Semiconductor device
View Patent ↗A gate insulating film and a gate electrode are formed on a silicon substrate. The gate insulating film contains at least hafnium, oxygen, fluorine, and nitrogen. The fluorine concentration is high in the vicinity of an interface with the silicon substrate and progressively decreases with decreasing distance from the gate electrode. The nitrogen concentration is high in the vicinity of an interface with the gate electrode and progressively decreases with decreasing distance from the silicon substrate. The fluorine concentration in the vicinity of the interface with the silicon substrate is preferably 1×10 19 cm −3 or more. The nitrogen concentration in the vicinity of the interface with the gate electrode is preferably 1×10 20 cm −3 or more.
1. A semiconductor device comprising:
a silicon substrate;
a gate insulating film on said silicon substrate; and
a gate electrode on said gate insulating film, wherein
said gate insulating film contains at least hafnium, oxygen, fluorine, and nitrogen,
concentration of said fluorine in said gate insulating film is high proximate an interface with said silicon substrate and progressively decreases with decreasing distance from said gate electrode, and
concentration of said nitrogen in said gate insulating film is high proximate an interface with said gate electrode and progressively decreases with decreasing distance from said silicon substrate.
2. The semiconductor device as claimed in claim 1 , wherein the concentration of said fluorine in said gate insulating film proximate said interface with said silicon substrate is at least 1×10 19 cm −3 .
3. The semiconductor device as claimed in claim 1 , wherein the concentration of said nitrogen in said gate insulating film proximate said interface with said gate electrode is at least 1×10 20 cm −3 .
4. A semiconductor device comprising:
a silicon substrate;
a gate insulating film on said silicon substrate; and
a gate electrode on said gate insulating film, wherein
said gate insulating film contains at least hafnium, oxygen, fluorine, and nitrogen, and
in regions of said gate insulating film other than proximate an interface with said silicon substrate, concentration of said nitrogen is higher than concentration of said fluorine.
5. The semiconductor device as claimed in claim 4 , wherein said gate insulating film includes, proximate said interface with said silicon substrate, a region extending 1 nm–1.5 nm from said interface in a thickness direction of said gate insulating film.