrared radiation.

10. The method of claim 1 , wherein the actinic radiation is generated by a laser.

11. The method of claim 10 , wherein the laser generates the actinic radiation as a series of pulses.

12. The method of claim 10 , wherein the actinic radiation is generated by a plurality of laser beams.

13. The method of claim 1 , wherein the method is a development-free process.

14. The method of claim 1 , further comprising developing the exposed substrate with an aqueous base developer.

15. A method of forming an optical waveguide, comprising:

(a) forming over a substrate a layer of a photoimageable composition comprising a hybrid organic-inorganic polymer comprising polymerized units of the formula (RSiO 1.5 ), wherein R is a substituted or unsubstituted organic side chain group, and a photoactive component, wherein the layer has a first index of refraction and a first dissolution rate; and

(b) exposing by multi-photon absorption using actinic radiation a predefined volume of the layer, thereby causing the volume to have: (i) a second index of refraction which is different than the first index of refraction and/or (ii) a second dissolution rate which is different than the first dissolution rate, wherein the exposed volume of the layer forms a waveguide core.

16. The method of claim 15 , wherein the method is a development-free process.

17. The method of claim 15 , further comprising developing the exposed substrate with an aqueous base developer.

Assignments (2)
CHANGE OF NAME Recorded Oct 29, 2024
From: ROHM & HAAS ELECTRONIC MATERIALS LLC
To: DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC
Reel/Frame 069272/0383 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 3, 2005
From: PUGLIANO, NICOLA; ALLEN, CRAIG S.
To: ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C.
Reel/Frame 016229/0092 →