Pore structure for programmable device
View Patent ↗In an aspect, an apparatus is provided that sets and reprograms the state of programmable devices. In an aspect, the quantity of programmable material is minimized, and the programmable material that is reprogrammed from an amorphous to a crystalline state, and vice versa, is localized on a contact. In an aspect, a method is provided such that an opening is formed through a dielectric exposing a contact formed on a substrate. A spacer is formed within the opening and a programmable material is formed within the opening such that the spacer reduces the programmable material on the contact. A conductor is formed on the programmable material and the contact transmits to a signal line.
1. A system comprising:
a microprocessor; and
a memory, coupled to said microprocessor, said memory including a first conductor including spaced contacts along its length, a plurality of spaced elongate first dielectric stripes over and perpendicular to said first conductor, said contacts situated between said first dielectric stripes, a programmable chalcogenide material formed between said stripes, and a second conductor over and in contact with said programmable material.
2. The system of claim 1 including spacers between said stripes and exposing said contacts.
3. The system of claim 1 , further comprising:
a barrier material between the programmable material and the second conductor.
4. The system of claim 1 , further comprising:
a signal line in contact with a contact; and
an isolation device between the contact and the signal line.
5. The system of claim 1 , wherein the programmable material comprises a chalcogenide memory element.
6. The system of claim 1 including a plurality of spaced, elongate second dielectric stripes arranged transversely to said first dielectric stripes.
7. The system of claim 6 including a plurality of memory cells arranged between said transverse first and second dielectric stripes.