Lithographic mask alignment
View Patent ↗Systems and methods of aligning a lithographic mask are described. In one aspect, a substrate and a lithographic mask are aligned based at least in part on a motive force between a substrate alignment mark on the substrate and a mask alignment mark on the lithographic mask that induces movement of at least one of the substrate and the lithographic mask into mutual alignment.
1. A lithographic method, comprising:
aligning a substrate and a lithographic mask based at least in part on a motive force caused by capacitive coupling between a substrate alignment mark on the substrate and a mask alignment mark on the lithographic mask inducing movement of at least one of the substrate and the lithographic mask into mutual alignment.
2. The method of claim 1 , wherein aligning comprises generating the motive force by applying an electric potential across the substrate alignment mark and the mask alignment mark.
3. The method of claim 1 , wherein the motive force is substantially greater than a frictional force between the substrate and the lithographic mask resisting movement of the substrate and the lithographic mask into mutual alignment.
4. The method of claim 1 , further comprising moving the substrate and the lithographic mask into coarse mutual alignment before aligning the substrate and the lithographic mask based at least in part on the motive force.
5. The method of claim 4 , wherein the substrate and the lithographic mask are moved into coarse mutual alignment in accordance with an optical alignment process.
6. The method of claim 1 , further comprising subsequently aligning the substrate and the lithographic mask based at least in part on a second motive force between a second substrate alignment mark on the lithographic mask and a second mask alignment mark on the lithographic mask, the second motive force inducing movement of the substrate and the lithographic mask into greater mutual alignment.
7. The method of claim 6 , wherein the motive force between the first substrate alignment mark and the first mask alignment mark is greater than the second motive force.
8. The method of claim 1 , further comprising urging the lithographic mask into a film disposed on the substrate to transfer a relief pattern to the film.
9. The method of claim 8 , further comprising removing thinned regions of the transferred relief pattern.
10. A lithographic system, comprising:
a capacitive coupling based alignment system electrically connected to a substrate alignment mark on a substrate and a mask alignment mark on a lithographic mask and configured to generate between the substrate alignment mark and the mask alignment mark a motive force inducing movement of at least one of the substrate and the lithographic mask into mutual alignment.
11. The system of claim 10 , wherein the capacitive coupling based alignment system is configured to apply an electric potential across the substrate alignment mark and the mask alignment mark.
12. The system of claim 10 , wherein the motive force generated by the capacitive coupling alignment system is substantially greater than a frictional force between the substrate and the lithographic mask resisting movement of the substrate and the lithographic mask into mutual alignment.
13. The system of claim 10 , further comprising moving the substrate and the lithographic mask into coarse mutual alignment before generating the motive force.
14. The system of claim 13 , further comprising an optical alignment system configured to move the substrate and the lithographic mask into coarse mutual alignment.
15. The system of claim 10 , wherein the capacitive coupling based alignment system is configured to subsequently generate between a second substrate alignment mark on the lithographic mask and a second mask alignment mark on the lithographic mask a second motive force inducing movement of the substrate and the lithographic mask into greater mutual alignment.
16. The system of claim 15 , wherein the motive force generated by the capacitive coupling based alignment system between the first substrate alignment mark and the first mask alignment mark is greater than the second motive force.
17. The system of claim 10 , further comprising a positioner configured to urge the lithographic mask into a film disposed on the substrate to transfer a relief pattern to the film.
18. The system of claim 10 , wherein a capacitive coupling region of the mask alignment mark is larger than a capacitive coupling region of the substrate alignment mark by a factor of at least 1.5.
19. The system of claim 18 , wherein the capacitive coupling region of the mask alignment mark is larger than the capacitive coupling region of the substrate alignment mark by a factor of at least 10.
20. The system of claim 10 , wherein a capacitive coupling region of the mask alignment mark has a length dimension on the order of about 50 nm along a plane parallel to a surface relief pattern of said mask, and a capacitive coupling region of the substrate alignment mark has a length dimension on the order of about 5 nm along a plane parallel to the surface relief pattern.
21. A lithographic system, comprising:
a capacitive coupling based alignment system electrically connected to a substrate alignment mark on a substrate and a mask alignment mark on a lithographic mask and configured to generate between the substrate alignment mark and the mask alignment mark a motive force inducing movement of at least one of the substrate and the lithographic mask into mutual alignment and further comprising:
a first set of multiple mask alignment marks each comprising a respective electrically conducting element having a capacitive coupling region arranged for capacitive coupling with a corresponding alignment mark on the substrate; and
a second set of multiple substrate alignment marks each comprising a respective electrically conducting element having a capacitive coupling region arranged for capacitive coupling with a corresponding alignment mark on the mask;
wherein the capacitive coupling regions of the alignment marks of the first set have respective capacitive coupling areas within a first areal value range, and the capacitive coupling regions of the alignment marks of the second set have respective capacitive coupling areas within a second areal value range different from the first areal value range.
22. The system of claim 21 , wherein the capacitive coupling regions of the alignment marks of the first set are electrically connected together, and the capacitive coupling regions of the alignment marks of the second set are electrically connected together.
23. The system of claim 22 , wherein the capacitive coupling regions of the alignment marks of the first set are electrically disconnected from the capacitive coupling regions of the alignment marks of the second set.
24. The system of claim 10 , further comprising a clutch which is selectively disengaged to allow said movement in response to said motive force.