Strain-engineered ferroelectric thin films
A strained thin film structure includes a substrate layer formed of a crystalline scandate material having a top surface, and a strained layer of crystalline ferroelectric epitaxially grown with respect to the crystalline substrate layer so as to be in a strained state and at a thickness below which dislocations begin to occur in the crystalline ferroelectric layer. An intermediate layer may be grown between the top surface of the substrate layer and the ferroelectric layer wherein the intermediate layer carries the lattice structure of the underlying substrate layer. The properties of the ferroelectric film are greatly enhanced as compared to the bulk ferroelectric material, and such films are suitable for use in applications including ferroelectric memories.
1. A strained thin film structure comprising:
(a) a substrate layer formed of a crystalline rare earth scandate material and having a top surface;
(b) a strained layer of crystalline ferroelectric material epitaxially grown with respect to the crystalline substrate layer so as to be in a strained state and at a thickness below which dislocations begin to occur.
2. The thin film structure of claim 1 wherein the ferroelectric layer has a thickness of 5 μm or less.
3. The thin film structure of claim 1 including an intermediate layer of material grown between the top surface of the substrate layer and the ferroelectric layer wherein the intermediate layer carries that lattice structure of the underlying substrate layer.
4. The thin film structure of claim 3 wherein the intermediate layer comprises SrRuO 3 between the top surface of the substrate layer and the layer of ferroelectric and epitaxially grown on the substrate layer.
5. The thin film structure of claim 4 wherein the layer of SrRuO 3 is 1 μm or less in thickness.
6. The thin film structure of claim 4 further including an additional layer of SrRuO 3 formed over the ferroelectric layer whereby the layers of SrRuO 3 can function as plates of a capacitor separated by the layer of ferroelectric acting as a dielectric.
7. The thin film structure of claim 1 further including a base of crystalline silicon on which the substrate layer is formed.
8. The thin film structure of claim 1 wherein the thickness of the ferroelectric layer is at least 50 Å.
9. The thin film structure of claim 8 wherein the thickness of the ferroelectric layer is less than 5 μm.
10. The thin film structure of claim 1 wherein the substrate layer is formed of a material selected from the group consisting of GdScO 3 and DyScO 3 , and the strained layer ferroelectric material comprises BaTiO 3 .
11. The thin film structure of claim 10 wherein the strained layer is formed of (001) BaTiO 3 and the substrate layer is formed of(110) GdScO 3 or(110) DyScO 3 .
12. The thin film structure of claim 1 wherein the strained layer is grown epitaxially by molecular beam epitaxy.
13. The thin film structure of claim 1 wherein the strained layer is grown epitaxially by pulsed laser deposition.
14. The thin film structure of claim 1 wherein the substrate layer is DyScO 3 .
15. The thin film structure of claim 14 wherein the strained layer of BaTiO 3 has a thickness of 500 Å or less.
16. The thin film structure of claim 1 incorporated into a ferroelectric memory.
17. The thin film structure of claim 1 incorporated into an electra-optical modulator.
18. The thin film structure of claim 1 wherein the structure is located outside of a deposition system in which the strained layer of crystalline ferroelectric material is grown.
19. A strained thin film structure comprising:
(a) a substrate layer formed of a crystalline material selected from the group consisting of GdScO 3 and DyScO 3 and having a top surface;
(b) a strained layer of crystalline BaTiO 3 epitaxially grown with respect to the crystalline substrate layer so as to be in a strained state and at a thickness below which dislocations begin to occur.
20. The thin film structure of claim 19 wherein the BaTiO 3 layer has a thickness of 5 μm or less.
21. The thin film structure of claim 19 including an intermediate layer of SrRuO 3 between the top surface of the substrate layer and the layer of BaTiO 3 and epitaxially grown on the substrate layer.
22. The thin film structure of claim 21 wherein the layer of SrRuO 3 is 1 μm or less in thickness.
23. The thin film structure of claim 21 further including an additional layer of SrRuO 3 formed over the BaTiO 3 layer whereby the layers of SrRuO 3 can function as plates of a capacitor separated by the layer of BaTiO 3 acting as a dielectric.
24. The thin film structure of claim 19 further including a base of crystalline silicon on which the substrate layer is formed.
25. The thin film structure of claim 19 wherein the thickness of the layer of BaTiO 3 is at least 50 Å.
26. The thin film structure of claim 25 wherein the thickness of the layer of BaTiO 3 is less than 5 μm.
27. The thin film structure of claim 19 wherein the strained layer is formed of (001) BaTiO 3 and the substrate layer is formed of(l 10) GdScO 3 or (110) DyScO 3 .
28. The thin film structure of claim 19 wherein the strained layer is grown epitaxially by molecular beam epitaxy.
29. The thin film structure of claim 19 wherein the strained layer is grown epitaxially by pulsed laser deposition.
30. The thin film structure of claim 19 wherein the substrate layer is DyScO 3 .
31. The thin film structure of claim 19 wherein the substrate layer is GdScO 3 and the strained layer of BaTiO 3 has a thickness of 2000Å or less.
32. The thin film structure of claim 19 wherein the structure is located outside of a deposition system in which the strained layer of crystalline ferroelectric material is grown.