Optical semiconductor device with multiple quantum well structure
View Patent ↗An optical semiconductor device with a multiple quantum well structure, in which well layers and barrier layers comprising various types of semiconductor layers are alternately layered, in which device well layers ( 6 a ) of a first composition based on a nitride semiconductor material with a first electron energy and barrier layers ( 6 b ) of a second composition of a nitride semiconductor material with electron energy which is higher in comparison with the first electron energy are provided, followed, seen in the direction of growth, by a radiation-active quantum well layer ( 6 c ), for which the essentially non-radiating well layers ( 6 a ) and the barrier layers ( 6 b ) arranged in front form a superlattice.
1. An optical semiconductor device comprising
a multiple quantum well structure the multiple quantum well structure comprises:
at least one combination of alternating essentially non-radiating well layers and barrier layers, both comprising various semiconductor layers based on a nitride semiconductor material; and
a radiation-active quantum well layer, disposed over the essentially non-radiating well layers and barrier layers.
2. The optical semiconductor device according to claim 1 , wherein the well layers comprise thin aluminum-indium-gallium-nitride layers and the barrier layers comprise gallium-nitride or aluminum-gallium-nitride layers which are thicker than the well layers and the radiation-active quantum well comprises an indium-gallium-nitride layer.
3. The optical semiconductor device according to claim 2 , wherein the well layers and barrier layers are doped with silicon.
4. The optical semiconductor device according to claim 3 , wherein the dopant concentration is from 10 17 to 10 18 cm −3 .
5. The optical semiconductor device according to claim 1 , wherein the radiation-active quantum well follows an uppermost barrier layer.
6. The optical semiconductor device according to claim 1 , wherein layer thickness of the radiation-active quantum well is greater than layer thickness of the essentially non-radiating well layers.
7. The optical semiconductor device according to claim 1 , wherein the essentially non-radiating well layers are thinner than 2 nm and the barrier layers are at least 3 nm thick.
8. The optical semiconductor device according to claim 1 , wherein within at least one of the essentially non-radiating well layers and indium content increases in a direction of growth.
9. The optical semiconductor device according to claim 8 , wherein in the essentially non-radiating well layers the indium content, remote from the quantum well layer, lies below 5%.
10. An optical semiconductor device comprising
with a multiple quantum well structure the multiple quantum well structure comprises:
at least one combination of alternating well layers and baffler layers, both comprising various semiconductor layers based on a nitride semiconductor material, wherein at least one of the well layers is configured to produce a stepped potential profile.
11. The optical semiconductor device according to claim 10 , wherein the at least one of the well layers has at least one pair of single layers, of which a first of the at least one pair, in a direction of growth, has a lower indium content than a second of the at least one pair in a direction of growth.
12. The optical semiconductor device according to claim 11 , wherein the second of the at least one pair has an increased indium content of less than 5% than the first of the at least one pair.
13. The optical semiconductor device according to claim 11 , wherein the indium content of the first of the at least one pair of single layers is less than 5%.
14. The optical semiconductor device according to claim 11 , wherein the at least one well layer comprises a plurality of single layers whose indium content increases in direction of growth.
15. The optical semiconductor device according to claim 14 , wherein the indium content increase is smaller than 5%.
16. The optical semiconductor device according to claim 14 , wherein the thickness of each of the plurality of single layers comprises at least one monolayer.
17. The optical semiconductor device according to claim 10 , wherein the well layers are essentially non-radiating well layers.
18. The optical semiconductor device according to claim 10 , wherein a radiation-active quantum well layer is disposed over the well layers and barrier layers.
19. The optical semiconductor device according to claim 10 , wherein the stepped potential profile is similar to a delta potential.