In-line, pass-by system and method for disc vapor lubrication
View Patent ↗An apparatus for performing simultaneous pass-by vapor deposition of a uniform thickness thin film of a lubricant on at least one surface of each of a plurality of substrates. The apparatus includes a (a) chamber member having an interior space adapted to be maintained at a reduced pressure below atmospheric pressure; (b) at least one linearly extending vapor source member for supplying the interior space of the chamber with at least one linearly extending stream of lubricant vapor; (c) a substrate/workpiece mounting/supporting member adapted for supporting thereon a plurality of substrates/workpieces; and (d) a transporter/conveyor member for continuously moving the substrate/workpiece mounting/supporting member transversely past the at least one linearly extending stream of lubricant vapor for depositing a uniform thickness thin film of lubricant on the surfaces of each of a plurality of substrates/workpieces carried by the substrate/workpiece mounting/supporting member.
1. An apparatus comprising:
a chamber having an interior space configured to be maintained at a reduced pressure below atmospheric pressure,
a vapor source for supplying said interior space of said chamber with a linearly extending stream of lubricant vapor, said vapor source has a linearly elongated shape extending along a first direction;
a supporting member for supporting thereon a plurality of substrates with the surfaces thereof in facing relation to said vapor and source; and
a conveyor for continuously moving said supporting member transversely past said linearly extending stream of lubricant vapor for depositing a uniform thickness film of lubricant on the surfaces of each of said plurality of substrates facing said vapor source, the conveyor configured to move along a second direction transverse to the first direction,
wherein said vapor source comprises a thermal conductive material and includes a plurality of vapor orifices for supplying said linearly extending stream of lubricant vapor, the vapor orifices being arranged along the first direction, and a plurality of reservoirs for containing therein a liquid polymeric lubricant material,
a top surface of each of said plurality of reservoirs includes a plurality of recesses each having a different diameter and a different depth configured to contain different volumes of the liquid polymeric lubricant material for regulating a molecular weight distribution of said stream for minimizing variation of the thickness of said films.
2. The apparatus according to claim 1 , wherein:
said vapor source comprises at least one spaced-apart, opposed pair of vapor sources for supplying said interior space of said chamber with at least one pair of opposingly directed, linearly extending streams of lubricant vapor for depositing a uniform thickness film of said lubricant on opposing surfaces of each of said plurality of substrates; and
said supporting member and said conveyor are for continuously moving said plurality of substrates transversely past said linearly extending streams of lubricant vapor from said pair of vapor sources.
3. The apparatus according to claim 2 , wherein:
said at least one spaced-apart, opposed pair of vapor sources are oriented vertically for supplying said interior space of said chamber with at least one pair of opposingly directed, linearly extending, vertically oriented streams of lubricant vapor; and
said supporting member and said conveyor are for continuously moving a vertically oriented plurality of disc-shaped substrates transversely past said pair of vertically oriented vapor sources.
4. The apparatus according to claim 1 , wherein:
said supporting member comprises a pallet including a plurality of spaced-apart openings extending therethrough, each of said openings for releasably supporting therein a substrate.
5. The apparatus according to claim 1 , wherein:
said chamber has a cross-sectional area that eliminates any difference in lubricant vapor pressure along the length of said vapor source, whereby said vapor source delivers a uniform flow lubricant vapor along its length; and
said chamber configured to monitor the rate of vapor effusion from said vapor source.
6. The apparatus according to claim 1 , wherein said vapor source comprises a box shaped enclosure.
7. The apparatus according to claim 1 , wherein said plurality of reservoirs are disposed along the first direction in said vapor source.
8. The apparatus according to claim 1 , wherein the supporting member is configured to support two or more substrates along the first direction.
9. The apparatus according to claim 1 , wherein each of said plurality of reservoirs is a block of thermally conductive material comprising said plurality of recesses.
10. An apparatus comprising:
a chamber having an interior space configured to be maintained at a pressure below atmospheric pressure;
a vapor source for supplying said interior space of said chamber with a linearly extending stream of lubricant vapor, said vapor source has an elongated shape extending along a first direction, said vapor source comprises a thermal conductive material and comprises an array of openings for forming said linearly extending stream, said vapor source comprises a reservoir for containing therein a liquid lubricant;
a member for supporting thereon a plurality of workpieces with surfaces facing said vapor source; and
a transport for continuously moving said member transversely past said linearly extending stream for depositing a uniform thickness film of lubricant on the surfaces of each of said plurality of workpieces facing said vapor source,
wherein a top surface of said reservoir comprises a plurality of recesses each having a different diameter and a different depth configured to contain different volumes of the liquid lubricant for regulating a molecular weight distribution of said stream for minimizing variation of the thickness of said film.
11. The apparatus of claim 10 , wherein said vapor source comprises a box shaped enclosure.
12. The apparatus of claim 10 , wherein said vapor source comprises a rectangular-box shaped enclosure.
13. The apparatus of claim 10 , wherein a recess of said plurality of recesses has a cylinder shape.
14. An apparatus comprising:
a vapor source for supplying an interior space of a chamber with a linearly extending stream of lubricant vapor, said vapor source has a linearly elongated shape extending along a first direction, said vapor source comprises a metal and comprises an array of orifices for forming said linearly extending stream, said vapor source comprises a reservoir for containing a liquid lubricant;
a member for mounting thereon a plurality of disc-shape substrates with surfaces facing said vapor source; and
a conveyor for continuously moving said member past said linearly extending stream for depositing a uniform thickness film of lubricant on the surfaces of each of said plurality of disc-shape substrates facing said vapor source,
wherein a top surface of said reservoir comprises a plurality of recesses each having a different diameter and a different depth configured to contain different volumes of the liquid lubricant for regulating a molecular weight distribution of said stream for minimizing variation of the thickness of said film.
15. The apparatus of claim 14 , wherein said vapor source comprises a box shaped enclosure.
16. The apparatus of claim 14 , wherein a recess of said plurality of recesses has a cylinder shape.
17. The apparatus of claim 14 , wherein said vapor source comprises a rectangular-box shaped enclosure.
18. The apparatus of claim 14 , wherein said member comprises a pallet including a plurality of spaced-apart openings extending therethrough, each of said openings for releasably mounting therein a disc-shape substrate.
19. The apparatus of claim 14 , wherein said vapor source comprises at least one spaced-apart, opposed pair of vapor sources having a linearly elongated shape extending along said first direction for depositing a uniform thickness film of said lubricant on opposing surfaces of each of said plurality of disc-shape substrates.