Semiconductor memory device with plural source/drain regions
View Patent ↗A semiconductor memory device includes first and second source/drain regions, and first and second semiconductor regions. The first source/drain region of a first conductive type is formed in a first well region of a second conductive type for a pair of first MIS-type transistors of the first conductive type. The second source/drain region of the second conductive type is formed in a second well region of the first conductive type for a pair of second MIS-type transistors of the second conductive type. The first semiconductor region of the second conductive type is formed in the first source/drain region. The second semiconductor region of the first conductive type is formed in the second source/drain region.
1. A semiconductor memory device comprising:
a first source/drain region of a first conductive type formed in a first well region of a second conductive type for a pair of first MIS-type transistors of the first conductive type;
a second source/drain region of the second conductive type formed in a second well region of the first conductive type for a pair of second MIS-type transistors of the second conductive type;
a first semiconductor region of the second conductive type formed in said first source/drain region; and
a second semiconductor region of the first conductive type formed in said second source/drain region.
2. The semiconductor memory device according to claim 1 , wherein said first semiconductor region is formed to pass through said first source/drain region to said first well region, and
said second semiconductor region is formed to pass through said second source/drain region to said second well region.
3. The semiconductor memory device according to claim 1 , wherein said first well region is connected with a power supply potential, and said second well region is connected with a ground potential.
4. The semiconductor memory device according to claim 1 , wherein the first conductive type is an N conductive type and the second conductive type is a P conductive type.
5. The semiconductor memory device according to claim 1 , further comprising:
a first salicide layer formed in common to a surface of said first source/drain region and a surface of said first semiconductor region; and
a second salicide layer formed in common to a surface of said second source/drain region and a surface of said second semiconductor region.
6. The semiconductor memory device according to claim 5 , wherein each of said first and second salicide layers is one of Co salicide layer and a Ti salicide layer.
7. The semiconductor memory device according to claim 5 , wherein said first salicide layer is connected with a power supply potential and said second salicide layer is connected with a ground potential.
8. The semiconductor memory device according to claim 1 , wherein one of said pair of first MIS-type transistors and one of said pair of second MIS-type transistors are connected to constitute a first inverter, and the other of said pair of first MIS-type transistors and the other of said pair of second MIS-type transistors are connected to constitute a second inverter, and
an input of one of said first and second inverters is connected with an output of the other.
9. The semiconductor memory device according to claim 8 , further comprising:
a pair of third MIS-type transistors of the first conductive type formed in said first well region,
one of said pair of third MIS-type transistors has a gate connected with a word line, a source connected with one of a pair of bit lines, and a drain connected with the input of one of said first and second inverters and the output of the other, and
the other of said pair of third MIS-type transistors has a gate connected with the word line, a source connected with the other of a pair of bit lines, and a drain connected with the output of said one of said first and second inverters and the input of the other.
10. The semiconductor memory device according to claim 9 , further comprising:
first and second contacts connected with said first and second semiconductor regions, respectively,
wherein said first contact is formed between said first MIS-type transistors and between said pair of first MIS-type transistors and said word line, and
said second contact is formed between said second MIS-type transistors and on a side opposite to said pair of first MIS-type transistors.
11. A semiconductor memory device comprising:
a first source/drain region of a first conductive type formed in a first well region of a second conductive type and having first and second portions;
a second source/drain region of the second conductive type formed in a second well region of the first conductive type and having third, fourth and fifth portions;
two gate lines extending above said first and second source/drain regions such that said second portion and said fifth portion are between said two gate lines and said two gate lines cross said first and third portions, wherein a portion of said first source/drain region under said two gate lines is the second conductive type and a portion of said second source/drain region under said two gate lines is the first conductive type, and said two gate lines and said third portion constitute a pair of first MIS-type transistors, and said two gate lines and said first portion constitute a pair of second MIS-type transistors,
a first semiconductor region of the second conductive type formed in said second portion of said first source/drain region; and
a second semiconductor region of the first conductive type formed in said fifth portion of said second source/drain region.
12. The semiconductor memory device according to claim 11 , wherein said first semiconductor region is formed to pass through said first source/drain region to said first well region, and
said second semiconductor region is formed to pass through said second source/drain region to said second well region.