Selective deposition of ZnO nanostructures on a silicon substrate using a nickel catalyst and either patterned polysilicon or silicon surface modification
Zinc-oxide nanostructures are formed by forming a pattern on a surface of a substrate. A catalyst metal, such as nickel, is formed on the surface of the substrate. Growth of at least one zinc oxide nanostructure is induced on the catalyst metal substantially over the pattern on the surface of the substrate based on a vapor-liquid-solid technique. In one exemplary embodiment, inducing the growth of at least one zinc-oxide nanostructure induces growth of each zinc-oxide nanostructure substantially over a patterned polysilicon layer. In another exemplary embodiment, when growth of at least one zinc-oxide nanostructure is induced, each zinc-oxide nanostructure grows substantially over an etched silicon substrate layer.
1. A method of forming a zinc-oxide nanostructure, comprising:
forming a pattern on a surface of a substrate as follows:
forming a silicon substrate layer;
forming a silicon-oxide layer on the silicon substrate layer; and
etching the silicon-oxide layer and the silicon substrate layer to form the pattern;
forming a blanket layer of catalyst metal on the surface of the substrate, including the pattern on the surface and unpatterned surface; and
inducing growth of each zinc-oxide nanostructure on the catalyst metal substantially over the etched silicon substrate layer.
2. The method according to claim 1 , wherein the catalyst metal is nickel.
3. The method according to claim 1 , wherein the catalyst metal is selected from the group including platinum, silver, palladium and copper.
4. The method according to claim 1 , wherein etching the silicon-oxide layer and the silicon substrate layer etches the silicon substrate layer to a depth of about 5 nm.
5. The method according to claim 1 , wherein inducing growth of each zinc-oxide nanostructure on the catalyst metal is based on a vapor-liquid-solid technique.
6. A zinc-oxide nanostructure formed by:
forming a pattern on a surface of a substrate as follows:
forming a silicon substrate layer;
forming a silicon-oxide layer on the silicon substrate layer; and
etching the silicon-oxide layer and the silicon substrate layer to form the pattern;
forming a blanket layer of catalyst metal on the surface of the substrate, including the pattern on the surface and unpatterned surface; and
inducing growth of each zinc oxide nanostructure on the catalyst metal substantially over the etched silicon substrate layer.
7. The zinc-oxide nanostructure according to claim 6 , wherein the catalyst metal is nickel.
8. The zinc-oxide nanostructure according to claim 6 , wherein the catalyst metal is selected from the group including platinum, silver, palladium and copper.
9. The zinc-oxide nanostructure according to claim 6 , wherein etching the silicon-oxide layer and the silicon substrate layer etches the silicon substrate layer to a depth of about 5 nm.
10. The zinc-oxide nanostructure according to claim 6 , wherein inducing growth of each zinc-oxide nanostructure on the catalyst metal is based on a vapor-liquid-solid technique.