IP Library Granted Patent US 7,115,909
Granted Patent B2
US 7,115,909 · App. 10/940,748 · Granted Oct 3, 2006

Light emitting device and method of manufacturing the same

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Quick Facts
Patent No.
US 7,115,909
App. No.
10/940,748
Granted
Oct 3, 2006
Kind
B2
Abstract

Provided is a light emitting device and a method of manufacturing the same. The light emitting device comprises a transparent substrate, an n-type compound semiconductor layer formed on the transparent substrate, an active layer, a p-type compound semiconductor layer, and a p-type electrode sequentially formed on a first region of the n-type compound semiconductor layer, and an n-type electrode formed on a second region separated from the first region of the n-type compound semiconductor layer, wherein the p-type electrode comprises first and second electrodes, each electrode having different resistance and reflectance.

Claims (13)

1. A light emitting device comprising at least an n-type compound semiconductor layer, an active layer, and a p-type compound semiconductor layer which are disposed between an n-type electrode layer and a p-type electrode layer,

wherein the p-type electrode comprises first and second electrodes, each electrode having a different resistance and reflectance,

wherein the first electrode is a lanthanum nickel oxide film having a predetermined thickness, and

wherein the second electrode is a film made of a material selected from the group consisting of silver (Ag), aluminum (Al), rhodium (Rh), and tin (Sn).

2. A light emitting device comprising:

a transparent substrate;

an n-type compound semiconductor layer formed on the transparent substrate;

an active layer formed on a first region of the n-type compound semiconductor layer;

a p-type compound semiconductor layer formed on the active layer;

a contact resistance reducing film formed on the p-type compound semiconductor layer;

a p-type electrode formed on the contact resistance reducing film; and an n-type electrode formed on a second region separated from the first region of the n-type compound semiconductor layer,

wherein the contact resistance reducing film is a lanthanum nickel oxide film, and

wherein the p-type electrode is a film made of a material selected from the group consisting of silver (Ag), aluminum (Al), rhodium (Rh), and tin (Sn).

Assignments (3)
MERGER Recorded Aug 7, 2012
From: SAMSUNG LED CO., LTD.
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 028744/0272 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 22, 2010
From: SAMSUNG ELECTRO-MECHANICS CO., LTD.
To: SAMSUNG LED CO., LTD.
Reel/Frame 024723/0532 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 15, 2004
From: KWAK, JOON-SEOP; CHO, JAE-HEE
To: SAMSUNG ELECTO-MECHANICS CO., LTD.
Reel/Frame 015809/0819 →