Adhesion promotion vacuum monitoring system for photo resist coaters

1. An apparatus comprising:

a chamber configured to receive and heat a semiconductor wafer;

a vacuum device in fluid communication with a processing space within the chamber, wherein the vacuum device is configured to create a partial vacuum within the processing space;

a vacuum monitor in fluid communication with the processing space, wherein the vacuum monitor generates a first electrical signal if gas pressure within the processing space is below a predetermined value; and

a processor in data communication with the vacuum monitor and the vacuum device;

wherein the vacuum device generates a second electrical signal; and

wherein the processor generates a third electrical signal if the vacuum monitor fails to generate the first electrical signal within a predetermined amount of time after the vacuum device generates the second signal.

2. The apparatus of claim 1 wherein the vacuum device generates the second signal when the vacuum device is activated.

3. The apparatus of claim 1 further comprising an alarm, wherein the alarm is activated in response to the processor generating the third signal.

4. The apparatus of claim 1 wherein the vacuum monitor comprises a vacuum switch.

5. The apparatus of claim 1 wherein the vacuum device comprises a venturi vacuum device.

6. A method comprising:

inputting a semiconductor wafer into a chamber;

initiating a vacuum device in fluid communication with the chamber while the semiconductor wafer is in the chamber;

heating the semiconductor wafer while the semiconductor wafer is in the chamber;

generating a first electrical signal if gas pressure within the chamber is below a predetermined value as the semiconductor wafer is being heated;

generating a second electrical signal when the vacuum device is initiated; and

generating a third electrical signal if the first electrical signal is not generated within a predetermined amount of time after generation of the second electrical signal.

7. The method of claim 6 further comprising inputting hexamethyldisilizane HMDS vapor into the chamber unless the first electrical signal is generated.

8. The method of claim 6 further comprising generating an alarm in response to the generation of the third electrical signal.

9. An apparatus comprising:

a chamber configured to receive and heat a semiconductor wafer;

a vacuum device in fluid communication with a processing space within the chamber, wherein the vacuum device is configured to create a partial vacuum within the processing space;

a means for generating a first electrical signal if a gas pressure of the processing space is below a predetermined value as the semiconductor wafer is being heated; and

a processor in data communication with the means and the vacuum device;

wherein vacuum device generates a second electrical signal; and

wherein the processor generates a third electrical signal if the means fails to generate the first electrical signal within a predetermined amount of time after the vacuum device generates the second electrical signal.

10. The apparatus of claim 9 wherein the vacuum device generates the second signal when the vacuum device is activated.

11. The apparatus of claim 9 further comprising an alarm, wherein the alarm is activated in response to the processor generating the third signal.

12. A computer readable medium for storing instructions executable by a processor of a computer system, wherein the processor is in data communication with a vacuum monitor and a vacuum generator, wherein the vacuum monitor and vacuum generator are in fluid communication with a processing space of a chamber, wherein the chamber is configured to receive and heat a semiconductor wafer, wherein the processor performs a method in response to executing the instructions, the method comprising:

generating a signal if the vacuum monitor fails to generate a first electrical signal within a predetermined amount of time after the vacuum device generates a second electrical signal;

wherein the vacuum monitor generates the first electrical signal if gas pressure within the processing space is below a predetermined value; and

wherein the vacuum generator generates the second electrical signal when the vacuum generator is activated.