IP Library › Granted Patent US 7,079,979
Granted Patent B2
US 7,079,979 · App. 10/944,414 · Granted Jul 18, 2006

Inspection method, inspection apparatus, and facility diagnosis unit

Assignee: Omron Corporation
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 7,079,979
App. No.
10/944,414
Granted
Jul 18, 2006
Kind
B2
Abstract

To inspect a status of an inspection object by using an inspection apparatus for extracting amount of characteristic to an inputted waveform signal and determining a status on the basis of the extracted amount of characteristic. Specifically, the inspection apparatus uses a normal knowledge that is generated on the basis of only the data of a normal status at an initial stage to determine whether or not the status of the inspection object complies with the normal status. The inspection apparatus generates an abnormal kind knowledge by abnormal kind on the basis of the data of an abnormal status that are collected in accordance with repeat of the determination, and then, determines the status by using the normal knowledge and the abnormal kind knowledge.

Claims (30)

1. An inspection method using an inspection apparatus for extracting amount of characteristic to an inputted waveform signal and determining a status of an inspection object on the basis of the extracted amount of characteristic, the method comprising the steps of:

determining whether or not the status complies with a normal status by using a normal knowledge that is generated on the basis of only data of the normal status at an initial stage; and

determining the status by using the normal knowledge and an abnormal kind knowledge, the abnormal kind knowledge being generated on the basis of data of the abnormal status that are collected in accordance with repeat of the normal status determination,

wherein, as a result of determination of the status by using the normal knowledge and the abnormal kind knowledge, if the abnormal kind is not detected on the basis of the abnormal kind knowledge, deleting the abnormal kind knowledge of the abnormal kind, the determination processing is carried out with the abnormal kind knowledge of the abnormal kind deleted.

2. An inspection apparatus for extracting amount of characteristic to an inputted waveform signal and determining a status of an inspection object on the basis of the extracted amount of characteristic, having:

a first mode for determining whether or not the status complies with a normal status by using a normal knowledge that is generated on the basis of only data of the normal status of the inspection object; and

a second mode for determining whether or not the status is normal and whether or not the status complies with a prescribed abnormal kind by using the normal knowledge that is generated on the basis of the data of the normal status of the inspection object and an abnormal kind knowledge that is generated on the basis of data of the prescribed abnormal kind;

wherein, at the initial stage when the abnormal kind is not specified, the inspection apparatus determines the status in the first mode; and the inspection apparatus determines the status in the second mode at a prescribed timing after the initial stage.

3. The inspection apparatus according to claim 2 , comprising:

a dummy abnormal data generating device for generating the dummy abnormal data by processing the data of the normal status;

wherein the inspection apparatus carries out the normal status determination processing by using the dummy abnormal data that is generated by the dummy abnormal data generating device so as to enable the evaluation of the normal knowledge.

4. The inspection apparatus according to claim 2 ,

wherein a threshold to determine whether or not the status is the normal status in the normal knowledge is set at a value that a cost caused by discarding the inspection object that is determined not to be normal and a cost expensed to modify the inspection object that is determined not to be normal into normal are balanced.

5. The inspection apparatus according to claim 4 ,

wherein the threshold to determine whether or not the status is the normal status in the normal knowledge is set by a registration device having information of a quality function limit, discard cost information, and adjustment cost information registered therein;

a loss function calculating device for calculating a loss function on the basis of the information of the registration device; and

a threshold calculating device for calculating a threshold on the basis of the loss function of the loss function calculating device.

6. An inspection apparatus for extracting amount of characteristic to an inputted waveform signal and determining a status of an inspection object on the basis of the extracted amount of characteristic, comprising:

a normal status determining device for determining whether or not the status complies with a normal status by using a normal knowledge that is generated on the basis of only data of the normal status; and

an abnormal kind determining device for determining whether or not the status complies with a prescribed abnormal kind by using an abnormal kind knowledge that is generated on the basis of data of the prescribed abnormal kind;

wherein, at the initial stage when the abnormal kind is not specified, the inspection apparatus determines the status only by the normal status determining device; and the inspection apparatus determines overall the status by operating the normal status determining device and the abnormal kind determining device at a prescribed timing after the initial stage.

7. The inspection apparatus according to claim 6 , wherein the abnormal kind determining device is additionally incorporated into the apparatus later after the initial stage.

8. The inspection apparatus according to claim 6 ,

wherein, the normal status determining device calculates a vector making plural amounts of characteristic into one unit to decide the status on the basis of a distance between the vectors.

9. The inspection apparatus according to claim 6 ,

wherein at least one of the normal status determining device and the abnormal kind determining device calculates a vector making plural amounts of characteristic into one unit to decide the status on the basis of a distance between the vectors.

10. A facility diagnosis unit for extracting amount of characteristic to an inputted waveform signal and determining a status of a facility on the basis of the extracted amount of characteristic, comprising:

a normal status determining device for determining whether or not the status complies with a normal status by using a normal knowledge that is generated on the basis of only data of the normal status of the facility that is a diagnosis object; and

an abnormal kind determining device for determining whether or not the status complies with a prescribed abnormal kind by using an abnormal kind knowledge that is generated on the basis of data of the prescribed abnormal kind;

wherein, at the initial stage when the abnormal kind is not specified, the facility diagnosis unit determines the status only by the normal status determining device; and the facility diagnosis unit determines overall the status of the facility by operating the normal status determining device and the abnormal kind determining device at a prescribed timing after the initial stage.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 3, 2005
From: FUKUI, IKUMA
To: OMRON CORPORATION
Reel/Frame 016118/0128 →
Priority Claims (2)
JP 2003-330567 · Sep 22, 2003 · national
JP 2004-267529 · Sep 14, 2004 · national
Continuity (1)
Related Publication 20050114081A1 · May 26, 2005