Programmable matrix array with phase-change material
View Patent ↗A phase-change material is proposed for coupling interconnect lines an electrically programmable matrix array. Leakage may be reduced by optionally placing a thin insulating breakdown layer between the phase change material and at least one of the lines. The matrix array may be used in a programmable logic device. The logic portions of the programmable logic device may be tri-stated.
1. An integrated circuit comprising:
a plurality of first conductive lines;
a plurality of second conductive lines; and
a plurality of programmable connections, each of said programmable connections programmably coupling a corresponding one of said first conductive lines to a corresponding one of said second conductive lines, at least one of said programmable connections comprising a phase-change material, wherein there is no access device coupled in series with said phase-change material between the corresponding first and second conductive lines, at least one other of said programmable connections comprising a transistor coupled between a corresponding first and second conductive lines.
2. The integrated circuit of claim 1 , farther comprising an anti-fuse device in series with said phase-change material between the corresponding first and second conductive lines.
3. The integrated circuit of claim 1 , wherein said phase-change material comprises a chalcogen element.
4. The integrated circuit of claim 1 , wherein said first conductive lines are oriented in a first direction and said second conductive lines are oriented in a second direction different from said first direction.
5. The integrated circuit of claim 1 , wherein said integrated circuit is a programmable logic device.
6. The integrated circuit of claim 1 , wherein said integrated circuit is a memory device.
7. The integrated circuit of claim 1 , wherein said transistor is controlled by a programmable SRAM cell.
8. The integrated circuit of claim 1 , wherein said transistor is controlled by a programmable non-volatile cell.
9. The integrated circuit of claim 1 , wherein said phase-change material is coupled between the corresponding first and second conductive lines.
10. The integrated circuit of claim 1 , further comprising a breakdown layer coupled in series with said phase-change material between said first and second conductive lines.
11. The integrated circuit of claim 10 , wherein said breakdown layer has a thickness of less than about 100 Angstroms.
12. The integrated circuit of claim 10 , wherein said breakdown layer comprises a dielectric material.
13. The integrated circuit of claim 10 , wherein said breakdown layer comprises at least one member selected from the group consisting of oxide and nitride.
14. The integrated circuit of claim 10 , wherein said breakdown layer comprises an oxide of aluminum or an oxide of silicon.
15. The integrated circuit of claim 10 , wherein said breakdown layer has a breakdown voltage of 6 volts or less.
16. The integrated circuit of claim 10 , wherein said breakdown layer comprises silicon nitride.