Composition for preparing nanoporous material

1. A cyclodextrin derivative represented by Formula 8 below:

wherein n is an integer from 6 to 10; R 1 ′ and R 2 ′ are independently a divalent group derived from substituents containing OH, SH or NH 2 which form a crosslinked structure; and R 3 is —OR 4 , wherein R 4 is a C 2˜30 acyl group, a C 1˜20 alkyl group, a C 3˜10 cycloalkyl group, a C 1˜20 hydroxyalkyl group, a carboxyl group, or a silicon compound represented by Sir 1 r 2 r 3 , wherein r 1 , r 2 and r 3 are independently a C 1˜5 alkyl group, a C 1˜5 alkoxy group, or a C 6˜20 aryl group.

2. A composition for preparing a nanoporous material, comprising:

i) at least one cyclodextrin derivative selected from compounds represented by Formula 8 below:

wherein n is an integer of from 6 to 10; R 1 ′ and R 2 ′ are independently a divalent group derived from substituents containing OH, SH or NH 2 which form a crosslinked structure; and R 3 is —OR 4 wherein R 4 is a C 2˜30 acyl group, a C 1˜20 alkyl group, a C 3˜10 cycloalkyl group, a C 1˜20 hydroxyalkyl group, a carboxyl group, or a silicon compound represented by Sir 1 r 2 r 3 ,wherein r 1 , r 2 and r 3 are independently a C 1˜5 alkyl group, a C 1˜5 alkoxy group, or a C 6˜20 aryl group; and

wherein n is an integer of from 3 to 10; R 3 ′ is a divalent group derived from substituents containing OH, SH or NH 2 which form a crosslinked structure; and R 1 and R 2 are independently —OR 4 [in which R 4 is a C 2˜30 acyl group, a C 1˜20 alkyl group, a C 3˜10 cycloalkyl group, a C 1˜20 hydroxyalkyl group, a carboxyl group, or a silicon compound represented by Sir 1 r 2 r 3 (in which r 1 , r 2 and r 3 are independently a C 1˜5 alkyl group, a C 1˜5 alkoxy group, or a C 6˜20 aryl group)];

ii) a thermostable matrix precursor; and

iii) a solvent for dissolving the components i) and ii).

3. The composition according to claim 2 , wherein the thermostable matrix precursor is a siloxane-based resin prepared through hydrolysis and condensation of a compound represented by Formula 1 below:

wherein R 1 is a hydrogen atom, a C 1˜3 alkyl group, or a C 6˜15 aryl group; X 1 , X 2 and X 3 are independently a hydrogen atom, a C 1˜3 alkyl group, a C 1˜10 alkoxy group, or a halogen atom, at least one of these substituents being a hydrolysable functional group; m is an integer ranging from 0 to 10; and p is an integer ranging from 3 to 8,

or Formula 2 below:

wherein R 1 is a hydrogen atom, a C 1˜3 alkyl group, or a C 6˜15 aryl group; R 2 is a hydrogen atom, a C 1˜10 alkyl group, or SiX 1 X 2 X 3 , wherein X 1 , X 2 and X 3 are independently a hydrogen atom, a C 1˜3 alkyl group, a C 1˜10 alkoxy group, or a halogen atom and p is an integer between 3 and 8,

and a monomer represented by Formula 5 below:

RSiX 1 X 2 X 3   (5)

wherein R is a hydrogen atom, a C 1˜3 alkyl group, a C 3˜10 cycloalkyl group, a C 1˜10 alkoxy group, or C 6˜15 aryl group; and X 1 , X 2 and X 3 are independently a C 1˜3 alkyl group, a C 1˜10 alkoxy group, or a halogen atom,

using an acid catalyst and water in the presence of an organic solvent.

4. The composition according to claim 3 , wherein the compound of Formula 1 or 2 and the monomer of Formula 5 are used in a molar ratio ranging from 0.01:0.99 to 0.99:0.01.

5. The composition according to claim 2 , wherein the content of the cyclodextrin derivative is in the range of 0.1%˜95% by weight, based on the total solid content, the sum of the amounts of the cyclodextrin derivative and the matrix precursor, of the composition.

6. The composition according to claim 2 , wherein the content of the solvent in the composition is in the range of 20%˜99.9% by weight.

7. The composition according to claim 2 , wherein the solvent is an aromatic hydrocarbon, a ketone, an ether, an acetate, an amide, γ-butyolactone, an alcohol, a silicon solvents, or a mixture thereof.

8. The composition according to claim 7 , wherein the solvent is anisole, xylene, mesitylene, methyl isobutyl ketone, 1-methyl-2-pyrrolidinone, acetone, tetrahydrofuran, isopropyl ether, ethyl acetate, butyl acetate, propylene glycol methyl ether acetate, dimethylacetamide, dimethylformamide, γ-butyolactone, isopropyl alcohol, butyl alcohol, octyl alcohol, a silicon solvent, or a mixture thereof.

9. A method for forming a low dielectric constant film, comprising the steps of: coating the composition according to claim 2 on a semiconductor substrate by spin coating, dip coating, spray coating, flow coating, or screen printing; evaporating the solvent from the coated substrate; and heating the coated substrate to 150° C.˜600° C. under an inert atmosphere or vacuum.

10. A nanoporous structure produced by preparing the composition according to claim 2 and evaporating the solvent from said composition—therefor.

11. A method for the manufacture of heat resistant materials, electrical insulators, adsorbents, and supports for catalysts, the method comprising the preparation of the composition of claim 3 and evaporating the solvent from said composition—therefore.